Browsing by Author "Mantl, S."
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Publication Asymmetric strain relaxation in patterned SiGe layer: a means to enhance carrier mobilities in Si cap layers
Journal article2007-01, Applied Physics Letters, (90) 3, p.32108Publication Charge pumping and mobility measurements on strained SOI MOSFETs
;Schmidt, M. ;Gottlob, H. D. B. ;Echermeyer, T. ;Wahlbrink, T. ;Mollenhauer, T. ;Baus, M.Buca, D.M.Proceedings paper2007, 8th European Workshop on ULtimate Integration of Silicon - ULIS, 14/03/2007Publication Dislocation nucleation and movement in helium implanted SiGe/Si(001)Heterostructures studied by in-situ TEM
;Hueging, N. ;Luysberg, M. ;Urban, K. ;Buca, D. ;Holländer, B. ;Mantl, S.Morschbacher, M.Oral presentation2004, Dislocation MeetingPublication Enhancement of the relaxation of SiGe layers by He ion implantation using a delta-Si:C layer
Oral presentation2007, MRS 2007 Spring Meeting Symposium F: Semiconductor Defect Engineering - Materials, Synthetic Structures and Devices IIPublication Fabrication and characterization of strained Si-on-insulator (sSOI)
Proceedings paper2007, 8th European Workshop on ULtimate Integration of Silicon - ULIS, 14/03/2007Publication Fabrication, characterization and modeling of strained SOI MOSFETs with very large effective mobility
;Driussi, F. ;Esseni, D. ;Selmi, L. ;Schmidt, M. ;Lemme, M. ;Kurz, H. ;Buca, D. ;Mantl, S.Luysberg, M.Proceedings paper2007, Proceedings of the 37th European Solid-State Device Research Conference - ESSDERC, 11/09/2007, p.315-318Publication Formation of ternary Ni-silicide on relaxed and strained SiGe layers
Journal article2004, Microelectronic Engineering, (76) 1_4, p.285-289Publication Growth of strained Si on He ion implanted Si/SiGe heterostructures
;Buca, D. ;Feste, S. ;Hollander, B. ;Mantl, S.; ; ;Carius, R.Schaefer, H.Proceedings paper2005-04, 6th European Conference on Integration in Silicon - ULIS, 7/04/2005, p.11-14Publication He implantation induced relaxation of SiGe/Si: nucleation of dislocations and coarsening of He bubbles
;Luysberg, M. ;Hueging, N. ;Urban, K. ;Buca, D. ;Holländer, B. ;Mantl, S.Morschbacher, M.Proceedings paper2004, Program and Abstracts Book 2nd International SiGe Technology and Device Meeting - ISTDM, 17/05/2004, p.117-118Publication Improvement of He ion induced SiGe layer relaxation by a thin Si:C layer
Proceedings paper2008, 4th International SiGe Technology and Device Meeting, 11/05/2008, p.40-41Publication In-situ TEM on He implantation induced defects in SiGe/Si
;Luysberg, Martina ;Hueging, N. ;Urban, K. ;Buca, D. ;Holländer, B. ;Mantl, S.Morschbacher, M.Proceedings paper2004, Proceedings of the 13th European Microscopy Congress. Volume 2: Materials Sciences, 22/08/2004, p.377-378Publication Large current enhancement in n-MOSFETs with strained Si on insulator
;Mantl, S. ;Buca, D. ;Zhao, Q.T. ;Hollaender, B. ;Feste, S. ;Luysberg, M. ;Reiche, M.Gösele, U.Proceedings paper2007, International Semiconductor Device Research Symposium - ISDRS, 12/12/2007Publication Microstructure evolution effects of helium redistribution in as-implanted silicon and Si0.8Ge0.2/Si heterostructures
;Morschbacher, M.J. ;da Silva, D.L. ;Fichtner, P.F.P. ;Oliviero, E. ;Behar, M.Zawislak, F.C.Journal article2004, Nuclear Instruments & Methods in Physics Research B, 219-220, p.703-707Publication Plasma hydrogenation of strain-relaxed SiGe/Si heterostructure for layer transfer
;Chen, Peng ;Chu, Paul K. ;Höchbauer, T. ;Nastasi, M. ;Buca, D. ;Mantl, S.Theodore, N. DavidJournal article2004, Applied Physics Letters, (85) 21, p.4944-4946Publication Preparation and characterization of rare earth scandates as alternative gate oxide materials
;Wagner, M. ;Heeg, T. ;Schubert, J. ;Zhao, Chao; ; Proceedings paper2005, 6th European Conference on Ultimate Integration of Silicon - ULIS, 7/04/2005Publication Scanning spreading resistance microscopy of two-dimensional diffusion of boron implanted in free-standing silicon nanostructures
Journal article2005, Journal of Vacuum Science & Technology B, (23) 1, p.76-79Publication Strain relaxation of pseudomorphic Si1-xGe/Si(100) heterostructures after Si+ ion implantation
;Holländer, B. ;Buca, D. ;Mörschbächer, M. ;Lenk, St. ;Mantl, S. ;Herzog, H.J. ;Hackbarth, Th.Journal article2004, Journal of Applied Physics, (96) 3, p.1745-1747Publication Strain relaxation of pseudomorphic Si1-xGex/Si(100) heterostructures by Si+ ion implantation
;Holländer, B. ;Buca, D.M. ;Lenk, S. ;Mantl, S. ;Herzog, H.J. ;Hackbarth, T.; Oral presentation2004, 14th International Conference on Ion Beam Modification of Materials - IBMMPublication Strain relaxation of SiGe buffers on Si and SOI wafers induced by He+ ion implantation and thermal annealing
;Mantl, S. ;Holländer, B. ;Hüging, N. ;Luysberg, M. ;Lenk, St. ;Hogg, S.M. ;Herzog, H.-J.Hackbarth, T.Oral presentation2003, 12th EURO-CVD WorkshopPublication Strained Si on relaxed SiGe made by ion implantation and strain transfer
;Mantl, S. ;Buca, D. ;Holländer, B. ;Mörschbächer, M. ;Trinkhaus, H. ;Luysberg, M.Hueging, N.Proceedings paper2004-10, SiGE: Materials, Processing, and Devices, 3/10/2004, p.731-740