Browsing by Author "Kim, Ryan Ryoung Han"
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Publication Design, patterning, and process integration overview for 2nm node
Proceedings paper2022, Conference on DTCO and Computational Patterning, APR 24-MAY 27, 2022, p.120520FPublication EUV low-n attenuated phase-shift mask on random logic Via single patterning at pitch 36nm
; ; ; ; ; Proceedings paper2022-05-26, Conference on Optical and EUV Nanolithography XXXV Part of SPIE Advanced Conference, APR 24-MAY 27, 2022, p.120510PPublication Multi-Patterning Options for 5nm and Below_SADP, SAQP, SALELE
Journal article2019, White paper on Mentor graphicsPublication SAQP spacer merge and EUV self-aligned block decomposition at 28nm metal pitch on imec 7nm node
Meeting abstract2019, Design-Process-Technology Co-optimization for Manufacturability XIII, 24/02/2019, p.109620NPublication Source mask optimization ( SMO) study for high-NA EUV lithography to achieve single patterning on random logic metal
Proceedings paper2024, Conference on DTCO and Computational Patterning III, FEB 26-29, 2024, p.Art. 129540X