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Browsing by Author "Koret, Roy"

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    Metrology of Thin Resist for High NA EUVL

    Lorusso, Gian  
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    Beral, Christophe  
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    Bogdanowicz, Janusz  
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    De Simone, Danilo  
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    Hasan, Mahmudul  
    Proceedings paper
    2022, Conference on Metrology, Inspection, and Process Control XXXVI Part of SPIE Advanced Lithography and Patterning Conference, FEB 24-MAY 27, 2022, p.12053OO
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    Plasma halogenated amorphous carbon as growth inhibiting layer for area-selective deposition of titanium oxide

    Krishtab, Mikhail  
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    Hung, Joey  
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    Koret, Roy
    ;
    Turovets, Igor
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    Shah, Kavita
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    Rangarajan, Srinivasan
    Proceedings paper
    2020, Metrology, Inspection, and Process Control for Microlithography XXXIV, 23/02/2020, p.113250Y
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    Scatterometry and AFM measurement combination for area selective deposition process characterization

    Saib, Mohamed  
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    Moussa, Alain  
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    Charley, Anne-Laure  
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    Leray, Philippe  
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    Hung, Joey  
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    Koret, Roy
    Proceedings paper
    2019, Metrology, Inspection, and Process Control for Microlithography XXXIII, 24/02/2019, p.109591N
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    Scatterometry and X-ray metrology for in-line control of spin-transfer torque magnetic random access memory (STT-MRAM) devices

    Crotti, Davide  
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    Swerts, Johan  
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    Yasin, Farrukh  
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    Jossart, Nico  
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    Souriau, Laurent  
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    Kundu, Shreya  
    Oral presentation
    2018, SPIE Advanced Lithography Conference
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    Scatterometry solutions for 14nm half-pitch BEOL layers patterned by EUV single exposure

    Das, Sayantan  
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    Hung, Joey  
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    Halder, Sandip  
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    Koret, Roy
    ;
    Turovets, Igor
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    Charley, Anne-Laure  
    Proceedings paper
    2021, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV, 22/02/2021, p.116112A
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    Selectivity process control using in-line XPS for self-assembly monolayer-based selective deposition process

    Armini, Silvia  
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    Herregods, Sebastiaan  
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    Tokei, Zsolt  
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    Charley, Anne-Laure  
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    Leray, Philippe  
    Oral presentation
    2018, SPIE Aadvanced Litography
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    Spectroscopy: A new route towards critical-dimension metrology of the cavity etch of nanosheet transistors

    Bogdanowicz, Janusz  
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    Oniki, Yusuke  
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    Kenis, Karine  
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    Muraki, Yusuke  
    ;
    Nuytten, Thomas  
    Proceedings paper
    2021, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV, 21/02/2021, p.116111Q

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