Browsing by Author "Dewulf, Daan"

Alternative high-k dielectrics for semiconductor applications

Alternative high-k dielectrics for semiconductor applications

Aqueous chemical solution deposition of LuFeO3 thin films in view of energy storage applications

Atomic layer deposition of gadolinium aluminate layers using Gd(iPrCp)3, TMA, and O3 or H2O

Atomic layer deposition of Gd-doped HfO2 thin films

Development of an aqueous vanadium precursor for the chemical solution deposition of V2O5 films

Dielectric Nb2O5 and niobates: synthesis, material properties and consequences for electrical properties

Gadolinium-niobates and -tantalates: amorphous high-k materials by aqueous CSD

Gd(III)-Nb(V)-oxides: high-k materials screened by aqueous CSD

Insight in Gd(III)-Nb(V)-oxides: high-k materials screened by aqueous CSD

Interfacial reactions of Gd- and Nb-oxide based high-k layers deposited by aqueous chemical solution deposition

Properties of ultrathin high permittivity NbTaO films prepared by aqueous chemical solution deposition

Stabilization of ambient sensitive atomic layer deposited lanthanum aluminates by annealing and in-situ capping

Transparent conducting oxide films of group V doped titania prepared by aqueous chemical solution deposition

V6O13 films by control of the oxidation state from aqueous precursor to crystalline phase