Browsing by Author "Buca, D."
- Results Per Page
- Sort Options
Publication Asymmetric strain relaxation in patterned SiGe layer: a means to enhance carrier mobilities in Si cap layers
Journal article2007-01, Applied Physics Letters, (90) 3, p.32108Publication Dislocation nucleation and movement in helium implanted SiGe/Si(001)Heterostructures studied by in-situ TEM
;Hueging, N. ;Luysberg, M. ;Urban, K. ;Buca, D. ;Holländer, B. ;Mantl, S.Morschbacher, M.Oral presentation2004, Dislocation MeetingPublication Enhancement of the relaxation of SiGe layers by He ion implantation using a delta-Si:C layer
Oral presentation2007, MRS 2007 Spring Meeting Symposium F: Semiconductor Defect Engineering - Materials, Synthetic Structures and Devices IIPublication Fabrication and characterization of strained Si-on-insulator (sSOI)
Proceedings paper2007, 8th European Workshop on ULtimate Integration of Silicon - ULIS, 14/03/2007Publication Fabrication, characterization and modeling of strained SOI MOSFETs with very large effective mobility
;Driussi, F. ;Esseni, D. ;Selmi, L. ;Schmidt, M. ;Lemme, M. ;Kurz, H. ;Buca, D. ;Mantl, S.Luysberg, M.Proceedings paper2007, Proceedings of the 37th European Solid-State Device Research Conference - ESSDERC, 11/09/2007, p.315-318Publication Formation of ternary Ni-silicide on relaxed and strained SiGe layers
Journal article2004, Microelectronic Engineering, (76) 1_4, p.285-289Publication Growth of strained Si on He ion implanted Si/SiGe heterostructures
;Buca, D. ;Feste, S. ;Hollander, B. ;Mantl, S.; ; ;Carius, R.Schaefer, H.Proceedings paper2005-04, 6th European Conference on Integration in Silicon - ULIS, 7/04/2005, p.11-14Publication He implantation induced relaxation of SiGe/Si: nucleation of dislocations and coarsening of He bubbles
;Luysberg, M. ;Hueging, N. ;Urban, K. ;Buca, D. ;Holländer, B. ;Mantl, S.Morschbacher, M.Proceedings paper2004, Program and Abstracts Book 2nd International SiGe Technology and Device Meeting - ISTDM, 17/05/2004, p.117-118Publication Improvement of He ion induced SiGe layer relaxation by a thin Si:C layer
Proceedings paper2008, 4th International SiGe Technology and Device Meeting, 11/05/2008, p.40-41Publication In-situ TEM on He implantation induced defects in SiGe/Si
;Luysberg, Martina ;Hueging, N. ;Urban, K. ;Buca, D. ;Holländer, B. ;Mantl, S.Morschbacher, M.Proceedings paper2004, Proceedings of the 13th European Microscopy Congress. Volume 2: Materials Sciences, 22/08/2004, p.377-378Publication Investigation of plasma hydrogenation and trapping mechanism for layer transfer
Journal article2005, Applied Physics Letters, (86) 3, p.031904-1-031904-3Publication Large current enhancement in n-MOSFETs with strained Si on insulator
;Mantl, S. ;Buca, D. ;Zhao, Q.T. ;Hollaender, B. ;Feste, S. ;Luysberg, M. ;Reiche, M.Gösele, U.Proceedings paper2007, International Semiconductor Device Research Symposium - ISDRS, 12/12/2007Publication Overgrowth and defect characterization of strained Si/SiGe heterostructures on Si(100)
Proceedings paper2005-05, 4th International Conference on Silicon Epitaxy and Heterostructures - ICSI-4, 23/05/2005, p.36-37Publication Plasma hydrogenation of strain-relaxed SiGe/Si heterostructure for layer transfer
;Chen, Peng ;Chu, Paul K. ;Höchbauer, T. ;Nastasi, M. ;Buca, D. ;Mantl, S.Theodore, N. DavidJournal article2004, Applied Physics Letters, (85) 21, p.4944-4946Publication Saturation Photo-Voltage methodology for semiconductor insulator interface trap spectroscopy
; ; ; ; ;Schulte-Braucks, C.Journal article2016, ECS Journal of Solid State Science and Technology, (5) 4, p.P3031-P3036Publication Strain relaxation of pseudomorphic Si1-xGe/Si(100) heterostructures after Si+ ion implantation
;Holländer, B. ;Buca, D. ;Mörschbächer, M. ;Lenk, St. ;Mantl, S. ;Herzog, H.J. ;Hackbarth, Th.Journal article2004, Journal of Applied Physics, (96) 3, p.1745-1747Publication Strained Si on relaxed SiGe made by ion implantation and strain transfer
;Mantl, S. ;Buca, D. ;Holländer, B. ;Mörschbächer, M. ;Trinkhaus, H. ;Luysberg, M.Hueging, N.Proceedings paper2004-10, SiGE: Materials, Processing, and Devices, 3/10/2004, p.731-740Publication Strained Si-on-insulator for advanced CMOS devices
;Mantl, S. ;Buca, D. ;Zhao, Q.T. ;Hollander, B. ;Feste, S. ;Luysberg, M. ;Reiche, M.Gosele, U.Oral presentation2007, 4th Int. Workshop on Future Information Processing Technology - IWFIPTPublication Strained silicon on wafer level by wafer bonding: materials processing, strain measurements and strain relaxation
;Reiche, M. ;Moutanabbir, O. ;Himcinschi, C. ;Christiansen, S. ;Erfurth, E. ;Goesele, U.Mantl, S.Proceedings paper2008, Semiconductor Wafer Bonding 10: Science, Technology, and Applications, 12/10/2008, p.311-320Publication Strained silicon-on-insulator : fabrication and characterization
;Reiche, M. ;Himcinschi, C. ;Goesele, U. ;Christiansen, S. ;Mantl, S. ;Buca, D. ;Zhao, Q. T.Feste, S.Proceedings paper2007, Silicon-on-Insulator Technology and Devices 13, 6/05/2007, p.339-344