Browsing by Author "Ortolland, Claude"
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Publication Advanced 2D/3D simulations for laser annealed device using an atomic kinetic monte carlo approach and scanning spreading resistance microscopy (SRRM)
Proceedings paper2008, Technical Digest International Electron Devices Meeting - IEDM, 15/12/2008, p.539-542Publication Advanced USJ for high-k / metal gate CMOS devices
Meeting abstract2008, MRS Spring Meeting Symposium E: Doping Engineering for Front-End Processing, 24/03/2008, p.E4.7Publication Analysis of pocket profile deactivation and its impact on Vth variation for laser annealed device using an atomistic kinetic Monte Carlo approach
Proceedings paper2010, IEEE International Electron Devices Meeting - IEDM, 6/12/2010, p.383-386Publication Benchmarking SOI and bulk FinFET alternatives for PLANAR CMOS scaling succession
Journal article2010, Solid-State Electronics, (54) 9, p.855-860Publication Carbon-based thermal stabilization techniques for junction and silicide engineering for high performance CMOS periphery in memory applications
Proceedings paper2009, 10th International Conference on Ultimate Integration of Silicon - ULIS, 18/03/2009, p.147-150Publication Control of laser induced interface traps with in-line corona charge metrology
Proceedings paper2008, 16th Annual IEEE International Conference on Advanced Thermal Processing of Semiconductors - RTP, 30/09/2008, p.163-168Publication High-mobility Si1-xGex-channel PFETs: layout dependence and enhanced scalability, demonstrating 90% performance boost at narrow widths
Proceedings paper2010, IEEE Symposium on VLSI Technology, 15/06/2010, p.41-42Publication Influence of the process sequence and termal budget on the strain of SiC stressor layers formed by ion implantation
Proceedings paper2010, 18th IEEE International Conference on Advanced Thermal Processing of Semiconductors - RTP, 29/09/2010, p.32-40Publication Influence of the process sequence and termal budget on the straion fof SiC stressor layers formed by Ion Implantation
Meeting abstract2010-10, 18th IEEE International Conference on Advanced Thermal Processing of Semiconductors - RTP, 29/09/2010Publication Interface/bulk trap recovery after submeltl aser anneal and the impact to NBTI reliability
Journal article2010, IEEE Electron Device Letters, (31) 6, p.606-608Publication Ion-implantation-based low-cost Hk/MG process for CMOS low-power application
Proceedings paper2010, IEEE Symposium on VLSI Technology, 15/06/2010, p.185-186Publication Junction anneal sequence optimization for advanced high-k / metal gate CMOS technology
Proceedings paper2009, 9th International Workshop on Junction Technology - IWJT, 11/06/2009Publication Laser annealed junctions: pocket profile analysis using an atomistic kinetic Monte Carlo approach
Proceedings paper2010, IEEE Symposium on VLSI Technology, 15/06/2010, p.73-74Publication Laser-annealed junctions with advanced CMOS gate stacks for 32nm node: perspectives on device performance and manufacturability
Proceedings paper2008, Symposium on VLSI Technology. Digest of Technical Papers, 17/06/2008, p.186-187Publication Migrating from planar to FinFET for further CMOS scaling: SOI or bulk?
Proceedings paper2009, 39th European Solid-State Device Research Conference - ESSDERC, 14/09/2009, p.85-88Publication Migrating from planar to FinFET for further CMOS scaling: SOI or bulk?
Proceedings paper2009, 35th European Solid-State Circuits Conference - ESSCIRC, 14/09/2009, p.84-87Publication Monitoring of local and global temperature non-uniformities by means of Therma-Probe and Micro Four-Point Probe metrology
Proceedings paper2009, 17th Annual IEEE International Conference on Advanced Thermal Processing of Semiconductors - RTP, 29/09/2009Publication New carbon-based thermal stability improvement technique for NiPtSi used in CMOS technology
Oral presentation2010, Materials for Advanced Metallization ConferencePublication On the 'permanent' component of NBTI
Proceedings paper2010, IEEE International Integrated Reliability Workshop - IIRW, 17/10/2010, p.2-7Publication Optimization of post ion implant ash plasma and clean for ultra shallow extension/halo implantation
Meeting abstract2011, 4th International Workshop on Plasma Etch and Strip in Microelectronics - PESM, 5/05/2011