Browsing by Author "Clarysse, Trudo"
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Publication 2D profiling with atomic force microscopy
Oral presentation1999, Digital Instruments Users Workshop; April 1999; Dresden, Germany.Publication A detailed study of SCM on cross-sectional and beveled junctions
Meeting abstract2001, 6th Int. Workshop on Fabrication, Characterization and Modeling of Ultra-Shallow Doping Profiles in Semiconductors - USJ, 22/04/2001, p.160Publication Accurate carrier profiling of n-type GaAs junctions
Journal article2008, Materials Science in Semiconductor Processing, (11) 5_6, p.259-266Publication Accurate electrical activation characterization of CMOS ultra-shallow profiles
Journal article2004, Materials Science and Engineering B, 114-115, p.166-173Publication Accurate prediction of device performance : Reconstructing 2D-active dopant profiles from 2D-carrier profiles in the presence of extensive mobile carrier diffusion
Meeting abstract2014, MRS Spring Meeting Symposium BBB: Advances in Scanning Probe Microscopy for Material Properties, 21/04/2014, p.BBB3.02Publication Accurate prediction of device performance based on 2-D carrier profiles in the presence of extensive mobile carrier diffusion
Journal article2014, IEEE Transactions on Electron Devices, (61) 8, p.2633-2639Publication Active dopant characterization methodology for Germanium
Proceedings paper2005, Proceedings of the 8th Int. Workshop on the Fabrication , Characterization and Modeling of Ultra Shallow Junctions in Semicond., 5/06/2005, p.373-382Publication Advanced 2D/3D simulations for laser annealed device using an atomic kinetic monte carlo approach and scanning spreading resistance microscopy (SRRM)
Proceedings paper2008, Technical Digest International Electron Devices Meeting - IEDM, 15/12/2008, p.539-542Publication Advanced carrier depth profiling on Si and Ge with M4PP
Proceedings paper2007, International Workshop on INSIGHT in Semiconductor Device Fabrication, Metrology and Modeling, 6/05/2007Publication Advanced carrier depth profiling on Si and Ge with micro four-point probe
Journal article2008, Journal of Vacuum Science and Technology B, (26) 1, p.317-321Publication Advanced characterization of carrier profiles in germanium using micro-machined contact probes
Proceedings paper2012, Ion Implantation Technology. Proceedings of the 19th International Conference, 25/06/2012, p.167-170Publication Advanced use of therma-probe for ultra-shallow junction monitoring
Proceedings paper2011, Frontiers of Characterization and Metrology for Nanoelectronics, 23/05/2011, p.208-211Publication Advances in optical carrier profiling through high-frequency modulated optical reflectance
Proceedings paper2007, International Workshop on INSIGHT in Semiconductor Device Fabrication, Metrology, and Modeling, 6/05/2007, p.71-81Publication Advances in optical carrier profiling through high-frequency modulated optical reflectance
Journal article2008, Journal of Vacuum Science and Technology B, (26) 1, p.310-316Publication Aluminium implantation in germanium: uphill diffusion, electrical activation and trapping
;Impellizzeri, Giuliana ;Napolitani, Enrico ;Boninelli, SimonaPrivitera, VittorioJournal article2012, Applied Physics Express, (5) 2, p.21301Publication Analysis and modeling of the high vacuum scanning spreading resistance microscopy nanocontact on silicon
Journal article2010, Journal of Vacuum Science and Technology B, (28) 2, p.401-406Publication Analysis and modeling of the HV-SSRM nanocontact on silicon
Meeting abstract2009, International Workshop on INSIGHT in Semiconductor Device Fabrication, Metrology and Modeling, 26/04/2009Publication Assessing the performance of two-dimensional dopant profiling techniques
Proceedings paper2003, Ultra Shallow Junctions. 7th Int. Worksh. Fabrication, Characterization and Modeling of Ultra Shallow Doping Profiles in Semic., 27/04/2003, p.215-226Publication Assessing the performance of two-dimensional dopant profiling techniques
Journal article2004, Journal of Vacuum Science and Technology, (22) 1, p.385-393Publication Assessment of Ge1-xSnx alloys for strained Ge CMOS devices
Meeting abstract2010, 218th ECS Meeting, 10/10/2010, p.1909