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Browsing by Author "Clarysse, Trudo"

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    2D profiling with atomic force microscopy

    Trenkler, Thomas
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    De Wolf, Peter
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    Stephenson, Robert
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    Clarysse, Trudo
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    Hantschel, Thomas  
    Oral presentation
    1999, Digital Instruments Users Workshop; April 1999; Dresden, Germany.
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    A detailed study of SCM on cross-sectional and beveled junctions

    Duhayon, Natasja  
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    Clarysse, Trudo
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    Eyben, Pierre  
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    Vandervorst, Wilfried  
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    Hellemans, L.
    Meeting abstract
    2001, 6th Int. Workshop on Fabrication, Characterization and Modeling of Ultra-Shallow Doping Profiles in Semiconductors - USJ, 22/04/2001, p.160
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    Accurate carrier profiling of n-type GaAs junctions

    Clarysse, Trudo
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    Brammertz, Guy  
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    Vanhaeren, Danielle  
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    Eyben, Pierre  
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    Goossens, Jozefien
    Journal article
    2008, Materials Science in Semiconductor Processing, (11) 5_6, p.259-266
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    Accurate electrical activation characterization of CMOS ultra-shallow profiles

    Clarysse, Trudo
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    Dortu, Fabian
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    Vanhaeren, Danielle  
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    Hoflijk, Ilse  
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    Geenen, Luc
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    Janssens, Tom
    Journal article
    2004, Materials Science and Engineering B, 114-115, p.166-173
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    Accurate prediction of device performance : Reconstructing 2D-active dopant profiles from 2D-carrier profiles in the presence of extensive mobile carrier diffusion

    Nazir, Aftab  
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    Eyben, Pierre  
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    Clarysse, Trudo
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    Spessot, Alessio  
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    Ritzenthaler, Romain  
    Meeting abstract
    2014, MRS Spring Meeting Symposium BBB: Advances in Scanning Probe Microscopy for Material Properties, 21/04/2014, p.BBB3.02
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    Accurate prediction of device performance based on 2-D carrier profiles in the presence of extensive mobile carrier diffusion

    Nazir, Aftab  
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    Spessot, Alessio  
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    Eyben, Pierre  
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    Clarysse, Trudo
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    Ritzenthaler, Romain  
    Journal article
    2014, IEEE Transactions on Electron Devices, (61) 8, p.2633-2639
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    Active dopant characterization methodology for Germanium

    Clarysse, Trudo
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    Eyben, Pierre  
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    Janssens, Tom
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    Hoflijk, Ilse  
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    Vanhaeren, Danielle  
    Proceedings paper
    2005, Proceedings of the 8th Int. Workshop on the Fabrication , Characterization and Modeling of Ultra Shallow Junctions in Semicond., 5/06/2005, p.373-382
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    Advanced 2D/3D simulations for laser annealed device using an atomic kinetic monte carlo approach and scanning spreading resistance microscopy (SRRM)

    Noda, T.
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    Eyben, Pierre  
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    Vandervorst, Wilfried  
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    Vrancken, Christa  
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    Rosseel, Erik  
    Proceedings paper
    2008, Technical Digest International Electron Devices Meeting - IEDM, 15/12/2008, p.539-542
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    Advanced carrier depth profiling on Si and Ge with M4PP

    Clarysse, Trudo
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    Eyben, Pierre  
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    Parmentier, Brigitte  
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    Van Daele, Benny
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    Satta, Alessandra
    Proceedings paper
    2007, International Workshop on INSIGHT in Semiconductor Device Fabrication, Metrology and Modeling, 6/05/2007
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    Advanced carrier depth profiling on Si and Ge with micro four-point probe

    Clarysse, Trudo
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    Eyben, Pierre  
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    Parmentier, Brigitte  
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    Van Daele, Benny
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    Satta, Alessandra
    Journal article
    2008, Journal of Vacuum Science and Technology B, (26) 1, p.317-321
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    Advanced characterization of carrier profiles in germanium using micro-machined contact probes

    Clarysse, Trudo
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    Konttinen, Mikko
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    Parmentier, Brigitte  
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    Moussa, Alain  
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    Vandervorst, Wilfried  
    Proceedings paper
    2012, Ion Implantation Technology. Proceedings of the 19th International Conference, 25/06/2012, p.167-170
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    Advanced use of therma-probe for ultra-shallow junction monitoring

    Bogdanowicz, Janusz  
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    Clarysse, Trudo
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    Smets, Gerrit  
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    Rosseel, Erik  
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    Vandervorst, Wilfried  
    Proceedings paper
    2011, Frontiers of Characterization and Metrology for Nanoelectronics, 23/05/2011, p.208-211
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    Advances in optical carrier profiling through high-frequency modulated optical reflectance

    Bogdanowicz, Janusz  
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    Dortu, Fabian
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    Clarysse, Trudo
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    Vandervorst, Wilfried  
    Proceedings paper
    2007, International Workshop on INSIGHT in Semiconductor Device Fabrication, Metrology, and Modeling, 6/05/2007, p.71-81
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    Advances in optical carrier profiling through high-frequency modulated optical reflectance

    Bogdanowicz, Janusz  
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    Dortu, Fabian
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    Clarysse, Trudo
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    Vandervorst, Wilfried  
    Journal article
    2008, Journal of Vacuum Science and Technology B, (26) 1, p.310-316
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    Aluminium implantation in germanium: uphill diffusion, electrical activation and trapping

    Impellizzeri, Giuliana
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    Napolitani, Enrico
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    Boninelli, Simona
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    Privitera, Vittorio
    Journal article
    2012, Applied Physics Express, (5) 2, p.21301
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    Analysis and modeling of the high vacuum scanning spreading resistance microscopy nanocontact on silicon

    Eyben, Pierre  
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    Clemente, Francesca
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    Vanstreels, Kris  
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    Pourtois, Geoffrey  
    Journal article
    2010, Journal of Vacuum Science and Technology B, (28) 2, p.401-406
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    Analysis and modeling of the HV-SSRM nanocontact on silicon

    Eyben, Pierre  
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    Clemente, Francesca
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    Vanstreels, Kris  
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    Pourtois, Geoffrey  
    Meeting abstract
    2009, International Workshop on INSIGHT in Semiconductor Device Fabrication, Metrology and Modeling, 26/04/2009
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    Assessing the performance of two-dimensional dopant profiling techniques

    Duhayon, Natasja  
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    Eyben, Pierre  
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    Fouchier, Marc
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    Clarysse, Trudo
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    Vandervorst, Wilfried  
    Proceedings paper
    2003, Ultra Shallow Junctions. 7th Int. Worksh. Fabrication, Characterization and Modeling of Ultra Shallow Doping Profiles in Semic., 27/04/2003, p.215-226
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    Assessing the performance of two-dimensional dopant profiling techniques

    Duhayon, Natasja  
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    Eyben, Pierre  
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    Fouchier, Marc
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    Clarysse, Trudo
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    Vandervorst, Wilfried  
    Journal article
    2004, Journal of Vacuum Science and Technology, (22) 1, p.385-393
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    Assessment of Ge1-xSnx alloys for strained Ge CMOS devices

    Takeuchi, S.
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    Shimura, Y.
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    Nishimura, T.
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    Vincent, Benjamin  
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    Eneman, Geert  
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    Clarysse, Trudo
    Meeting abstract
    2010, 218th ECS Meeting, 10/10/2010, p.1909
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