Browsing by Author "Nafus, Kathleen"
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Publication A CDU comparison of double-patterning process options using Monte Carlo simulation
Proceedings paper2009, Optical Microlithography XXII, 22/02/2009, p.72741UPublication Addressing the challenges of Directed Self Assembly implementation
Proceedings paper2011, International Symposium on Lithography Extensions, 20/10/2011Publication Advanced PnR Logic Patterning Enabled by High-NA EUV Lithography
Proceedings paper2025, 2025 Conference on Optical and EUV Nanolithography, 2025-04-22, p.1342410-1Publication Advances and challenges in dual-tone development process optimization
Proceedings paper2009, Optical Microlithography XXII, 22/02/2009, p.72740IPublication Advances in dual-tone development for pitch frequency doubling
Proceedings paper2010, Optical Microlithography XXIII, 21/02/2010, p.76400EPublication Advances in process optimization for dual-tone development as a double patterning technique
Proceedings paper2008, 5th International Symposium on Immersion Lithography Extensions, 22/09/2008Publication All track directed self-assembly of block copolymers: process flow and origin of defects
Proceedings paper2012, Alternative Lithographic Technologies IV, 12/02/2012, p.83230DPublication Approaches to Enable Patterning of Tight Pitches towards High NA EUV
Publication Calibrated PSCAR stochastic simulation
Publication Capture probability of assembly defects in 14 nm half-pitch line/space DSA patterns
Meeting abstract2015, 41st International Conference on Micro- and Nanofabrication - MNE, 21/09/2015, p.Wed-A6-c1Publication Comparison of directed self-assembly integrations
Proceedings paper2012, Advances in Resist Materials and Processing Technology XXIX, 12/02/2012, p.83250GPublication Contact hole CD uniformity repair through directed self-assembly of cylindrical phase block copolymers
Oral presentation2012, MRS Fall M eeting Symposium S: Directed Self-Assembly for NanopatterningPublication Cryogenic etching vs P4 approaches: paths towards ultra-low damage integration of mesoporous oxide dielectric materials
Meeting abstract2014, AVS 61st International Symposium and Exhibition, 9/11/2014, p.EM-TuM-6Publication Defect capture sensitivity in 14 nm half-pitch line/space DSA patterns
Meeting abstract2014, Micro and Nano Engineering Conference - MNE, 22/09/2014Publication Defect mitigation and root cause studies in 14 nm half-pitch chemo-epitaxy directed self-assembly LiNe flow
Journal article2015, Journal of Micro/Nanolithography MEMS and MOEMS, (14) 3, p.31204Publication Defect mitigation and root cause studies in imec's 14 nm half-pitch chemo-epitaxy DSA flow
Proceedings paper2015, Alternative Lithographic Technologies VII, 22/02/2015, p.94230MPublication Determination of critical parameters for control of directed self-assembly of block copolymers using frequency multiplication
Oral presentation2012, Conference on Photopolymer Science and TechnologyPublication Determination of critical parameters for control of directed self-assembly of block copolymers using frequency multiplication
Oral presentation2012, 38th International Conference on Micro and NanoEngineering - MNEPublication Dry development rinse process for ultimate resolution Improvement via pattern collapse mitigation
Proceedings paper2015, Advances in Patterning Materials and Processes XXXII, 22/02/2015, p.942516Publication Effect of PAG distribution on ArF and EUV resist performance
Journal article2009, Journal of Photopolymer Science and Technology, (22) 1_6, p.97-104