Browsing by Author "Teerlinck, Ivo"
- Results Per Page
- Sort Options
Publication A Ge matrix removal method for metallic contamination analysis on Ge wafers using TXRF
Oral presentation2004, European Conference on X-Ray SpectrometryPublication A study of the influence of typical wet chemical treatments on the germanium wafer surface
Proceedings paper2005, Ultra Clean Processing of Silicon Surfaces VII: Proceedings of the 7th International Symposium, 20/09/2004, p.27-30Publication Advanced cleaning and ultra-thin oxide technology
; ; ; ; Publication Advanced cleaning for the growth of ultrathin gate oxide
Journal article1999, Microelectronic Engineering, (48) 1_4, p.199-206Publication Advanced cleaning strategies for ultra-clean silicon surfaces
; ; ; Publication Advances in understanding wet cleaning technology and the effect of metal contamination
; ; ; Publication ALD High-k growth on Ge substrates
Meeting abstract2003, Atomic Layer Deposition, 4/08/2003Publication Cleaning, rinsing and drying aspects in post-Cu-CMP clean
Oral presentation1999, 4th International Symposium on Chemical-Mechanical Polishing; 8-11 August 1999; Lake Placid, NY, USA.Publication Cleaning, rinsing and drying effects in post-Cu CMP clean
; ; ; Proceedings paper2000, Proceedings CMP for ULSI Multilevel Interconnection Conference (CMP-MIC); 2-3 March 2000; Santa Clara, Ca, USA., p.507Publication Clustered single wafer wet cleaning
; ; ; ; Publication Cost-effective cleaning and high-quality thin gate oxides
Journal article1999, IBM Journal of Research and Development, (43) 3, p.339-350Publication Cost-effective cleaning for advanced Si-processing
; ; ; Publication Critical issues in post Cu CMP cleaning
Proceedings paper2000, Proceedings of the 9th International Symposium on Semiconductor Manufacturing - ISSM, 26/09/2000, p.415-418Publication Cu deposition on Si surfaces from HF solutions in VLSI microfabrication
Oral presentation1996, 3rd European Workshop on Electrochemical Processing of Semiconductors; November 6-8, 1996; Paris, France.Publication Deposition of HfO2 on germanium and the impact of surface pretreatments
Journal article2004, Applied Physics Letters, (85) 17, p.3824-3826Publication Developments in cleaning technology for critical layers
Oral presentation2000, Santa Clara Plastics Symposium on Cleaning Technology; May 2000Publication Distribution of metal contamination in SiO2/Si systems
Meeting abstract1999, Electrochemical Society Fall Meeting: 6th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, 17/10/1999, p.1107Publication Effect of anions on copper outplating from HF solutions
Proceedings paper1996, Proceedings of the 3rd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS, 23/09/1996, p.21-24Publication Effect of metal contamination and improved cleaning strategies
Proceedings paper1999, 6th International SCP Symposium "Meeting the Surface Preparation Challenges of the New Millennium", 10/05/1999Publication Effect of metal contamination and improved cleaning strategies
Proceedings paper1999, Defects in Silicon III, 2/05/1999, p.401-413
- «
- 1 (current)
- 2
- 3
- »