Browsing by Author "Koret, Roy"
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Publication Metrology of Thin Resist for High NA EUVL
Proceedings paper2022, Conference on Metrology, Inspection, and Process Control XXXVI Part of SPIE Advanced Lithography and Patterning Conference, FEB 24-MAY 27, 2022, p.12053OOPublication Plasma halogenated amorphous carbon as growth inhibiting layer for area-selective deposition of titanium oxide
Proceedings paper2020, Metrology, Inspection, and Process Control for Microlithography XXXIV, 23/02/2020, p.113250YPublication Scatterometry and AFM measurement combination for area selective deposition process characterization
Proceedings paper2019, Metrology, Inspection, and Process Control for Microlithography XXXIII, 24/02/2019, p.109591NPublication Scatterometry and X-ray metrology for in-line control of spin-transfer torque magnetic random access memory (STT-MRAM) devices
Oral presentation2018, SPIE Advanced Lithography ConferencePublication Scatterometry solutions for 14nm half-pitch BEOL layers patterned by EUV single exposure
Proceedings paper2021, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV, 22/02/2021, p.116112APublication Selectivity process control using in-line XPS for self-assembly monolayer-based selective deposition process
Oral presentation2018, SPIE Aadvanced LitographyPublication Spectroscopy: A new route towards critical-dimension metrology of the cavity etch of nanosheet transistors
Proceedings paper2021, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV, 21/02/2021, p.116111Q