Browsing by author "Rip, Jens"
Now showing items 21-40 of 57
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Metal deposition on Ge surfaces
Sioncke, Sonja; Onsia, Bart; Struys, K.; Rip, Jens; Vos, Rita; Meuris, Marc; Mertens, Paul; Theuwis, A. (2005) -
Metal electrode dissolution during in vitro biphasic current stimulation
Rand, Danielle; Loo, Josine; Rip, Jens; Eberle, Wolfgang (2011) -
Metals in the active site of native protein phosphatase-1
Heroes, Ewald; Rip, Jens; Beullens, M.; Van Meervelt, L.; De Gendt, Stefan; Bollen, M. (2015) -
Methodology for measuring trace metal surface contamination on PV silicon substrates
Rip, Jens; Wostyn, Kurt; Mertens, Paul; De Gendt, Stefan; Claes, Martine (2012) -
Nanoscale etching and reoxidation of InAs
van Dorp, Dennis; Arnauts, Sophia; Cuypers, Daniel; Rip, Jens; Holsteyns, Frank; De Gendt, Stefan (2014) -
Nanoscale etching of III-V semiconductors in acidic H2O2 solutions
van Dorp, Dennis; Arnauts, Sophia; Cuypers, Daniel; Rip, Jens; Holsteyns, Frank; De Gendt, Stefan (2013) -
Nanoscale etching of In0.53Ga0.47As for advanced CMOS processing
van Dorp, Dennis; Arnauts, Sophia; Cuypers, Daniel; Rip, Jens; Holsteyns, Frank; De Gendt, Stefan; Kelly, John (2014) -
Optimization of EUV reticle cleaning by evaluation of chemistries on wafer-based mimic test structures.
Pacco, Antoine; Dattilo, Davide; Jonckheere, Rik; Rip, Jens; Dietze, Uwe; Kruemberg, Jens; Holsteyns, Frank (2016) -
Optimization of post etch cobalt compatible clean by pH and oxidizer
Iino, H.; Ogawa, Y.; Masaoka, T.; Le, Quoc Toan; Kesters, Els; Rip, Jens; Oniki, Yusuke; Akanishi, Y.; Iwasaki, Akihisa; Holsteyns, Frank (2018) -
Optimized post-CMP and Pre-Epi cleans to enable smooth and high quality epitaxial strained Ge growth on SiGe strain relaxed buffers
Loo, Roger; Souriau, Laurent; Ong, Patrick; Kenis, Karine; Rip, Jens (2010-09) -
Optimized post-CMP and pre-Epi cleans to enable smooth and high quality epitaxial strained Ge growth on SiGe strain relaxed buffers
Loo, Roger; Souriau, Laurent; Ong, Patrick; Kenis, Karine; Rip, Jens (2012) -
Post-direct-CMP dielectric surface copper contamination: quantitative analysis and impact on dielectric breakdown behaviour
Heylen, Nancy; Li, Yunlong; Travaly, Youssef; Vereecke, Guy; Volders, Henny; Tokei, Zsolt; Versluijs, Janko; Rip, Jens; Beyer, Gerald; Fischer, Paul; Zhao, Larry; Santoro, Gaetano; Nguyen, Olivier; Cockburn, Andrew (2008) -
Post-direct-CMP dielectric surface copper contamination: quantitative analysis and impact on dielectric breakdown behaviour
Heylen, Nancy; Li, Yunlong; Kellens, Kristof; Travaly, Youssef; Vereecke, Guy; Volders, Henny; Tokei, Zsolt; Versluijs, Janko; Rip, Jens; Van Besien, Els; Carbonell, Laure; Beyer, Gerald; Fischer, Paul; Zhao, Larry; Santoro, Gaetano; Cockburn, Andrew; Nguyen, Olivier (2009) -
Reaction mechanisms for atomic layer deposition of aluminum oxide on semiconductor substrates
Delabie, Annelies; Sioncke, Sonja; Rip, Jens; Van Elshocht, Sven; Pourtois, Geoffrey; Mueller, Matthias; Beckhoff, Burkhard; Pierloot, Kristine (2012) -
Remediation for TXRF saturation effects on micro-droplet residues from preconcentration methods on semiconductor wafers
Hellin, David; Rip, Jens; Geens, Veerle; Delande, Tinne; Conard, Thierry; De Gendt, Stefan; Vinckier, Chris (2005) -
Rinsing and drying issues during the post CMP cleaning process
Fyen, Wim; Xu, Kaidong; Van Steenbergen, Jan; Vereecke, Guy; Vos, Rita; Arnauts, Sophia; Rip, Jens; Kenis, Karine; Holsteyns, Frank; Hellin, David; Doumen, Geert; Mertens, Paul; Kraus, Harald; Lee, Kim (2004) -
S-passivation of the Ge gate stack: Tuning the gate stack properties by changing the atomic layer deposition oxidant precursor
Sioncke, Sonja; Lin, Dennis; Nyns, Laura; Brammertz, Guy; Delabie, Annelies; Conard, Thierry; Franquet, Alexis; Rip, Jens; Struyf, Herbert; De Gendt, Stefan; Muller, Matthias; Beckhoff, Burkhard; Caymax, Matty (2011) -
Saturation effects in TXRF on micro-droplet residue samples
Hellin, David; Fyen, Wim; Rip, Jens; Delande, Tinne; Mertens, Paul; De Gendt, Stefan; Vinckier, Chris (2004) -
Scaled-down c-Si and c-SiGe wagon-wheels for the visualization of the anisotropy and selectivity of wet-chemical etchants
Pacco, Antoine; Tao, Zheng; Rip, Jens; van Dorp, Dennis; Philipsen, Harold; Holsteyns, Frank (2019) -
Selective etch of Si and SiGe for gate-all-around device architecture
Wostyn, Kurt; Sebaai, Farid; Rip, Jens; Mertens, Hans; Witters, Liesbeth; Loo, Roger; Hikavyy, Andriy; Milenin, Alexey; Horiguchi, Naoto; Collaert, Nadine; Thean, Aaron; Mertens, Paul; De Gendt, Stefan; Holsteyns, Frank (2015-10)