Browsing by Author "Ronchi, Nicolo"
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Publication A comprehensive variability study of doped HfO2 FeFET for memory applications
Proceedings paper2022, 14th IEEE International Memory Workshop (IMW), MAR 15-18, 2022, p.85-88Publication A Theoretical Analysis of Ferroelectric Switching Physics in Metal/Ferroelectric/IGZO Stack Toward Interlayer-Free FeFETs
; ; ; ; ; Journal article2024, IEEE ELECTRON DEVICE LETTERS, (45) 8, p.1453-1456Publication AlGaN/GaN power Schottky diodes with anode dimension up to 100 mm on 200 mm Si substrate
Proceedings paper2016, 28th International Symposium on Power Semiconductor Devices and ICs - ISPSD, 12/06/2016, p.91-94Publication An industry-ready 200 mm p-GaN E-mode GaN-on-Si power technology
Proceedings paper2018, 30th International Symposium on Power Semiconductor Devices and ICs - ISPSD, 13/05/2018, p.284-287Publication Analysis of off-state leakage mechanisms in GaN-based MIS-HEMTs: experimental data and numerical simulation
Journal article2015, Solid-State Electronics, 113, p.9-14Publication Analysis of slow de-trapping phenomena after a positive gate bias on AlGaN/GaN MIS-HEMTs with in-situ Si3N4/Al2O3 bilayer gate dielectrics
Journal article2015, Solid-State Electronics, 103, p.127-130Publication Analysis of the gate capacitance-voltage characteristics in p-GaN/AlGaN/GaN heterostructures
Journal article2017, IEEE Electron Device Letters, (38) 12, p.1696-1699Publication Analysis of Wake-Up Reversal Behavior Induced by Imprint in La:HZO MFM Capacitors
Journal article2023, IEEE TRANSACTIONS ON ELECTRON DEVICES, (70) 5, p.2568-2574Publication Antenna effect in 65nm NMOS devices with 9.5nm thick HfOx gate dielectric
Proceedings paper2021, IEEE International Integrated Reliability Workshop (IIRW) / 4th Reliability Experts Forum, OCT 04-29, 2021, p.57-60Publication Breakdown investigation in GaN-based MIS-HEMT devices
;Marino, Fabio ;Bisi, Davide ;Meneghini, Matteo ;Verzellesi, GiovanniZanoni, EnricoProceedings paper2014, 44th European Solid-State Device Conference - ESSDERC, 22/09/2014, p.377-380Publication Combined PEALD gate-dielectric and in-situ SiN cap-layer for reduced Vth shift and RDS-ON dispersion of AlGaN/GaN HEMTs on 200 mm Si wafer
Proceedings paper2014, International Solid State Devices and Materials Conference - SSDM, 8/09/2014Publication Combined plasma-enhanced-atomic-layer-deposition gate dielectric and in situ SiN cap layer for reduced threshold voltage shift and dynamic ON-resistance dispersion of AlGaN
Journal article2015, Japanese Journal of Applied Physics, (54) 4S, p.04DF02Publication Comparison of AlGaN/GaN MISHEMT powerbar designs
Proceedings paper2013-08, 10th International Conference on Nitride Semiconductors, 25/08/2013Publication Comparison of AlGaN/GaN MISHEMT powerbar designs
Journal article2014-02, Physica Status Solidi C, (11) 3_4, p.906-910Publication Comprehensive Investigation of Constant Voltage Stress Time-Dependent Breakdown and Cycle-to-Breakdown Reliability in Y-Doped and Si-Doped HfO2 Metal-Ferroelectric-Metal Memory
Journal article2023, NANOMATERIALS, (9) 10, p.Art. 2104Publication Defect profiling in FEFET Si:HfO2 layers
Journal article2020, Applied Physics Letters, (117) 20, p.203504Publication Demonstration of 64 Conductance States and Large Dynamic Range in Sidoped HfO2 FeFETs under Neuromorphic Computing Operations
Proceedings paper2022-04-18, 2022 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA), 18-21 April 2022Publication Device breakdown optimization of Al2O3/GaN E-mode MISFETs
Proceedings paper2016, IEEE International Reliability Physics Symposium - IRPS, 17/04/2016, p.CD-5Publication Dielectrics choice and processing for low dispersion enhancement mode p-GaN gate HEMTs on 200mm Si substrates
Proceedings paper2018, Workshop on Compound Semiconductor Devices and Integrated Circuits held in Europe, 14/05/2018, p.28-29Publication Electron emission from deep traps in HfO 2 under thermal and optical excitation
Journal article2024, PHYSICAL REVIEW B, (109) 13, p.Art. 134109