Browsing by Author "Martin Hoyas, Ana"

A novel approach to characterise a low-k dielectric polymer surface

A novel approach to characterization of a low-k dielectric polymer surface

Alkaline cleaning of silicon wafers: additives for the prevention of metal contamination

Atomic layer deposited barriers for copper interconnects

Atomic layer deposition of barriers for interconnect

Atomic-layer deposited barrier and seed layers for interconnects

Characterization of ALD diffusion barrier on low-k dielectric polymer by contact angle measurements

Characterization of atomic layer deposited nanoscale structure on dense dielectric substrates by X-ray reflectivity

Characterization of the growth of atomic layer deposited WNxCy films on various substrates

Effect of plasma treatments on a low-k dielectric polymer surface

Growth and characterization of atomic layer deposited WC0.7N0.3 on polymer films

Growth and characterization of atomic layer deposited WCxNy

Implementation of atomic layer deposition in advanced semiconductor processes

Interface characterization of nanoscale laminate structures on dense dielectric substrates by X-ray reflectivity

Interface characterization of nanoscale laminate structures on dense dielectric substrates by x-ray reflectivity

Plasma sealing of a low-k dielectric polymer

Plasma treatments of a low-k dielectric polymer surface

Thermal desorption spectrometry as a method of analysis for advanced interconnect materials