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Browsing by Author "Mantl, S."

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    Asymmetric strain relaxation in patterned SiGe layer: a means to enhance carrier mobilities in Si cap layers

    Buca, D.
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    Hollander, B.
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    Feste, S.
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    Lenk, S.
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    Trinkaus, H.
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    Mantl, S.
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    Loo, Roger  
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    Caymax, Matty  
    Journal article
    2007-01, Applied Physics Letters, (90) 3, p.32108
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    Charge pumping and mobility measurements on strained SOI MOSFETs

    Schmidt, M.
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    Gottlob, H. D. B.
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    Echermeyer, T.
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    Wahlbrink, T.
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    Mollenhauer, T.
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    Baus, M.
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    Buca, D.M.
    Proceedings paper
    2007, 8th European Workshop on ULtimate Integration of Silicon - ULIS, 14/03/2007
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    Dislocation nucleation and movement in helium implanted SiGe/Si(001)Heterostructures studied by in-situ TEM

    Hueging, N.
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    Luysberg, M.
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    Urban, K.
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    Buca, D.
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    Holländer, B.
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    Mantl, S.
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    Morschbacher, M.
    Oral presentation
    2004, Dislocation Meeting
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    Enhancement of the relaxation of SiGe layers by He ion implantation using a delta-Si:C layer

    Buca, D.
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    Goryll, M.
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    Hollaender, B.
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    Trinkaus, H.
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    Mantl, S.
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    Loo, Roger  
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    Nguyen, Duy
    Oral presentation
    2007, MRS 2007 Spring Meeting Symposium F: Semiconductor Defect Engineering - Materials, Synthetic Structures and Devices II
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    Fabrication and characterization of strained Si-on-insulator (sSOI)

    Zhao, Q.T.
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    Buca, D.
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    Feste, S.
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    Goryll, M.
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    Loo, Roger  
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    Reiche, M.
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    Mantl, S.
    Proceedings paper
    2007, 8th European Workshop on ULtimate Integration of Silicon - ULIS, 14/03/2007
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    Fabrication, characterization and modeling of strained SOI MOSFETs with very large effective mobility

    Driussi, F.
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    Esseni, D.
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    Selmi, L.
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    Schmidt, M.
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    Lemme, M.
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    Kurz, H.
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    Buca, D.
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    Mantl, S.
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    Luysberg, M.
    Proceedings paper
    2007, Proceedings of the 37th European Solid-State Device Research Conference - ESSDERC, 11/09/2007, p.315-318
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    Formation of ternary Ni-silicide on relaxed and strained SiGe layers

    Zhao, Q.T.
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    Buca, D.
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    Lenk, S.
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    Loo, Roger  
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    Caymax, Matty  
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    Mantl, S.
    Journal article
    2004, Microelectronic Engineering, (76) 1_4, p.285-289
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    Growth of strained Si on He ion implanted Si/SiGe heterostructures

    Buca, D.
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    Feste, S.
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    Hollander, B.
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    Mantl, S.
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    Loo, Roger  
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    Caymax, Matty  
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    Carius, R.
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    Schaefer, H.
    Proceedings paper
    2005-04, 6th European Conference on Integration in Silicon - ULIS, 7/04/2005, p.11-14
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    He implantation induced relaxation of SiGe/Si: nucleation of dislocations and coarsening of He bubbles

    Luysberg, M.
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    Hueging, N.
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    Urban, K.
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    Buca, D.
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    Holländer, B.
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    Mantl, S.
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    Morschbacher, M.
    Proceedings paper
    2004, Program and Abstracts Book 2nd International SiGe Technology and Device Meeting - ISTDM, 17/05/2004, p.117-118
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    Improvement of He ion induced SiGe layer relaxation by a thin Si:C layer

    Buca, D.
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    Trinkaus, H.
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    Holländer, B.
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    Loo, Roger  
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    Nguyen, Duy
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    Mantl, S.
    Proceedings paper
    2008, 4th International SiGe Technology and Device Meeting, 11/05/2008, p.40-41
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    In-situ TEM on He implantation induced defects in SiGe/Si

    Luysberg, Martina
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    Hueging, N.
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    Urban, K.
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    Buca, D.
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    Holländer, B.
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    Mantl, S.
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    Morschbacher, M.
    Proceedings paper
    2004, Proceedings of the 13th European Microscopy Congress. Volume 2: Materials Sciences, 22/08/2004, p.377-378
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    Large current enhancement in n-MOSFETs with strained Si on insulator

    Mantl, S.
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    Buca, D.
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    Zhao, Q.T.
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    Hollaender, B.
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    Feste, S.
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    Luysberg, M.
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    Reiche, M.
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    Gösele, U.
    Proceedings paper
    2007, International Semiconductor Device Research Symposium - ISDRS, 12/12/2007
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    Microstructure evolution effects of helium redistribution in as-implanted silicon and Si0.8Ge0.2/Si heterostructures

    Morschbacher, M.J.
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    da Silva, D.L.
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    Fichtner, P.F.P.
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    Oliviero, E.
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    Behar, M.
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    Zawislak, F.C.
    Journal article
    2004, Nuclear Instruments & Methods in Physics Research B, 219-220, p.703-707
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    Plasma hydrogenation of strain-relaxed SiGe/Si heterostructure for layer transfer

    Chen, Peng
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    Chu, Paul K.
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    Höchbauer, T.
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    Nastasi, M.
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    Buca, D.
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    Mantl, S.
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    Theodore, N. David
    Journal article
    2004, Applied Physics Letters, (85) 21, p.4944-4946
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    Preparation and characterization of rare earth scandates as alternative gate oxide materials

    Wagner, M.
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    Heeg, T.
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    Schubert, J.
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    Zhao, Chao
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    Richard, Olivier  
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    Caymax, Matty  
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    Afanasiev, Valeri  
    Proceedings paper
    2005, 6th European Conference on Ultimate Integration of Silicon - ULIS, 7/04/2005
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    Scanning spreading resistance microscopy of two-dimensional diffusion of boron implanted in free-standing silicon nanostructures

    Kluth, S.M.
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    Alvarez, C.
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    Trellenkamp, St.
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    Moers, J.
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    Mantl, S.
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    Kretz, J.
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    Vandervorst, Wilfried  
    Journal article
    2005, Journal of Vacuum Science & Technology B, (23) 1, p.76-79
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    Strain relaxation of pseudomorphic Si1-xGe/Si(100) heterostructures after Si+ ion implantation

    Holländer, B.
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    Buca, D.
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    Mörschbächer, M.
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    Lenk, St.
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    Mantl, S.
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    Herzog, H.J.
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    Hackbarth, Th.
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    Loo, Roger  
    Journal article
    2004, Journal of Applied Physics, (96) 3, p.1745-1747
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    Strain relaxation of pseudomorphic Si1-xGex/Si(100) heterostructures by Si+ ion implantation

    Holländer, B.
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    Buca, D.M.
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    Lenk, S.
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    Mantl, S.
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    Herzog, H.J.
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    Hackbarth, T.
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    Loo, Roger  
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    Caymax, Matty  
    Oral presentation
    2004, 14th International Conference on Ion Beam Modification of Materials - IBMM
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    Strain relaxation of SiGe buffers on Si and SOI wafers induced by He+ ion implantation and thermal annealing

    Mantl, S.
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    Holländer, B.
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    Hüging, N.
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    Luysberg, M.
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    Lenk, St.
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    Hogg, S.M.
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    Herzog, H.-J.
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    Hackbarth, T.
    Oral presentation
    2003, 12th EURO-CVD Workshop
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    Strained Si on relaxed SiGe made by ion implantation and strain transfer

    Mantl, S.
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    Buca, D.
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    Holländer, B.
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    Mörschbächer, M.
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    Trinkhaus, H.
    ;
    Luysberg, M.
    ;
    Hueging, N.
    Proceedings paper
    2004-10, SiGE: Materials, Processing, and Devices, 3/10/2004, p.731-740
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