Browsing by Author "Braginsky, O.V."
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Publication 1-D model of OSG low-k films modification by EUV/VUV emission
;Rakhimova, T.V. ;Rakhimov, A.T. ;Mankelevich, Y.A. ;Lopaev, D.V. ;Ziryanov, S.M.Kovalev, A.S.Meeting abstract2013, Plasma Etch and Strip in Microtechnology - PESM, 14/03/2013Publication Recombination of O and H atoms with low-k SiOCH films pretreated in He plasma
;Baklanov, Mikhaïl ;Braginsky, O.V. ;Kovalev, A.S. ;Lopaev, D.V.Mankelevich, Y.A.Proceedings paper2009, Materials, Processes and Reliability for Advanced Interconnects for Micro- and Nanoelectronics, 14/04/2009, p.1156-D01-06Publication Recombination probabilities of O and H atoms on the surface of nanoporous low dielectric constant SiCOH films
;Braginsky, O.V. ;Kovalev, A.S. ;Lopaev, D.V. ;Malykhin, E.M. ;Mankelevich, Y.A.Rakhimova, T.V.Proceedings paper2009, Advanced Metallization Conference 2008 (AMC 2008), 8/10/2008, p.573-579Publication Recombination probabilities of O and H atoms on the surface of nanoporous Low-k SiCOH dielectrics
;Braginsky, O.V. ;Kovalev, A.S. ;Lopaev, D.V. ;Malykhin, E.M. ;Mankelevich, Y.A.Rakhimova, T.V.Meeting abstract2008, ADMETA: Advanced Metallization Conference, 8/10/2008, p.38-39Publication The effect of He plasma treatment on properties of organosilicate glass low-k films
;Braginsky, O.V. ;Kovalev, A.S. ;Lopaev, D.V. ;Malykhin, E.M. ;Mankelevich, Y.A.Proshina, O.V.Journal article2011, Journal of Applied Physics, (109) 4, p.43303Publication The influence of He plasma pretreatment on O and H atom interaction with low-k nanoporous materials
;Braginsky, O.V. ;Kovalev, A.S. ;Lopaev, D.V. ;Malykhin, E.M. ;Mankelevich, Y.A.Rakhimova, T.V.Proceedings paper2009, 62nd Annual Gaseous Electronics Conference - GEC, 20/10/2009Publication The mechanism of low-k SiOCH film modification by oxygen atoms
;Braginsky, O.V. ;Kovalev, A.S. ;Lopaev, D.V. ;Malykhin, E.M. ;Mankelevich, Y.A.Rakhimova, T.V.Journal article2010, Journal of Applied Physics, (108) 7, p.73303