Browsing by Author "O'Connor, Robert"

A Dy2O3-capped HfO2 dielectric and TaCx-based metals enabling low-Vt single-metal-single-dielectric gate stack

Anomalous positive-bias temperature instability of high-k/metal gate devices with Dy2O3 capping

Anomalous positive-bias temperature instability of high-k/metal gate nMOSFET devices with Dy2O3 capping

Area-Selective Deposition of AlOx and Al-Silicate for Fully Self- Aligned Via Integration

Charge trapping in MOSFETs with HfSiON dielectrics during electrical stressing

Electron energy dependence of defect generation in high-k gate stacks

Electron energy dependence of defect generation in high-k gate stacks

Evidence of a new degradation mechanism in high-k dielectrics at elevated temperatures

Implications of progressive wear-out for lifetime extrapolation of ultra-thin (EOT~1nm) SiON films

Low voltage stress-induced leakage current in 1.4 - 2.1 nm SiON and HfSiON gate dielectric layers

Methodologies for sub-1nm EOT TDDB evaluatiion

Nucleation and adhesion of ultra-thin copper films on amino-terminated self-assembled monolayers

On the use of (3-trimethoxysilylpropyl)diethylenetriamine self-assembled monolayers as seed layers for the growth of Mn based copper diffusion barrier layers

Oxygen-vacancy-induced Vt shift in La-containing devices

Reliability of HfSiON gate dielectrics

Reliability of thin ZrO2 gate dielectric layers

SILC defect generation spectroscopy in HfSiON using constant voltage stress and substrate hot electron injection

Simultaneous extraction of recoverable and permanent components contributing to bias-temperature instability

Stress induced defect generation implications of doping HfO2 with Al

Stress induced defect generation implications of doping HfO2 with Al