Browsing by Author "Wolke, K."
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Publication Advanced cleaning and ultra-thin oxide technology
; ; ; ; Publication Advanced cleaning strategies for ultra-clean silicon surfaces
; ; ; Publication Advanced single chemistry alkaline cleaning in a STEAG single tank tool
Proceedings paper2002, Cleaning Technology in Semiconductor Device Manufacturing VII, 4/09/2001, p.23-30Publication Advanced single chemistry alkaline cleaning in a STEAG single tank tool
Meeting abstract2001, 200th Meeting of the Electrochemical Society: 7th International Symposium on Cleaning Technology in Semiconductor Device Manufac, 2/09/2001Publication Advances in understanding wet cleaning technology and the effect of metal contamination
; ; ; Publication Application of moist ozone gas phase for removal of resist and organic contamination in a novel tank type processor
Proceedings paper2000, Cleaning Technology in Semiconductor Device Manufacturing. Proceedings of the 6th International Symposium, 17/10/1999, p.204-11Publication Application of moist ozone gasphase for removal of resist and organic contamination in a novel tank-type processor
Meeting abstract1999, Electrochemical Society Fall Meeting: 6th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, 17/10/1999, p.1127Publication Comparison of RCA and IMEC clean (HF last) type cleaning sequences in full production environment
Proceedings paper1996, Proceedings of the 3rd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS, 23/09/1996, p.199-203Publication Cost-effective cleaning and high-quality thin gate oxides
Journal article1999, IBM Journal of Research and Development, (43) 3, p.339-350Publication Developments in cleaning technology for critical layers
Oral presentation2000, Santa Clara Plastics Symposium on Cleaning Technology; May 2000Publication From Piranha to Barracuda: mechanism of ozone and water vapor photoresistant strip in a wet bench
Proceedings paper2001, Ultra Clean Processing of Silicon Surfaces 2000: Proceedings of the 5th International Conference - UCPSS, 18/09/2000, p.227-230Publication Implementation of the IMEC-Clean in advanced CMOS manufacturing
; ; ; ; ; Proceedings paper1999, Proceedings 1999 IEEE International Symposium on Semiconductor Manufacturing Conference, 11/10/1999, p.157-160Publication New technologies for reducing chemical costs and environmental impact
Proceedings paper1998, Technical Symposium SEMICON Europa: Environmentally Conscious Manufacturing - Can Environmental Action Also Save Money?, 1/04/1998Publication Optimized insitu rinsing for HF last processes
Proceedings paper1997, IEEE International Symposium on Semiconductor Manufacturing Conference, 6/10/1997Publication Ozonated DI-water for clean chemical oxide growth
Proceedings paper1999, Ultra Clean Processing of Silicon Surfaces; Proceedings of the 4th International Symposium on Ultra Clean Processing of Silicon, 21/09/1998, p.77-80Publication Ozonated DI-water for clean chemical oxide growth
Oral presentation1998, 4th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSSPublication The IMEC-Clean: A clean for advanced CMOS manufacturing
; ; ; ; ; Oral presentation2000, 7th International Symposium on Particles on Surfaces: Detection, Adhesion and Removal; 19-21 June 2000; Newark, NJ, USA.Publication Ultra thin gate oxide technology and reliability
Proceedings paper1996, Proceedings 5th International Symposium on Semiconductor Manufacturing - ISSM, 2/10/1996, p.208-211