Browsing by Author "Rispens, Gijsbert"
- Results Per Page
- Sort Options
Publication Elucidating the role of imaging metrics for variability and after etch defectivity
Journal article2022, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (21) 2, p.Art. 023201Publication Evaluation of local CD and placement distribution on EUV mask and its impact on wafer
Proceedings paper2019, XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology 2019, 16/04/2019, p.1117807-1-1117807-7Publication Extending EUV lithography for DRAM applications
; Publication Impact of local variability on defect-aware process windows
Proceedings paper2019, Extreme Ultraviolet (EUV) Lithography X, 24/02/2019, p.109570HPublication Impact of sequential infiltration synthesis (SIS) on roughness and stochastic nano-failures for EUVL patterning
; ; ; ; ; Kissoon, NicolaProceedings paper2019, Extreme Ultraviolet (EUV) Lithography X, 24/02/2019, p.109570SPublication Metal layer single EUV expose at pitch 28nm: how bright field and NTD resist advantages align
Proceedings paper2021, Conference on Extreme Ultraviolet (EUV) Lithography XII, FEB 22-26, 2021, p.116090RPublication Optimization and stability of CD variability in pitch 40 nm contact holes on NXE:3300
Proceedings paper2018, International Conference on Extreme Ultraviolet Lithography, 17/09/2018, p.108090MPublication Pupil optimization for after etch defectivity: what imaging metrics matter?
Proceedings paper2021, International Conference on Extreme Ultraviolet Lithography, p.118540HPublication Roughness decomposition: an on-wafer methodology to discriminate mask, metrology, and shot noise contributions
Meeting abstract2019, Metrology, Inspection, and Process Control for Microlithography XXXIII, 24/02/2019, p.109590TPublication Setting up a proper power spectral density (PSD) and autocorrelation analysis for material and process characterization
Proceedings paper2018, Metrology, Inspection, and Process Control for Microlithography XXXII, 25/02/2018, p.105851KPublication Today's scorecard for tomorrow's photoresist: progress and outlook towards High-NA EUV lithography
Proceedings paper2021, Advances in Patterning Materials and Processes XXXVIII, 21/02/2021, p.1161204Publication Validation of imaging benefits of Dual Monopole exposures
Proceedings paper2023, International Conference on Extreme Ultraviolet Lithography, OCT 02-05, 2023, p.Art. 1275006