Browsing by Author "Pforr, Rainer"
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Publication Attenuated phase shifting masks in combination with off-axis illumination: A way towards quarter micron DUV lithography for random logic operations
Journal article1994, Microelectronic Engineering, 23, p.133-138Publication CD Control: The limiting factor for i-line and deep-UV lithography?
Proceedings paper1995, Proceedings of the Microlithography Seminar - INTERFACE'95, 29/10/1995, p.241-254Publication Evaluation of advanced I-line resists for practical 0.5*(l/NA) lithography
Proceedings paper1994, OCG Microlithography Seminar INTERFACE, 6/11/1994, p.105-124Publication Extending the Limits of Optical Lithography for Arbitrary Mask Layouts Using Attenuated Phase Shifting Masks with Optimized Illumination
Journal article1994, J. Vac. Sci. Technol. B, (12) 6, p.3783-3792Publication Feature biasing versus feature-assisted lithography. A comparison of proximity correction methods for 0.5*(l/NA) lithography
Proceedings paper1995, Optical Laser Microlithography VIII, 22/02/1995, p.150-170Publication Improvement of the focus-exposure latitude using optimised illumination and mask design
; ; ; ; van Oorschot, P.Proceedings paper1994, Optical/Laser Microlithography VII, 23/03/1994, p.65-83Publication Optical lithography techniques for 0.25 μm and below: CD control issues
Proceedings paper1995, International Symposium on VLSI Technology, Systems, and Applications. Proceedings of Technical Papers, 31/05/1995, p.24-30Publication Optimization of the optical phase shift in attenuated PSM and application to quarter micron deep-UV lithography for logics
Proceedings paper1994, Optical/Laser Microlithography VII, 02/03/1994, p.86-98