Browsing by author "Tuominen, Marko"
Now showing items 1-11 of 11
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Alternative gate insulator materials for future generation MOSFETs
Heyns, Marc; Bender, Hugo; Carter, Richard; Caymax, Matty; Conard, Thierry; De Gendt, Stefan; Degraeve, Robin; De Witte, Hilde; Groeseneken, Guido; Haukka, S.; Henson, Kirklen; Houssa, Michel; Kubicek, Stefan; Maes, Jos; Naili, Mohamed; Nohira, Hiroshi; Tsai, Wilman; Tuominen, Marko; Vandervorst, R.; Wilhelm, Rudi; Young, Edward; Zhao, Chao (2001) -
Characterisation of AlCVD Al2O3-ZrO2 nanolaminates, link between electrical and structural properties
Besling, Wim; Young, Edward; Conard, Thierry; Zhao, Chao; Carter, Richard; Vandervorst, Wilfried; Caymax, Matty; De Gendt, Stefan; Heyns, Marc; Maes, Jos; Tuominen, Marko; Haukka, S. (2002) -
Characterisation of AlCVD-Al2O3 and ZrO2 layer using X-ray photoelectron spectroscopy
Nohira, Hiroshi; Tsai, Wilman; Besling, Wim; Young, Edward; Pétry, Jasmine; Conard, Thierry; Vandervorst, Wilfried; De Gendt, Stefan; Heyns, Marc; Maes, Jos; Tuominen, Marko (2002) -
Characterization of ALCVD Al2O3-ZrO2 nanolaminates, link between electrical and structural properties
Besling, Wim; Young, Edward; Conard, Thierry; Zhao, Chao; Vandervorst, Wilfried; Caymax, Matty; De Gendt, Stefan; Heyns, Marc; Maes, Jos; Tuominen, Marko; Haukka, S. (2001) -
Characterization of AlCVD-Al2O3 and ZrO2 layer using X-ray photoelectron spectroscopy
Nohira, Hiroshi; Tsai, Wilman; Besling, Wim; Young, Edward; Pétry, Jasmine; Conard, Thierry; Vandervorst, Wilfried; De Gendt, Stefan; Heyns, Marc; Maes, Jos; Tuominen, Marko (2001) -
Gate stack preparation with high-k materials in a cluster tool
De Gendt, Stefan; Heyns, Marc; Conard, Thierry; Nohira, Hiroshi; Richard, Olivier; Vandervorst, Wilfried; Caymax, Matty; Maes, Jos; Tuominen, Marko; Bajolet, Philippe (2001) -
High k dielectric materials prepared by atomic layer CVD
Heyns, Marc; Bender, Hugo; Carter, Richard; Caymax, Matty; Conard, Thierry; De Gendt, Stefan; Degraeve, Robin; De Witte, Hilde; Groeseneken, Guido; Haukka, S.; Henson, Kirklen; Houssa, Michel; Kubicek, Stefan; Maes, Guido; Naili, Mohamed; Nohira, Hiroshi; Tsai, Wilman; Tuominen, Marko; Vandervorst, Wilfried; Wilhelm, Rudi; Yang, E.; Zhao, Chao (2001) -
Infrared interface analysis of high-k dielectrics deposited by atomic layer chemical vapour deposition
Cosnier, Vincent; Bender, Hugo; Caymax, Matty; Chen, Jian; Conard, Thierry; Nohira, Hiroshi; Richard, Olivier; Tsai, Wilman; Vandervorst, Wilfried; Young, Edward; Zhao, Chao; De Gendt, Stefan; Heyns, Marc; Maes, Jos; Tuominen, Marko; Rochat, N.; Olivier, M.; Chabli, A. (2001) -
Interfacial stability of high-k dielectrics deposited by atomic layer chemical vapor deposition
Tsai, Wilman; Nohira, Hiroshi; Carter, Richard; Caymax, Matty; Conard, Thierry; De Gendt, Stefan; Heyns, Marc; Pétry, Jasmine; Richard, Olivier; Vandervorst, Wilfried; Young, Edward; Zhao, Chao; Maes, Jos; Tuominen, Marko (2001) -
Stabilization of amorphous structures in ALCVD high-k oxide layers
Zhao, Chao; Richard, Olivier; Bender, Hugo; Young, Edward; Carter, Richard; Tsai, Wilman; Caymax, Matty; De Gendt, Stefan; Heyns, Marc; Roebben, G.; Van der Biest, O.; Maes, Jos; Tuominen, Marko; Haukka, S. (2001) -
Trap-assisted tunneling in high permittivity gate dielectric stacks
Houssa, Michel; Tuominen, Marko; Naili, Mohamed; Afanas'ev, V.; Stesmans, Andre; Haukka, S.; Heyns, Marc (2000)