Browsing by Author "Storms, Greet"
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Publication 3D Contact hole metrology accuracy and stability
Publication 90nm technology contact CD performance characterization via ODP scatterometry
Publication Advanced process control for hyper-NA lithography based on CD-SEM measurement
Proceedings paper2007, Metrology, Inspection and Process Control for Microlithography XXI, 25/02/2007, p.65182PPublication Electrical linewidth metrology for sub-65-nm applications
Proceedings paper2004, Metrology, Inspection, and Process Control for Microlithography XVIII, 22/02/2004, p.614-622Publication Integrated scatterometry for contact hole monitoring
Proceedings paper2004, 5th European Advanced Equipment Control / Advanced Process Control (APC/AEC) Conference, 13/04/2004Publication Integrated scatterometry for contact hole monitoring
Proceedings paper2004, Proceedings 41st Arch Interface Symposium, 26/09/2004Publication Interim investigation of CD-SEM resist shrinkage in 193nm lithography
Oral presentation2002, 3rd European Advanced Equipment Control / Advanced Process Control ConferencePublication Line edge roughness and its increasing importance
Oral presentation2002, 39th Interface SymposiumPublication Line edge roughness: characterization, modeling and impact on device behavior
Proceedings paper2002, IEDM Technical Digest, 9/12/2002, p.307-310Publication Meeting double patterning challenges: from split to process control
Oral presentation2007, New Generation Lithography WorkshopPublication Metrology accuracy and stability: the fundamental baseline for process monitoring and control
Publication Pitch doubling through dual-patterning lithography challenges in integration and litho budgets
Proceedings paper2007, Optical Microlithography XX, 27/02/2007, p.65200GPublication The potential of double patterning immersion lithography for the 32nm half pitch node
Journal article2007-08, EuroAsia Semiconductor, p.19-22Publication The potential of double patterning immersion lithography for the 32nm half pitch node
Journal article2007-08, Semiconductor-Manufacturing-Magazine-SEMI-China, p.21-24