Browsing by Author "Rakhimova, T."
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Publication Comparison between vacuum ultra-violet emission of CF4/Ar and CF3I/Ar plasmas in CCP chamber for low-k etching
Meeting abstract2015, Plasma Etch and Strip in Microtechnology - PESM, 27/04/2015Publication Effect of VUV and EUV radiation on utra low-k materials damage
;Braginsky, O. ;Kovalev, A. ;Lopaev, D. ;Mankelevich, Y. ;Proshina, O. ;Rakhimova, T.Rakhimov, A.Proceedings paper2013, Advanced Interconnects for Micro- and Nanoelectronics - Materials, Processes, and Reliability, 1/04/2013, p.AA03.11Publication Experimental and theoretical study of RF capacitevely-coupled plasma in the Ar/CF4/CF3I mixtures
Journal article2015, Plasma Sources Science and Technology, (24) 5, p.55006Publication F atoms interaction with nanoporous OSG low-k materials
;Rakhimova, T. ;Rakhimov, A. ;Zyryanov, S. ;Lopaev, D. ;Mankelevich, Y. ;Proshina, O.Novikova, N.Meeting abstract2014, MRS Spring Meeting Symposium CC: New Materials and Processes for Interconnects, Novel Memory and Advanced Display Technologies, 15/03/2014, p.CC1.03-283Publication Interaction of atomic fluorine with porous low-k SiCOH films: modeling
;Palov, A. ;Voronina, E. ;Lopaev, D. ;Mankelevich, Y. ;Rakhimova, T. ;Zyryanov, S.Proshina, O.Oral presentation2015, 22nd International Symposium on Plasma Chemistry - ISPCPublication Interaction of F atoms with SiCOH ultra low-k films. Part I: Fluorination and damage
;Rakhimova, T. ;Lopaev, D. ;Mankelevich, Y. ;Rakhimov, A. ;Zyryanov, S. ;Kurchikov, K.Novikova, N.Journal article2015, Journal of Physics D: Applied Physics, (48) 17, p.175203Publication Interaction of F atoms with SiCOH ultra low-k films. Part II: Etching
;Rakhimova, T. ;Lopaev, D. ;Mankelevich, Y. ;Kurchikov, K. ;Zyryanov, S.Palov, A.P.Journal article2015, Journal of Physics D: Applied Physics, (48) 17, p.175204Publication Low-k films modification under EUV and VUV radiation
;Rakhimova, T. ;Rakhimov, A. ;Mankelevich, Y.A. ;Lopaev, D.V. ;Kovalev, A.S.Vasil'eva, A.N.Journal article2014, Journal of Physics D: Applied Physics, (47) 2, p.25102Publication Low-k OSG damage and etching by F atoms at lowered temperatures
;Zyryanov, S. ;Kurchikov, D. ;Lopaev, D. ;Mankelevich, Y. ;Palov, A. ;Rakhimova, T.Voronina, E.Oral presentation2015, 22nd International Symposium on Plasma Chemistry - ISPCPublication Modelling degradation of PTFE under electron irradiation
;Palov, A. ;Fujii, H. ;Mankelevich, Y. ;Rakhimova, T.Baklanov, MikhaïlJournal article2012, Polymer Degradation and Stability, (97) 5, p.802-809Publication Modification of OSG based low-k films under EUV and VUV exposure
;Rakhimova, T. ;Rakhimov, A. ;Mankelevich, Y. ;Lopaev, D. ;Kovalev, A. ;Vasil'eva, A.Proshina, O.Journal article2013, Applied Physics Letters, 102, p.111902Publication Multi-step reaction mechanism for F atom interactions with organosilicate glass and SiOx films
;Mankelevich, Y. ;Voronina, E. ;Rakhimova, T. ;Palov, A. ;Lopaev, D.V.Zyryanov, S.M.Journal article2016, Journal of Physics D: Applied Physics, (49) 34, p.345203Publication Ultra low-k dielectrics damage under VUV and EUV radiation
;Zyryanov, S. ;Braginsky, O. ;Kovaev, A. ;Lopaev, D. ;Mankelevich, Y. ;Rakhimova, T.Rakhimov, A.Meeting abstract2012, 65th Gaseous Electronics Conference, 22/10/2012, p.CT2.00005