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Browsing by Author "Rakhimova, T."

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    Comparison between vacuum ultra-violet emission of CF4/Ar and CF3I/Ar plasmas in CCP chamber for low-k etching

    Zotovich, A.
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    El Otell, Ziad  
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    de Marneffe, Jean-Francois  
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    Proshina, O.
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    Lopaev, D.
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    Rakhimova, T.
    Meeting abstract
    2015, Plasma Etch and Strip in Microtechnology - PESM, 27/04/2015
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    Effect of VUV and EUV radiation on utra low-k materials damage

    Braginsky, O.
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    Kovalev, A.
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    Lopaev, D.
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    Mankelevich, Y.
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    Proshina, O.
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    Rakhimova, T.
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    Rakhimov, A.
    Proceedings paper
    2013, Advanced Interconnects for Micro- and Nanoelectronics - Materials, Processes, and Reliability, 1/04/2013, p.AA03.11
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    Experimental and theoretical study of RF capacitevely-coupled plasma in the Ar/CF4/CF3I mixtures

    Proshina, O.
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    Rakhimova, T.
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    Lopaev, D.
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    Samara, V.
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    Baklanov, Mikhaïl
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    de Marneffe, Jean-Francois  
    Journal article
    2015, Plasma Sources Science and Technology, (24) 5, p.55006
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    F atoms interaction with nanoporous OSG low-k materials

    Rakhimova, T.
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    Rakhimov, A.
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    Zyryanov, S.
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    Lopaev, D.
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    Mankelevich, Y.
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    Proshina, O.
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    Novikova, N.
    Meeting abstract
    2014, MRS Spring Meeting Symposium CC: New Materials and Processes for Interconnects, Novel Memory and Advanced Display Technologies, 15/03/2014, p.CC1.03-283
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    Interaction of atomic fluorine with porous low-k SiCOH films: modeling

    Palov, A.
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    Voronina, E.
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    Lopaev, D.
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    Mankelevich, Y.
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    Rakhimova, T.
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    Zyryanov, S.
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    Proshina, O.
    Oral presentation
    2015, 22nd International Symposium on Plasma Chemistry - ISPC
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    Interaction of F atoms with SiCOH ultra low-k films. Part I: Fluorination and damage

    Rakhimova, T.
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    Lopaev, D.
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    Mankelevich, Y.
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    Rakhimov, A.
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    Zyryanov, S.
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    Kurchikov, K.
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    Novikova, N.
    Journal article
    2015, Journal of Physics D: Applied Physics, (48) 17, p.175203
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    Interaction of F atoms with SiCOH ultra low-k films. Part II: Etching

    Rakhimova, T.
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    Lopaev, D.
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    Mankelevich, Y.
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    Kurchikov, K.
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    Zyryanov, S.
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    Palov, A.P.
    Journal article
    2015, Journal of Physics D: Applied Physics, (48) 17, p.175204
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    Low-k films modification under EUV and VUV radiation

    Rakhimova, T.
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    Rakhimov, A.
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    Mankelevich, Y.A.
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    Lopaev, D.V.
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    Kovalev, A.S.
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    Vasil'eva, A.N.
    Journal article
    2014, Journal of Physics D: Applied Physics, (47) 2, p.25102
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    Low-k OSG damage and etching by F atoms at lowered temperatures

    Zyryanov, S.
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    Kurchikov, D.
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    Lopaev, D.
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    Mankelevich, Y.
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    Palov, A.
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    Rakhimova, T.
    ;
    Voronina, E.
    Oral presentation
    2015, 22nd International Symposium on Plasma Chemistry - ISPC
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    Modelling degradation of PTFE under electron irradiation

    Palov, A.
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    Fujii, H.
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    Mankelevich, Y.
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    Rakhimova, T.
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    Baklanov, Mikhaïl
    Journal article
    2012, Polymer Degradation and Stability, (97) 5, p.802-809
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    Modification of OSG based low-k films under EUV and VUV exposure

    Rakhimova, T.
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    Rakhimov, A.
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    Mankelevich, Y.
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    Lopaev, D.
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    Kovalev, A.
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    Vasil'eva, A.
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    Proshina, O.
    Journal article
    2013, Applied Physics Letters, 102, p.111902
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    Multi-step reaction mechanism for F atom interactions with organosilicate glass and SiOx films

    Mankelevich, Y.
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    Voronina, E.
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    Rakhimova, T.
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    Palov, A.
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    Lopaev, D.V.
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    Zyryanov, S.M.
    Journal article
    2016, Journal of Physics D: Applied Physics, (49) 34, p.345203
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    Ultra low-k dielectrics damage under VUV and EUV radiation

    Zyryanov, S.
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    Braginsky, O.
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    Kovaev, A.
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    Lopaev, D.
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    Mankelevich, Y.
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    Rakhimova, T.
    ;
    Rakhimov, A.
    Meeting abstract
    2012, 65th Gaseous Electronics Conference, 22/10/2012, p.CT2.00005

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