Browsing by Author "Blasco, X."
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Publication Breakdown spots on ultra-thin (EOT<1.5nm) HfO2/SiO2 stacks observed with enhanced - CAFM
Journal article2005, Microelectronics Reliability, (45) 5_6, p.811-814Publication C-AFM Characterization of the dependance of AlHfOx electrical behaviour on post deposition annealing temperature
Oral presentation2003, 13th Bi-Annual Conference on Insulating Films on Semiconductors - INFOSPublication Critical metrology for ultrathin high k dielectrics
Proceedings paper2003, Characterization and Metrology for ULSI Technology, 24/03/2003, p.129-138Publication Effect of N2 anneal on thin HfO2 layers studied by C-AFM
Journal article2004, Microelectronic Engineering, (72) 1_4, p.174-179Publication Electrical characterization of high-dielectric-constant/SiO2 metal-oxide-semiconductor gate stacks by a conductive atomic force microscope
Journal article2005, Nanotechnology, (16) 9, p.1506-1511Publication GAFM characterization of the dependence of HfAlOx electrical behavior on post-deposition annealing temperature
Journal article2004, Microelectronic Engineering, (72) 1_4, p.191-196Publication Nanoscale electrical characterization of HfO2/SiO2/MOS gate stackx with enhanced-CAFM
;Nafria, M. ;Blasco, X. ;Porti, M. ;Aguilera, L. ;Aymerich, X.Petry, JasmineProceedings paper2005, Spanish Conference on Electron Devices, 2/02/2005, p.65-68Publication Nanoscale post-breakdown conduction of HfO2/SiO2 MOS gate stacks studied by enhanced-CAFM
Journal article2005, IEEE Trans. Electron Devices, (52) 12, p.2817-2819Publication Overview of 2D profiling in Imec
Meeting abstract2003, Veeco SPM User Meeting, 20/03/2003