Browsing by Author "Rotondaro, Antonio"
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Publication A new cleaning concept for particle and metal removal on Si surfaces
Proceedings paper1994, Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, 15/10/1993, p.15-25Publication A novel environmentally-friendly corrosion-free post-stripping rinsing procedure after solvent strip
Proceedings paper1997, Symposium on VLSI Technology: Digest of Technical Papers, 10/06/1997, p.37-38Publication A semi-quantitative method for studying photoresist stripping
Proceedings paper1994, Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, 15/10/1993, p.581-586Publication Advanced cleaning and ultra-thin oxide technology
; ; ; ; Publication Cleaning technology for highly reliable gate oxides
Proceedings paper1994, Proceedings of the International Conference on Advanced Microelectronic Devices and Processing - AMDP, 03/03/1994, p.59-66Publication Contamination control in submicron CMOS technologies
Rotondaro, AntonioPHD thesis1996-01Publication Development of advanced corrosion free organic strippers for ULSI processing
Proceedings paper1996, Proceedings of the Fourth International Symposium on Cleaning technology in Semiconductor Device Manufacturing, 9/10/1995, p.537-43Publication Effect of oxidation ramp up on the redistribution of metallic contamination in gate oxides
Proceedings paper1994, Proceedings of the Institute of Environmental Science: 40th Annual Technical Meeting, 01/05/1994, p.325-331Publication H2O2 decomposition and its impact on silicon surface roughening and gate oxide integrity
Journal article1995, Japanese Journal of Applied Physics. Part 1, (34) 2B, p.727-731Publication How clean is clean enough?
Proceedings paper1995, Proceedings of SEMICON/West 1995 Technical Seminar: Cleaning Technology for the Submicron Era, 11/07/1995, p.7Publication Impact of Fe and Cu contamination on the minority carrier lifetime of silicon substrates
Journal article1996, Journal of the Electrochemical Society, (143) 9, p.3014-3019Publication Impact of the electrochemical properties of silicon wafer surfaces on copper outplating from HF solutions
Proceedings paper1996, Proceedings of the Fourth International Symposium on Cleaning technology in Semiconductor Device Manufacturing, 9/10/1995, p.284-291Publication Important parameters influencing the rince efficiency of silicon wafers
Meeting abstract1995, Electrochemical Society Fall Meeting: 4th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, 8/10/1995, p.438Publication Interaction of the sulphuric acid hydrogen peroxide mixture with silicon surfaces
Proceedings paper1994, Proceedings of the 2nd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS, 19/09/1994, p.301-304Publication Investigation of advanced organic strippers for ULSI processing
Proceedings paper1994, OCG Microlithography Seminar INTERFACE, 6/11/1994, p.239-254Publication IR and MW absorption techniques for bulk and surface recombination control in high-quality silicon
Proceedings paper1995, Ultraclean Semiconductor Processing Technology and Surface Chemical Cleaning and Passivation, 17/04/1995, p.389-394Publication Just-Clean- Enough technology for the 21st century
Oral presentation1995, SEMICON EuropePublication Limitations of minority carrier lifetime as a parameter for evaluating iron contamination in silicon
Meeting abstract1994, 186th Electrochemical Society Fall Meeting: Symposium on High Purity Silicon III, 9/10/1994, p.625Publication Metal interactions with silica (SiO2) surfaces: adsorption and ion exchange
Proceedings paper1996, Proceedings of the Fourth International Symposium on Cleaning technology in Semiconductor Device Manufacturing, 9/10/1995, p.277-283Publication New technologies for reducing chemical costs and environmental impact
Proceedings paper1998, Technical Symposium SEMICON Europa: Environmentally Conscious Manufacturing - Can Environmental Action Also Save Money?, 1/04/1998