Browsing by Author "De Smedt, Frank"
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Publication A detailed study on the growth of thin oxide layers on silicon using ozonated solutions
Journal article2000, Journal of the Electrochemical Society, (147) 3, p.1124-1129Publication A mechanism for the silicon oxide growth by ozonated solutions
Proceedings paper2000, Cleaning Technology in Semiconductor Device Manufacturing. Proceedings of the 6th International Symposium, 17/10/1999, p.407-415Publication A mechanism for the silicon oxide growth by ozonated solutions
Meeting abstract1999, Electrochemical Society Fall Meeting: 6th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, 17/10/1999, p.1117Publication A wet chemical method for the determination of thickness of SiO2 layers below the nanometer level
; ; ; Journal article1999, J. Electrochem. Soc., (146) 5, p.1873-1878Publication Can we increase the efficiency of organic contamination removal by ozone/di-water processes by using additives
Oral presentation2002, UCPSS - Ultra Clean Processing Technology SymposiumPublication Can we increase the efficiency of organic contamination removal by ozone/Di-water processes by using additives?
Proceedings paper2003, Ultra Clean Processing of Silicon Surfaces 2002 - UCPSS, 16/09/2002, p.215-219Publication Determination of degradation products in O3/DI processes
Oral presentation2001, 15th World Congress of the International Ozone Association; 10-15 September 2001; London, UK.Publication Determination of photoresist degradation products in O3/DI water processing
; ; Proceedings paper2001, Ultra Clean Processing of Silicon Surfaces 2000: Proceedings of the 5th International Conference - UCPSS, 18/09/2000, p.207-210Publication Effect of additives on the removal efficiency of photoresist by ozone/Di-water processes; experimental study
; ; ; Vinckier, ChrisProceedings paper2003, Ultra Clean Processing of Silicon Surfaces 2002 - UCPSS, 16/09/2002, p.101-105Publication Materials compatibility and organic build-up during ozone-based cleanings of semiconductor devices
Proceedings paper2001, Ultra Clean Processing of Silicon Surfaces 2000: Proceedings of the 5th International Conference - UCPSS, 18/09/2000, p.63-66Publication On the application of a thin ozone based wet chemical oxide as an interface for ALD high-k deposition
; ; ; ; Publication On the application of a thin ozone based wet chemical oxide as an interface for ALD high-k deposition
; ; ; ; Publication Photoresist stripping by Ozone/water processes: effect of additives
Proceedings paper2005, Ultra Clean Processing of Silicon Surfaces VII: Proceedings of the 7th International Symposium, 20/09/2004, p.309-313Publication Removal of photoresist by O3DI water processes: determination of degradation products
Proceedings paper2002, Cleaning Technology in Semiconductor Device Manufacturing VII, 4/09/2001, p.77-84Publication Removal of photoresist by O3DI water processes: determination of degradation products
Meeting abstract2001, 200th Meeting of the Electrochemical Society: 7th International Symposium on Cleaning Technology in Semiconductor Device Manufac, 2/09/2001Publication Surface characterization after different wet chemical cleans
Proceedings paper2001, Ultra Clean Processing of Silicon Surfaces 2000: Proceedings of the 5th International Conference - UCPSS, 18/09/2000, p.67-70Publication The application of ozone in semiconductor cleaning processes - the solubility issue
Journal article2001, Journal of the Electrochemical Society, (148) 9, p.G487-G493Publication The increasing importance of the use of ozone in micro-electronics industry
Oral presentation2001, 15th World Congress of the International Ozone Association; 10-15 September 2001; London, UK.Publication The ozone solubility and its decay in aqueous solutions: crucial issues in ozonated chemistries for semiconductor cleaning
Proceedings paper2001, Ultra Clean Processing of Silicon Surfaces 2000: Proceedings of the 5th International Conference - UCPSS, 18/09/2000, p.211-214Publication The removal of organic contamination by O3/DI water processes: a theoretical study
Meeting abstract2001, 200th Meeting of the Electrochemical Society: 7th International Symposium on Cleaning Technology in Semiconductor Device Manufac, 2/09/2001