Browsing by Author "Mack, Chris A."
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Publication Improvements in the measurement of local critical dimension uniformity for holes and pillars
Proceedings paper2023, International Conference on Extreme Ultraviolet Lithography, OCT 02-05, 2023, p.Art. 127500GPublication Low-Voltage Aberration-Corrected SEM Metrology of Thin Resist for High-NA EUVL
Proceedings paper2022, Conference on Metrology, Inspection, and Process Control XXXVI Part of SPIE Advanced Lithography and Patterning Conference, FEB 24-MAY 27, 2022, p.120530PPublication Measuring and Analyzing Contact Hole Variations in EUV Lithography
Proceedings paper2021, Conference on Extreme Ultraviolet (EUV) Lithography XII, FEB 22-26, 2021, p.1160913Publication Probabilistic process window: a new approach to focus-exposure analysis
Journal article2023, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (22) 2, p.Art. 021007Publication Probabilistic Process Window: A new approach to focus-exposure analysis
Proceedings paper2022, Conference on Metrology, Inspection, and Process Control XXXVI Part of SPIE Advanced Lithography and Patterning Conference, FEB 24-MAY 27, 2022, p.1205307Publication Statistical simulation of resist at EUV and ArF
Proceedings paper2009, Advances in Resist Materials and Processing Technology XXVI, 22/02/2009, p.727319Publication Unbiased roughness measurements from low signal-to-noise ratio scanning electron microscope images
Journal article2023, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (22) 2, p.Art. 021006Publication Unbiased Roughness Measurements from Low Signal-to-Noise Ratio SEM Images
Proceedings paper2022, Conference on Metrology, Inspection, and Process Control XXXVI Part of SPIE Advanced Lithography and Patterning Conference, FEB 24-MAY 27, 2022, p.120530K