Browsing by Author "Tzviatkov, Plamen"

100-nm generation contact patterning by low temperature 193-nm resist reflow process

100nm generation contact patterning by low temperature 193nm resist reflow process

248 nm lithography for the 0.18 μm generation

Evaluation of advanced I-line resists for practical 0.5*(l/NA) lithography

Feasibility of 250 nm gate patterning using i-line with OPC

Impact of SEM accuracy on the CD control during gate patterning process of 0.25μm and sub-0.25μm generations

Increasing DOF for VIA lithography using a non-CMP based architecture

Introducing 193 nm lithography

Lithographic performance of 193 nm single and bi-layer materials

Low-temperature 193nm resist reflow process for 100 nm generation contact patterning

Optical proximity correction for 0.3 μm i-line lithography

Optically enhanced i-line lithography for 0.3-μm random logic applications

Optimisation methodology towards a manufacturable 0.3 μm poly-gate process using i-line lithography

Optimizing i-line lithography for 0.3-μm poly-gate manufacturing

SEM proximity effect for poly gate patterns