Browsing by Author "Turovets, Igor"
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Publication Critical In-Line OCD Metrology for CFET Manufacturing
Proceedings paper2025, 2025 Conference on Metrology Inspection and Process Control-Annual, 2024-02-24, p.1342606-1-1342606-11Publication Innovative scatterometry approach for self-aligned quadruple patterning (SAQP) process control
Proceedings paper2016, Metrology, Inspection, and Process Control for Microlithography XXX, 21/02/2016, p.977807Publication Metrology of Thin Resist for High NA EUVL
Proceedings paper2022, Conference on Metrology, Inspection, and Process Control XXXVI Part of SPIE Advanced Lithography and Patterning Conference, FEB 24-MAY 27, 2022, p.12053OOPublication Plasma halogenated amorphous carbon as growth inhibiting layer for area-selective deposition of titanium oxide
Proceedings paper2020, Metrology, Inspection, and Process Control for Microlithography XXXIV, 23/02/2020, p.113250YPublication Scatterometry and AFM measurement combination for area selective deposition process characterization
Proceedings paper2019, Metrology, Inspection, and Process Control for Microlithography XXXIII, 24/02/2019, p.109591NPublication Scatterometry Application on Cu/SiCN surface topography towards high volume manufacturing
; ; ; Proceedings paper2024, 10th IEEE Electronics System-Integration Technology Conference (ESTC), SEP 11-13, 2024Publication Scatterometry solutions for 14nm half-pitch BEOL layers patterned by EUV single exposure
Proceedings paper2021, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV, 22/02/2021, p.116112A