Browsing by Author "Marinov, Daniil"

2D materials: roadmap to CMOS integration

3D FinFET gate etch for advanced CMOS scaling

A route towards the fabrication of 2D heterostructures using atomic layer etching combined with selective conversion

Ar and H2 plasma and neutral/ion beam treatment of EUV resist

Challenges of large area integration of 2D materials in CMOS line

Development and characterization of a fast neutral beam source for damage-free etching

Development of a novel wafer probe for in-situ measurements

Development of a novel wafer probe for in-situ measurements

Development of a novel wafer-probe for in situ measurements of thin film properties

Dry cleaning and doping of MX2 for contact engineering

Dry cleaning of WS2 using reducing downstream plasma

Extraction and neutralization of positive and negative ions from a pulsed electronegative inductively coupled plasma

High performance strained Germanium Gate All Around p-channel devices with excellent electrostatic control for sub-30 nm Lg

Kinetic Monte Carlo simulations of plasma-surface reactions on heterogeneous surfaces

Mechanisms of hydrogen atom interactions with MoS2 monolayer

Reactive plasma cleaning and restoration of transition metal dichalcogenide monolayers