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Browsing by Author "Ronchi, Nicolo"

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    A comprehensive variability study of doped HfO2 FeFET for memory applications

    Ronchi, Nicolo  
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    Ragnarsson, Lars-Ake  
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    Celano, Umberto  
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    Kaczer, Ben  
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    Kaczmarek, Jakub  
    Proceedings paper
    2022, 14th IEEE International Memory Workshop (IMW), MAR 15-18, 2022, p.85-88
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    A Theoretical Analysis of Ferroelectric Switching Physics in Metal/Ferroelectric/IGZO Stack Toward Interlayer-Free FeFETs

    Chen, Zhuo  
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    Ronchi, Nicolo  
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    Tang, Hongwei  
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    Walke, Amey  
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    Izmailov, Roman  
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    Popovici, Mihaela Ioana  
    Journal article
    2024, IEEE ELECTRON DEVICE LETTERS, (45) 8, p.1453-1456
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    AlGaN/GaN power Schottky diodes with anode dimension up to 100 mm on 200 mm Si substrate

    Lenci, Silvia  
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    Hu, Jie
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    Ronchi, Nicolo  
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    Decoutere, Stefaan  
    Proceedings paper
    2016, 28th International Symposium on Power Semiconductor Devices and ICs - ISPSD, 12/06/2016, p.91-94
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    An industry-ready 200 mm p-GaN E-mode GaN-on-Si power technology

    Posthuma, Niels  
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    You, Shuzhen  
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    Stoffels, Steve  
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    Wellekens, Dirk  
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    Liang, Hu  
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    Zhao, Ming  
    Proceedings paper
    2018, 30th International Symposium on Power Semiconductor Devices and ICs - ISPSD, 13/05/2018, p.284-287
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    Analysis of off-state leakage mechanisms in GaN-based MIS-HEMTs: experimental data and numerical simulation

    Marino, F.A.
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    Bisi, D.
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    Meneghini, M.
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    Verzellesi, G.
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    Zanoni, E.
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    Van Hove, Marleen
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    You, Shuzhen  
    Journal article
    2015, Solid-State Electronics, 113, p.9-14
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    Analysis of slow de-trapping phenomena after a positive gate bias on AlGaN/GaN MIS-HEMTs with in-situ Si3N4/Al2O3 bilayer gate dielectrics

    Wu, Tian-Li
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    Marcon, Denis  
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    Ronchi, Nicolo  
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    Bakeroot, Benoit  
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    You, Shuzhen  
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    Stoffels, Steve  
    Journal article
    2015, Solid-State Electronics, 103, p.127-130
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    Analysis of the gate capacitance-voltage characteristics in p-GaN/AlGaN/GaN heterostructures

    Wu, Tian-Li
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    Bakeroot, Benoit  
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    Liang, Hu  
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    Posthuma, Niels  
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    You, Shuzhen  
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    Ronchi, Nicolo  
    Journal article
    2017, IEEE Electron Device Letters, (38) 12, p.1696-1699
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    Analysis of Wake-Up Reversal Behavior Induced by Imprint in La:HZO MFM Capacitors

    Lee, Sumi  
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    Ronchi, Nicolo  
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    Bizindavyi, Jasper  
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    Popovici, Mihaela Ioana  
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    Banerjee, Kaustuv  
    Journal article
    2023, IEEE TRANSACTIONS ON ELECTRON DEVICES, (70) 5, p.2568-2574
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    Antenna effect in 65nm NMOS devices with 9.5nm thick HfOx gate dielectric

    Hiblot, Gaspard  
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    O'Sullivan, Barry  
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    Ronchi, Nicolo  
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    Banerjee, Kaustuv  
    Proceedings paper
    2021, IEEE International Integrated Reliability Workshop (IIRW) / 4th Reliability Experts Forum, OCT 04-29, 2021, p.57-60
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    Breakdown investigation in GaN-based MIS-HEMT devices

    Marino, Fabio
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    Bisi, Davide
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    Meneghini, Matteo
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    Verzellesi, Giovanni
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    Zanoni, Enrico
    Proceedings paper
    2014, 44th European Solid-State Device Conference - ESSDERC, 22/09/2014, p.377-380
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    Combined PEALD gate-dielectric and in-situ SiN cap-layer for reduced Vth shift and RDS-ON dispersion of AlGaN/GaN HEMTs on 200 mm Si wafer

    Ronchi, Nicolo  
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    De Jaeger, Brice  
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    Van Hove, Marleen
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    Roelofs, Robin
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    Wu, Tian-Li
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    Hu, Jie
    Proceedings paper
    2014, International Solid State Devices and Materials Conference - SSDM, 8/09/2014
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    Combined plasma-enhanced-atomic-layer-deposition gate dielectric and in situ SiN cap layer for reduced threshold voltage shift and dynamic ON-resistance dispersion of AlGaN

    Ronchi, Nicolo  
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    De Jaeger, Brice  
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    Van Hove, Marleen
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    Roelofs, Robin
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    Wu, Tian-Li
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    Hu, Jie
    Journal article
    2015, Japanese Journal of Applied Physics, (54) 4S, p.04DF02
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    Comparison of AlGaN/GaN MISHEMT powerbar designs

    Stoffels, Steve  
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    Ronchi, Nicolo  
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    Venegas, Rafael
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    De Jaeger, Brice  
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    Marcon, Denis  
    Proceedings paper
    2013-08, 10th International Conference on Nitride Semiconductors, 25/08/2013
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    Comparison of AlGaN/GaN MISHEMT powerbar designs

    Stoffels, Steve  
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    Ronchi, Nicolo  
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    Venegas, Rafael
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    De Jaeger, Brice  
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    Marcon, Denis  
    Journal article
    2014-02, Physica Status Solidi C, (11) 3_4, p.906-910
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    Comprehensive Investigation of Constant Voltage Stress Time-Dependent Breakdown and Cycle-to-Breakdown Reliability in Y-Doped and Si-Doped HfO2 Metal-Ferroelectric-Metal Memory

    Chang, Ting-Yu
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    Wang, Kuan-Chi
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    Liu, Hsien-Yang
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    Hseun, Jing-Hua
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    Peng, Wei-Cheng
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    Ronchi, Nicolo  
    Journal article
    2023, NANOMATERIALS, (9) 10, p.Art. 2104
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    Defect profiling in FEFET Si:HfO2 layers

    O'Sullivan, Barry  
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    Putcha, Vamsi  
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    Izmailov, Roman
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    Afanas'ev, Valeri V.
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    Simoen, Eddy  
    Journal article
    2020, Applied Physics Letters, (117) 20, p.203504
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    Demonstration of 64 Conductance States and Large Dynamic Range in Sidoped HfO2 FeFETs under Neuromorphic Computing Operations

    Wang, Yu-Yun
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    Wang, Kuang-Chi
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    Wu, Cheng-Hung
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    Chang, Ting-Yu
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    Ronchi, Nicolo  
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    Banerjee, Kaustuv  
    Proceedings paper
    2022-04-18, 2022 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA), 18-21 April 2022
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    Device breakdown optimization of Al2O3/GaN E-mode MISFETs

    Kang, Xuanwu
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    Wellekens, Dirk  
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    Van Hove, Marleen
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    De Jaeger, Brice  
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    Ronchi, Nicolo  
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    Wu, Tian-Li
    Proceedings paper
    2016, IEEE International Reliability Physics Symposium - IRPS, 17/04/2016, p.CD-5
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    Dielectrics choice and processing for low dispersion enhancement mode p-GaN gate HEMTs on 200mm Si substrates

    You, Shuzhen  
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    Posthuma, Niels  
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    Ronchi, Nicolo  
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    Stoffels, Steve  
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    Bakeroot, Benoit  
    Proceedings paper
    2018, Workshop on Compound Semiconductor Devices and Integrated Circuits held in Europe, 14/05/2018, p.28-29
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    Electron emission from deep traps in HfO 2 under thermal and optical excitation

    Izmailov, Roman  
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    Strand, Jack
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    Ronchi, Nicolo  
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    Shluger, Alexander
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    Afanasiev, Valeri  
    Journal article
    2024, PHYSICAL REVIEW B, (109) 13, p.Art. 134109
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