Browsing by Author "Myronov, M."
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Publication Defect-related excess low-frequency noise in Ge-on-Si pMOSFETs
Journal article2011, IEEE Electron Device Letters, (32) 1, p.87-89Publication High hole mobility in 65 nm strained Ge p-channel field effect transistors with HfO2 gate dielectric
; ; ; ;Dobbie, Andrew ;Myronov, M.Kobayashi, MasaharuJournal article2011, Japanese Journal of Applied Physics, (50) 4, p.04DC17Publication High hole-mobility 65nm biaxially-strained Ge-pFETs: fabrication, analysis and optimization
; ; ; ;Dobbie, Andrew ;Myronov, M.Kobayashi, MasaharuProceedings paper2010, International Conference on Solid-State Devices and Materials - SSDM, 22/09/2010, p.1038-1039Publication Low-frequency noise characterizations of strained germanium pMOSFETs
; ; ; ; ;Dobbie, A. ;Myronov, M.Whall, T.Journal article2011, IEEE Transactions on Electron Devices, (58) 9, p.3132-3139Publication Low-frequency noise in strained and relaxed Ge pMOSFETs
Proceedings paper2010, International Conference on Solid-State and Integrated Circuit Technology, 1/11/2010Publication TEM analysis of Ge-on-Si MOSFET structures with HfO2 dielectric for high performance PMOS device technology
;Norris, D.J. ;Walther, T. ;Cullis, A.G. ;Myronov, M. ;Dobbie, A. ;Whall, T.Parker, E.H.C.Journal article2010, Journal of Physics Conference Series, (209) 1, p.12061Publication TEM analysis of Si-passivated Ge-on-Si MOSFET structures for high performance PMOS device technology
;Norris, D.J. ;Ross, I.M. ;Cullis, A.G. ;Walther, T. ;Myronov, M. ;Dobbie, A.Whall, T.Journal article2010, Journal of Physics Conference Series, (241) 1, p.12044