Browsing by Author "Kluth, Jon"
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Publication Growth and characterization of single and mixed metal oxides by ALCVD on various surfaces for high-k gate stack applications
Oral presentation2002, Atomic Layer Deposition Conference - ALDPublication Growth and physical properties of MOCVD-deposited hafnium oxide films and their properties on silicon
Proceedings paper2003, Novel Materials and Processes for Advanced CMOS, 2/12/2002, p.197-202Publication Integration issues of polysilicon with high k dielectrics deposited by Atomic Layer Chemical Vapor Deposition
Proceedings paper2002, Semiconductor Silicon 2002. Proceedings of the 9th International Symposium on Silicon Materials Science and Technology, 12/05/2002, p.747-760Publication Issues, achievements and challenges towards integration of high-k dielectrics
Proceedings paper2002, Frontiers in Electronics. Future Chips. Proceedings of the 2002 Workshop, 6/01/2002, p.?-?Publication Physical characterization of high-k gate stacks deposited on HF-last surfaces
Proceedings paper2001, Ectended Abstracts of the International Workshop on Gate Insulator. IWGI 2001, 1/11/2001, p.86-92Publication Scaling of high-k dielectrics towards sub-1nm EOT
Proceedings paper2003, IEEE International Symposium on VLSI Technology, Systems, and Applications, 23/04/2003, p.251-254Publication The influence of defects on campatibility and yield of the HfO2-polysilicon gate stack for CMOS integration
Proceedings paper2003, Novel Materials and Processes for Advanced CMOS, 2/12/2002, p.335-340