Browsing by Author "Doise, Jan"
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Publication A progress report on DSA of high-chi silicon containing block co-polymers
Publication Contact hole multiplication using grapho-epitaxy directed self-assembly: process choices, template optimization, and placement accuracy
Oral presentation2014, FujiFilm Electronic Materials WrokshopPublication Contact hole multiplication using grapho-epitaxy directed self-assembly: process choices, template optimization, and placement accuracy
Proceedings paper2014, 30th European Mask and Lithography Conference - EMLC, 24/06/2014, p.92310RPublication Contact hole multiplication using grapho-epitaxy directed self-assembly: process choices, template optimization, and placement accuracy
Oral presentation2014, Photomask Technology (BACUS 2014)Publication Continued Optimization of Point-Of-Use Filtration for Metal Oxide Photoresists to Reduce Defect Density
Proceedings paper2023, Conference on Advances in Patterning Materials and Processes XL, FEB 27-MAR 01, 2023, p.Art. 124980APublication Controlling placement error and dimensional variability in templated DSA
Meeting abstract2016, Chemical Research in Flanders, 24/10/2016Publication Defect mitigation in sub-20 nm patterning with high-chi, silicon containing block copolymers
Proceedings paper2018, 4th International Symposium on DSA, 11/11/2018Publication Design strategy for layout of Sub-Resolution Directed Self-Assembly Assist Features (SDRAFs)
Proceedings paper2016, Electron, Ion, and Photon Beam Technology and Nanofrabrication - EIPBN, 31/05/2016, p.5C4Publication Development of high-chi directed self-assembly process based on key learning from PS-b-PMMA system
Proceedings paper2021, Advances in Patterning Materials and Processes XXXVIII, 21/02/2021, p.116120PPublication DSA graphoepitaxy calibrations for contact hole multiplication
Proceedings paper2015, Advances in Patterning Materials and Processes XXXII, 22/02/2015, p.94250YPublication Dual brush process for selective surface modification in graphoepitaxy directed self-assembly
Journal article2017, Journal of Micro/Nanolithography MEMS and MOEMS, (16) 3, p.33503Publication Dual brush process for selective surface modification in graphoepitaxy directed self-assembly
Proceedings paper2017, Advances in Patterning Materials and Processes XXXIV, 26/02/2017, p.101460RPublication Enabling 0.33NA EUV lithography patterning towards MP16 SADP semi-damascene metallization, setting the benchmark for High-NA EUV
; ; ; ; Van den Heuvel, DieterProceedings paper2024, 2024 International Conference on Extreme Ultraviolet Lithography, SEP 30-OCT 03, 2024Publication EUV patterned templates with grapho-epitaxy DSA at the N5/N7 logic nodes
Proceedings paper2016, Extreme Ultraviolet (EUV) Lithography VII, 21/02/2016, p.97761WPublication Impact of annealing temperature on DSA process: toward faster assembly kinetics
Proceedings paper2018, Advances in Patterning Materials and Processes XXXV, 24/02/2018, p.105860TPublication Impact of DSA process variability on circuit performance
Proceedings paper2016-10, International Symposium on DSA, 11/10/2016Publication Impact of template shape on CDU and pattern placement for grapho-epitaxy DSA
Proceedings paper2016, DSA Symposium, 11/10/2016Publication Impact of template shape on pattern placement and CDU for grapho-epitaxy DSA
Proceedings paper2016, DSA Symposium, 11/10/2016Publication Implementation of DSA for electrical test vehicles at the 7 nm node
Proceedings paper2015, E-MRS Spring Meeting, 11/05/2015
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