Browsing by author "Rip, Jens"

50 nm Gate Length FinFET Biosensor & the Outlook for Single-Molecule Detection

Santermans, Sybren; Barge, David; Hellings, Geert; Bergfeld Mori, Carlos; Migacz, Konrad Joseph; Rip, Jens; Spampinato, Valentina; Vos, Rita; Du Bois, Bert; Ray Chaudhuri, Ashesh; Martino, J. A.; Heyns, Marc; Severi, Simone; Van Roy, Wim; Martens, Koen (2020)

A Ge matrix removal method for metallic contamination analysis on Ge wafers using TXRF

Hellin, David; Geens, Veerle; Teerlinck, Ivo; Rip, Jens; Theuwis, Antoon; De Gendt, Stefan; Vinckier, Chris (2004)

Advanced wafer surface cleaning technology

Mertens, Paul; Vos, Rita; Vereecke, Guy; Arnauts, Sophia; Bearda, Twan; De Waele, Rita; Eitoku, Atsuro; Fyen, Wim; Geckiere, J.; Hellin, David; Holsteyns, Frank; Kesters, Els; Claes, Martine; Kenis, Karine; Kraus, Harald; Malhouitre, Stephane; Lee, Kuntack; Kocsis, Michael; Onsia, Bart; Garaud, Sylvain; Rip, Jens; Snow, Jim; Teerlinck, I.; Van Hoeymissen, Jan; Barbagini, Francesca; Xu, Kaidong; Paraschiv, Vasile; De Gendt, Stefan; Mannaert, Geert; Heyns, Marc (2004)

Aluminium oxide atomic layer deposition on semiconductor substrates

Delabie, Annelies; Sioncke, Sonja; Rip, Jens; Van Elshocht, Sven; Pourtois, Geoffrey; Mueller, Matthias; Beckhoff, Burkhard; Pierloot, Kristine (2011)

Assessing stability of metal tellurides as alternative photomask materials for extreme ultraviolet lithography

Luong, Vu; Philipsen, Vicky; Opsomer, Karl; Rip, Jens; Hendrickx, Eric; Heyns, Marc; Detavernier, Christophe; Laubis, Christian; Scholze, Frank (2019)

Biocompatibility assessment of advanced wafer-level based chip encapsulation

Dy, Eric; Vos, Rita; Rip, Jens; La Manna, Antonio; Op de Beeck, Maaike (2010)

Cesium retention during sputtering with low energy Cs+ and oxygen flooding

Berghmans, Bart; Rip, Jens; Vandervorst, Wilfried (2011-01)

Chemical vapor deposition of azidoalkylsilane monolayer films

Vos, Rita; Rolin, Cedric; Rip, Jens; Conard, Thierry; Steylaerts, Tim; Vidal Cabanilles, Maria; Levrie, Karen; Jans, Karolien; Stakenborg, Tim (2018)

Development of Metal Free Wet Etching Chemical for Ruthenium Interconnect

Kesters, Els; Ohashi, Takuya; Wada, Y; Sugawara, M; Kumagai, T; Le, Quoc Toan; Rip, Jens; Oniki, Yusuke; Holsteyns, Frank (2019)

Electrochemical and analytical study of the Si etching mechanism in HF

Valckx, Nick; Vos, Rita; Rip, Jens; Doumen, Geert; Mertens, Paul; Bearda, Twan; Heyns, Marc; De Gendt, Stefan (2009)

Electrochemical and analytical study of the Si etching mechanism in HF

Valckx, Nick; Vos, Rita; Rip, Jens; Doumen, Geert; Mertens, Paul; Bearda, Twan; Heyns, Marc; De Gendt, Stefan (2009)

Epitaxy solutions for Ge MOS technology

Leys, Frederik; Bonzom, Renaud; Loo, Roger; Richard, Olivier; De Jaeger, Brice; Van Steenbergen, Jan; Dessein, Kristof; Conard, Thierry; Rip, Jens; Bender, Hugo; Vandervorst, Wilfried; Meuris, Marc; Caymax, Matty (2005)

Etching of III-V materials determined by ICP-MS with sub-nanometer precision

Rip, Jens; Cuypers, Daniel; Arnauts, Sophia; Holsteyns, Frank; van Dorp, Dennis; De Gendt, Stefan (2014)

Growth kinetics and relaxation mechanism of very thin epitaxial Si films on (100) germanium

Bonzom, Renaud; Leys, Frederik; Loo, Roger; Richard, Olivier; Vanhaeren, Danielle; Rip, Jens; Van Steenbergen, Jan; De Jaeger, Brice; Bender, Hugo; Vandervorst, Wilfried; Caymax, Matty; Meuris, Marc (2005)

Investigation of metallic contamination analysis using vapor phase decomposition – droplet collection – total reflection X-ray fluorescence (VPD-DC-TXRF) for Pt-group elements on silicon wafers

Hellin, David; Valckx, Nick; Rip, Jens; De Gendt, Stefan; Vinckier, Chris (2008)