Browsing by Author "Ronchi, Nicolo"
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Publication A comprehensive variability study of doped HfO2 FeFET for memory applications
Proceedings paper2022, 14th IEEE International Memory Workshop (IMW), MAR 15-18, 2022, p.85-88Publication A Theoretical Analysis of Ferroelectric Switching Physics in Metal/Ferroelectric/IGZO Stack Toward Interlayer-Free FeFETs
; ; ; ; ; Journal article2024, IEEE ELECTRON DEVICE LETTERS, (45) 8, p.1453-1456Publication AlGaN/GaN power Schottky diodes with anode dimension up to 100 mm on 200 mm Si substrate
Proceedings paper2016, 28th International Symposium on Power Semiconductor Devices and ICs - ISPSD, 12/06/2016, p.91-94Publication An industry-ready 200 mm p-GaN E-mode GaN-on-Si power technology
Proceedings paper2018, 30th International Symposium on Power Semiconductor Devices and ICs - ISPSD, 13/05/2018, p.284-287Publication Analysis of off-state leakage mechanisms in GaN-based MIS-HEMTs: experimental data and numerical simulation
Journal article2015, Solid-State Electronics, 113, p.9-14Publication Analysis of slow de-trapping phenomena after a positive gate bias on AlGaN/GaN MIS-HEMTs with in-situ Si3N4/Al2O3 bilayer gate dielectrics
Journal article2015, Solid-State Electronics, 103, p.127-130Publication Analysis of the gate capacitance-voltage characteristics in p-GaN/AlGaN/GaN heterostructures
Journal article2017, IEEE Electron Device Letters, (38) 12, p.1696-1699Publication Analysis of Wake-Up Reversal Behavior Induced by Imprint in La:HZO MFM Capacitors
Journal article2023, IEEE TRANSACTIONS ON ELECTRON DEVICES, (70) 5, p.2568-2574Publication Antenna effect in 65nm NMOS devices with 9.5nm thick HfOx gate dielectric
Proceedings paper2021, IEEE International Integrated Reliability Workshop (IIRW) / 4th Reliability Experts Forum, OCT 04-29, 2021, p.57-60Publication Breakdown investigation in GaN-based MIS-HEMT devices
;Marino, Fabio ;Bisi, Davide ;Meneghini, Matteo ;Verzellesi, GiovanniZanoni, EnricoProceedings paper2014, 44th European Solid-State Device Conference - ESSDERC, 22/09/2014, p.377-380Publication Combined PEALD gate-dielectric and in-situ SiN cap-layer for reduced Vth shift and RDS-ON dispersion of AlGaN/GaN HEMTs on 200 mm Si wafer
Proceedings paper2014, International Solid State Devices and Materials Conference - SSDM, 8/09/2014Publication Combined plasma-enhanced-atomic-layer-deposition gate dielectric and in situ SiN cap layer for reduced threshold voltage shift and dynamic ON-resistance dispersion of AlGaN
Journal article2015, Japanese Journal of Applied Physics, (54) 4S, p.04DF02Publication Comparison of AlGaN/GaN MISHEMT powerbar designs
Journal article2014, Physica Status Solidi C, (11) 3_4, p.906-910Publication Comparison of AlGaN/GaN MISHEMT powerbar designs
Proceedings paper2013, 10th International Conference on Nitride Semiconductors, 25/08/2013Publication Comprehensive Investigation of Constant Voltage Stress Time-Dependent Breakdown and Cycle-to-Breakdown Reliability in Y-Doped and Si-Doped HfO2 Metal-Ferroelectric-Metal Memory
Journal article2023, NANOMATERIALS, (9) 10, p.Art. 2104Publication Defect profiling in FEFET Si:HfO2 layers
Journal article2020, Applied Physics Letters, (117) 20, p.203504Publication Demonstration of 64 Conductance States and Large Dynamic Range in Sidoped HfO2 FeFETs under Neuromorphic Computing Operations
Proceedings paper2022, 2022 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA), 18-21 April 2022Publication Device breakdown optimization of Al2O3/GaN E-mode MISFETs
Proceedings paper2016, IEEE International Reliability Physics Symposium - IRPS, 17/04/2016, p.CD-5Publication Dielectrics choice and processing for low dispersion enhancement mode p-GaN gate HEMTs on 200mm Si substrates
Proceedings paper2018, Workshop on Compound Semiconductor Devices and Integrated Circuits held in Europe, 14/05/2018, p.28-29Publication Electron emission from deep traps in HfO 2 under thermal and optical excitation
Journal article2024, PHYSICAL REVIEW B, (109) 13, p.Art. 134109