Browsing by author "Gillijns, Werner"
Now showing items 21-33 of 33
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Improving Silicon-photonics inverse-design printability by leveraging SEM contours for advanced Optical Proximity Correction techniques
Drissi, Youssef; Gillijns, Werner; Lardenois, Sebastien; Verheyen, Peter; Lepage, Guy; Mohsen, Mahmoud; Delorme, Maxence (2022) -
Investigation of Low-n Mask in 0.33NA EUV Single Patterning at Pitch 28nm Metal Design
Xu, Dongbo; Gillijns, Werner; Tan, Ling Ee; Philipsen, Vicky; Kim, Ryan Ryoung han (2022-05-26) -
Metal oxide EUV photoresist performance for N7 relevant patterns and processes
Stowers, Jason; Anderson, Jeremy; Cardineau, Brian; Clark, Benjamin; De Schepper, Peter; Edson, Joseph; Greer, Michael; Jiang, Kai; Kocsis, Michael; Meyers, Stephen; Telecky, Alan; Grenville, Andrew; De Simone, Danilo; Gillijns, Werner; Vandenberghe, Geert (2016) -
Modeling the topography of uneven substrates post spin-coating
Decoster, Stefan; Xiaoyu, Piao; Gillijns, Werner; Lazzarino, Frederic (2018) -
NXE:3400 OPC Process Monitoring: Model Validity vs. Process Variability
Xu, Dongbo; Rio, David; Gillijns, Werner; Delorme, Max; Baerts, Christina (2021-02-22) -
OPC resist model separability validation after SMO source change
Gillijns, Werner; Van de Kerkhove, Jeroen; Trivkovic, Darko; De Bisschop, Peter; Rio, David; Hsu, Stephen; Feng, Mu; Zang, Qiang; Liu, Hua-Yu (2013) -
Patterning process exploration of metal 1 layer in 7nm node with 3D pattering flow simulations
Gao, Weimin; Ciofi, Ivan; Saad, Yves; Matagne, Philippe; Bachman, Michael; Oulmane, Mohamed; Gillijns, Werner; Lucas, Kevin; Demmerle, Wolfgang; Schmoeller, Thomas (2015) -
Process Integration of High Aspect Ratio Vias with a Comparison between Co and Ru Metallizations
Vega Gonzalez, Victor; Montero Alvarez, Daniel; Versluijs, Janko; Varela Pedreira, Olalla; Jourdan, Nicolas; Puliyalil, Harinarayanan; Chehab, Bilal; Peissker, Tobias; Haider, Ali; Batuk, Dmitry; Martinez Alanis, Gerardo Tadeo; Geypen, Jef; Le, Quoc Toan; Bazzazian, Nina; Heylen, Nancy; van der Veen, Marleen; El-Mekki, Zaid; Webers, Tomas; Vats, H.; Rynders, Luc; Cupak, Miroslav; Lee, Jae Uk; Drissi, Youssef; Halipre, Luc; Gillijns, Werner; Charley, Anne-Laure; Verdonck, Patrick; Witters, Thomas; Van Gompel, Sander; Kimura, Yosuke; Ciofi, Ivan; De Wachter, Bart; Swerts, Johan; Grieten, Eva; Ercken, Monique; Kim, Ryan Ryoung han; Croes, Kristof; Leray, Philippe; Jaysankar, Manoj; Nagesh, Nishanth; Ramakers, Leon; Murdoch, Gayle; Park, Seongho; Tokei, Zsolt; Dentoni Litta, Eugenio; Horiguchi, Naoto (2021) -
Realizing more accurate OPC models by utilizing SEM contours
Wei, C.; Sejpal, R.; Deng, Y.; Kusnadi, I.; Fenger, G.; Oya, M.; Okamoto, Y.; Maruyama, K.; Yamazaki, Y.; Das, Sayantan; Halder, Sandip; Gillijns, Werner (2020) -
Reticle enhancement techniques toward iN7 metal2
Gillijns, Werner; Tan, Ling Ee; Blanco, Victor; Trivkovic, Darko; Kim, Ryan Ryoung han; Gallagher, Emily; McIntyre, Greg (2017) -
Single exposure EUV patterning for BEOL metal layers on the imec iN7 platform
Blanco, Victor; Bekaert, Joost; Mao, Ming; Kutrzeba Kotowska, Bogumila; Lariviere, Stephane; Ciofi, Ivan; Baert, Rogier; Kim, Ryan Ryoung han; Gallagher, Emily; Hendrickx, Eric; Tan, Ling Ee; Gillijns, Werner; Trivkovic, Darko; Leray, Philippe; Halder, Sandip; Gallagher, Matt; Lazzarino, Frederic; Paolillo, Sara; Wan, Danny; Mallik, Arindam; Sherazi, Yasser; McIntyre, Greg; Dusa, Mircea; Rusu, Paul; Hollink, Thijs; Fliervoet, Timon; Wittebrood, Friso (2017) -
Source mask optimization ( SMO) study for high-NA EUV lithography to achieve single patterning on random logic metal
Hwang, Soobin; Gillijns, Werner; de Gendt, Stefan; Kim, Ryan Ryoung han (2024) -
Standard cell design in N7: EUV vs. immersion
Chava, Bharani; Rio, David; Sherazi, Yasser; Trivkovic, Darko; Gillijns, Werner; Debacker, Peter; Raghavan, Praveen; Elsaid, Ahmad; Dusa, Mircea; Mercha, Abdelkarim; Ryckaert, Julien; Verkest, Diederik (2015)