Browsing by Author "Hoenicke, Philipp"

A compact vibration reduced set-up for scanning nm-XRF and STXM

Grazing incidence X-ray fluorescence analysis for the characterization of Ge1-xSnx thin films

Mask absorber development to enable next-generation EUVL

NEXAFS characterization of inorganic and organic materials for semiconductor application

Pushing the boundaries of EUV scatterometry: reconstruction of complex nanostructures for next-generation transistor technology

Quantification of high-K nanolayers for semiconductor applications using synchrotron radiation and calibrated instrumentation

Reference-free, depth dependent characterization of nanoscale materials by combined X-ray reflectivity and grazing incidence X-ray fluorescence analysis

Reference-free, depth-dependent characterization of nanoscaled materials using a combined grazing incidence X-ray fluorescence and X-ray reflectometry approach

Reference-free, in-depth characterization of nanoscaled systems with advanced grazing incidence X-ray fluorescence analysis

Simultaneous Dimensional and Analytical Characterization of Ordered Nanostructures

Small target compatible dimensional and analytical metrology for semiconductor nanostructures using X-ray fluorescence techniques

Soft x-ray spectroscopy reveals chemical information beneath the surface of organic photovoltaic devices

Study of EUV reticle storage effects through exposure on EBL2 and NXE

Thermal stability and relaxation mechanisms in compressively-strained Ge0.94Sn0.06 thin films grown by molecular beam epitaxy

Thermally induced pit formation and Sn diffusion in strained GeSn films

Time-frequency analysis assisted determination of ruthenium optical constants in the sub-EUV spectral range 8 nm-23.75 nm