Browsing by Author "Snow, Jim"
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Publication Advanced wafer surface cleaning technology
Oral presentation2004, SEMICON Korea 2004 STS, S5: Contamination-free Manufacturing SeminarPublication All wet photoresist strip by solvent aerosol spray
Oral presentation2008, 9th International Symposium on Ultra Clean Processing of Semiconductor Surfaces - UCPSSPublication Application of porous low-k dielectrics and copper in microelectronics
Oral presentation2005, Seminar on Micro-NanotechnologyPublication Application of single-wafer wet cleaning prior to epitaxial SiGe process
Journal article2009, Solid State Phenomena, 145-146, p.173-176Publication Cleaning of metal gate stacks for the sub 90nm technology node
Meeting abstract2003, 204th Meeting of the Electrochemical Society: 8th Int. Symp. on CLeaning Technology in Semiconductor Device Manufacturing, 12/10/2003Publication Cleaning of metal gate stacks for the sub 90nm technology node
Proceedings paper2004, Cleaning Technology in Semiconductor Device Manufacturing VIII. Proceedings of the International Symposium, 12/10/2003, p.393-399Publication Cleaning of nanoparticles in semiconductor manufacturing
Oral presentation2004, BePCIS Seminar on Selected Topics in NanotechnologyPublication CMP-less integration of fully Ni-silicided metal gates in FinFETs by simultaneous silicidation of the source, drain, and the gate using a novel dual hard mask approach
Proceedings paper2005, Symposium on VLSI Technology. Digest of Technical Papers, 14/06/2005, p.198-199Publication Demonstration of recessed SiGe S/D and inserted metal gate on HfO2 for high performance pFETs
Proceedings paper2005-12, Technical Digest International Electron Devices Meeting (IEDM), 5/12/2005, p.907-910Publication Drying of hydrophobic surfaces - one of the keys for future technologies
Meeting abstract2004, Advanced Semiconductor Manufacturing Conference - ASMC, 4/05/2004Publication Etching and cleaning of HfO2 deposited on Si
Proceedings paper2002-11, The 1st International Surface Cleaning Workshop, 11/11/2002Publication Etching of HfO2, deposited on LPCVD Si3N4, and cleaning of Hf residues
Oral presentation2003, Twelfth International Symposium on Semiconductor Manufacturing - ISSMPublication Evaluation of megasonic cleaning for sub-90-nm technologies
; ; ; ; ; ; Snow, JimOral presentation2004, 7th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSSPublication Evaluation of megasonic cleaning for sub-90-nm technologies
; ; ; ; ; Proceedings paper2005, Ultra Clean Processing of Silicon Surfaces VII: Proceedings of the 7th International Symposium, 20/09/2004, p.141-146Publication Germanium deep-submicron p-FET and n-FET devices, fabricated on germanium-on-insulator substrates
Book chapter2007Publication Impact of galvanic corrosion on metal gate stacks
Oral presentation2008, 9th International Symposium on Ultra Clean Processing of Semiconductor Surfaces - UCPSSPublication Influence of hardware and chemistry on the removal of nano-particles in a megasonic cleaning tank
Proceedings paper2003, Ultra Clean Processing of Silicon Surfaces 2002 - UCPSS, 16/09/2002, p.143-147Publication Influences of oxide loss on contamination removal
Oral presentation2004, 7th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSSPublication Influences of oxide loss on contamination removal
Proceedings paper2005, Ultra Clean Processing of Silicon Surfaces VII: Proceedings of the 7th International Symposium, 20/09/2004, p.177-180Publication Integration challenges for multi-gate devices
Proceedings paper2005, Proceedings International Conference on IC Design and Technology - ICICDT, 9/05/2005, p.187-194