Browsing by Author "Van Doorne, Patrick"
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Publication Alternative post-etch polymer removal in a single-wafer platform
Publication Analysis of trace metals in thin silicon nitride films by total-reflection X-ray fluorescence
; ; ; ; Verstraeten, K.Journal article2001, Spectrochimica Acta B, 56, p.2321-2330Publication Damage-free removal of nano-sized particles, heading towards a red brick wall
Oral presentation2003, International Sematech Wafer Cleaning and Surface Preparation WorkshopPublication Developments in cleaning technology for critical layers
Oral presentation2000, Santa Clara Plastics Symposium on Cleaning Technology; May 2000Publication Effective post-etch residue removal on low-k films using single wafer processing
Meeting abstract2003, 204th Meeting of the Electrochemical Society: 8th Int. Symp. on Cleaning Technology in Semiconductor Device Manufacturing, 13/10/2003Publication Effective post-etch residue removal on low-K films using single wafer processing
Proceedings paper2004, Cleaning Technology in Semiconductor Device Manufacturing VIII. Proceedings of the International Symposium, 13/10/2003, p.15-22Publication Etching and cleaning of HfO2 deposited on Si
Proceedings paper2002-11, The 1st International Surface Cleaning Workshop, 11/11/2002Publication Etching of HfO2, deposited on LPCVD Si3N4, and cleaning of Hf residues
Oral presentation2003, Twelfth International Symposium on Semiconductor Manufacturing - ISSMPublication Integration of high-k gate dielectrics - wet etch, cleaning and surface conditioning
Meeting abstract2003, 204th Meeting of the Electrochemical Society: 8th Int. Symp. on Cleaning Technology in Semiconductor Device Manufacturing, 13/10/2003Publication Integration of high-K gate dielectrics - wet etch, cleaning and surface conditioning
Proceedings paper2004, Cleaning Technology in Semiconducting Device Manufacturing VIII. Proceedings of the International Symposium, 13/10/2003, p.67-77Publication Method for determining the effectiveness of silicon nitride as a barrier layer for HfO2
Meeting abstract2003, 204th Meeting of the Electrochemical Society: 2nd Int. Symp. on High Dielectric Constant Materials, 13/10/2003Publication Method for determining the effectiveness of silicon nitride as a barrier layer for HfO2
Proceedings paper2004, Physics and Technology of High-k Gate Dielectrics II, 12/10/2003, p.47-57Publication Scaling of high-k dielectrics towards sub-1nm EOT
Proceedings paper2003, IEEE International Symposium on VLSI Technology, Systems, and Applications, 23/04/2003, p.251-254