Browsing by author "Hoflijk, Ilse"

A study of the influence of typical wet chemical treatments on the germanium wafer surface

Onsia, Bart; Conard, Thierry; De Gendt, Stefan; Heyns, Marc; Hoflijk, Ilse; Mertens, Paul; Meuris, Peter; Raskin, G.; Sioncke, Sonja; Teerlinck, I; Theuwis, A.; Van Steenbergen, Jan; Vinckier, Chris (2004)

A study of the influence of typical wet chemical treatments on the germanium wafer surface

Onsia, Bart; Conard, Thierry; De Gendt, Stefan; Heyns, Marc; Hoflijk, Ilse; Mertens, Paul; Meuris, Peter; Raskin, G.; Sioncke, Sonja; Teerlinck, Ivo; Theuwis, A.; Van Steenbergen, Jan; Vinckier, Chris (2005)

Accurate electrical activation characterization of CMOS ultra-shallow profiles

Clarysse, Trudo; Dortu, Fabian; Vanhaeren, Danielle; Hoflijk, Ilse; Geenen, Luc; Janssens, Tom; Loo, Roger; Vandervorst, Wilfried; Pawlak, Bartek; Ouzeaud, V.; Defranoux, C.; Faifer, V.N.; Current, M.I. (2004)

Active dopant characterization methodology for Germanium

Clarysse, Trudo; Eyben, Pierre; Janssens, Tom; Hoflijk, Ilse; Vanhaeren, Danielle; Satta, Alessandra; Meuris, Marc; Vandervorst, Wilfried (2005)

Buried interface and buried film analysis using lab-scale Haxpes instruments

Conard, Thierry; Zborowski, Charlotte; Vanleenhove, Anja; Hoflijk, Ilse; Vaesen, Inge; van der Heide, Paul (2021)

Characterization of electrically active dopant profiles with the spreading resistance probe

Clarysse, Trudo; Vanhaeren, Danielle; Hoflijk, Ilse; Vandervorst, Wilfried (2004)

Characterization of etch residues generated on damascene structures

Le, Quoc Toan; Kesters, Els; Hoflijk, Ilse; Conard, Thierry; Shen, M.; Braun, S.; Burk, Y.; Holsteyns, Frank (2016)

Characterization of grain boundaries and impact of plasma-induced patterned in 2D materials

Celano, Umberto; Virkki, Olli; Chiappe, Daniele; Heyne, Markus; Hoflijk, Ilse; Franquet, Alexis; Huyghebaert, Cedric; Paredis, Kristof; De Gendt, Stefan; Radu, Iuliana; Vandervorst, Wilfried (2017)

Chemical and electrical dopant profiling for P-type junctions formed by solid phase epitaxial regrowth

Pawlak, Bartek; Lindsay, Richard; Kittl, Jorge; Vandervorst, Wilfried; Clarysse, Trudo; Hoflijk, Ilse; Dieu, B.; Geenen, Luc; Brijs, Bert (2003)

Chemical and electrical dopants profile evolution during solid phase epitaxial regrowth

Pawlak, Bartek; Lindsay, Richard; Surdeanu, Radu; Dieu, Bjorn; Geenen, Luc; Hoflijk, Ilse; Richard, Olivier; Duffy, Ray; Clarysse, Trudo; Brijs, Bert; Vandervorst, Wilfried (2004)

CMOS scaling beyond the 90 nm CMOS technology node: shallow junction and integration challenges

Dachs, Charles; Surdeanu, Radu; Pawlak, Bartek; Doornbos, Gerben; Duffy, R.; Heringa, Anco; Ponomarev, Youri; Venezia, Vincent; Van Dal, Mark; Stolk, P.; Lindsay, Richard; Henson, Kirklen; Dieu, B.; Geenen, Luc; Hoflijk, Ilse; Richard, Olivier; Clarysse, Trudo; Brijs, Bert; Vandervorst, Wilfried; Pagès, Xavier (2003)

Damage-free contact mode current sensing SPM: benchmarking PFTUNA vs. C-AFM

Celano, Umberto; Chintala, Ravi Chandra; Hoflijk, Ilse; Moussa, Alain; Vanhaeren, Danielle; Mannarino, Manuel; Nazir, Aftab; Eyben, Pierre; Vandervorst, Wilfried (2013)

Defect removal, dopant diffusion and activation issues in ion-implanted shallow junctions fabricated in crystalline germanium substrates

Simoen, Eddy; Satta, Alessandra; Meuris, Marc; Janssens, Tom; Clarysse, Trudo; Benedetti, Alessandro; Demeurisse, Caroline; Brijs, Bert; Hoflijk, Ilse; Vandervorst, Wilfried; Claeys, Cor (2005)

Dopants for N and P junctions in germanium

Satta, Alessandra; Simoen, Eddy; Meuris, Marc; Janssens, Tom; Clarysse, Trudo; Demeurisse, Caroline; Hoflijk, Ilse; Vandervorst, Wilfried (2005)

Electrical atomic force microscopy for 2D transition metal dichalcogenide materials

Celano, Umberto; Virkki, Olli; Mascaro, Marco; Nalin Mehta, Ankit; Bender, Hugo; Chiappe, Daniele; Asselberghs, Inge; Paredis, Kristof; Hoflijk, Ilse; Franquet, Alexis; Huyghebaert, Cedric; Radu, Iuliana; Vandervorst, Wilfried (2017)

Hafnium oxide films by atomic layer deposition for high-k gate dielectric applications: analysis of the density of nanometer-thin films

Puurunen, Riikka; Delabie, Annelies; Van Elshocht, Sven; Caymax, Matty; Green, Martin; Brijs, Bert; Richard, Olivier; Bender, Hugo; Conard, Thierry; Hoflijk, Ilse; Vandervorst, Wilfried; Hellin, David; Vanhaeren, Danielle; Zhao, Chao; De Gendt, Stefan; Heyns, Marc (2005)