Browsing by Author "Nafus, Kathleen"

A CDU comparison of double-patterning process options using Monte Carlo simulation

Addressing the challenges of Directed Self Assembly implementation

Advances and challenges in dual-tone development process optimization

Advances in dual-tone development for pitch frequency doubling

Advances in process optimization for dual-tone development as a double patterning technique

All track directed self-assembly of block copolymers: process flow and origin of defects

Approaches to Enable Patterning of Tight Pitches towards High NA EUV

Calibrated PSCAR stochastic simulation

Capture probability of assembly defects in 14 nm half-pitch line/space DSA patterns

Comparison of directed self-assembly integrations

Contact hole CD uniformity repair through directed self-assembly of cylindrical phase block copolymers

Cryogenic etching vs P4 approaches: paths towards ultra-low damage integration of mesoporous oxide dielectric materials

Defect capture sensitivity in 14 nm half-pitch line/space DSA patterns

Defect mitigation and root cause studies in 14 nm half-pitch chemo-epitaxy directed self-assembly LiNe flow

Defect mitigation and root cause studies in imec's 14 nm half-pitch chemo-epitaxy DSA flow

Determination of critical parameters for control of directed self-assembly of block copolymers using frequency multiplication

Determination of critical parameters for control of directed self-assembly of block copolymers using frequency multiplication

Dry development rinse process for ultimate resolution Improvement via pattern collapse mitigation

Effect of PAG distribution on ArF and EUV resist performance

Elucidating the role of imaging metrics for variability and after etch defectivity