Browsing by Author "D'have, Koen"
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Publication 3D features measurement using YieldStar, an angle resolved polarized scatterometer
Proceedings paper2011, Metrology, Inspection, and Process Control XXV, 27/02/2011, p.79712EPublication 3D features measurement using Yieldstar, an angle resolved polarized scatterometer
Proceedings paper2011, Optical Fabrication, Testing and Metrology IV, 5/09/2011, p.8160QPublication A single metrology tool solution for complete exposure tool setup
; ; ; ; Publication A Study of SiCN Wafer-to-Wafer Bonding and Impact of Wafer Warpage
; ; ; ; Publication Cluster optimization to improve total CD control as an enabler for double patterning
Proceedings paper2008, Litography ASIA, 4/11/2008, p.714023Publication Cluster optimization to improve total CD control as an enabler for double patterning
Proceedings paper2008, 5th International Symposium on Immersion Lithography Extensions, 22/09/2008Publication Comparison of back side chrome focus monitor to focus self-metrology of an immersion scanner
Proceedings paper2007, Metrology, Inspection and Process Control for Microlithography XXI, 25/02/2007, p.651805Publication Detection of split design-related weak points in double patterning using PQW and bright-field defect inspection
Proceedings paper2008, 5th International Symposium on Immersion Lithography Extensions, 22/09/2008Publication Diffraction based overlay re-assessed
Proceedings paper2011, Metrology, Inspection, and Process Control XXV, 27/02/2011, p.797114Publication Enabling Logic with Backside Connectivity via n-TSVs and its Potential as a Scaling Booster
; ; ; ; ; Proceedings paper2021, 2021 Symposium on VLSI Technology, 13/06/2021Publication Focus and dose de-convolution technique for improved CD-control of immersion clusters
; ; ; ; Publication Forksheet FETs for Advanced CMOS Scaling: Forksheet-Nanosheet Co-Integration and Dual Work Function Metal Gates at 17nm N-P Space
Proceedings paper2021, 2021 Symposium on VLSI Technology, 13/06/2021Publication Immersion specific error contributions to overlay control
Proceedings paper2008, 5th International Symposium on Immersion Lithography Extensions, 22/09/2008Publication Intra-field mask-to-mask overlay, separating the mask writing from the dynamic pellicle contribution
Proceedings paper2018, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology, 18/04/2018, p.108070KPublication Investigation of Distortion in Wafer-to-wafer Bonding with Highly Bowed Wafers
Proceedings paper2024, IEEE 74th Electronic Components and Technology Conference (ECTC), MAY 28-31, 2024, p.386-393Publication Lithography imaging control by enhanced monitoring of light source performance
Proceedings paper2013, Optical Microlithography XXVI, 24/02/2013, p.86830SPublication Mix and match overlay optimization for advanced lithography tools (193i and EUV)
Proceedings paper2012, Optical Microlithography XXV, 12/02/2012, p.83260MPublication Modeling for field-to-field overlay control
; Cheng, ShauneeProceedings paper2012, Optical Microlithography XXV, 12/02/2012, p.83260UPublication Novel monitoring of EUV litho cluster for manufacturing insertion
Meeting abstract2020, Extreme Ultraviolet (EUV) Lithography XI, 23/02/2020, p.11323oSPublication Off-line mask-to-mask registration characterization
Meeting abstract2017, Photomask Photomask Technology and EUV Lithography, 11/09/2017, p.1045111-1-1045111-16