Browsing by author "Eyckens, Brenda"
Now showing items 1-11 of 11
-
Characterization of the growth of atomic layer deposited WNxCy films on various substrates
Martin Hoyas, Ana; Travaly, Youssef; Schuhmacher, Jorg; Sajavaara, Timo; Whelan, Caroline; Eyckens, Brenda; Richard, Olivier; Giangrandi,; Brijs, Bert; Jonas, A.M.; Vantomme, Andre; Vandervorst, Wilfried; Celis, Jean-Pierre; Maex, Karen (2005) -
Effects of UV-cure on mechanical, physical and electrical properties of microporous SiOC:H dielectric films
Iacopi, Francesca; Waldfried, Carlo; Abell, Thomas; Guyer, Eric; Eyckens, Brenda; Travaly, Youssef; Sajavaara, Timo; Gage, David M.; Beyer, Gerald; Berry, Ivan; Dauskardt, Reinhold; Maex, Karen (2005) -
Growth and characterization of atomic layer deposited WCxNy
Martin Hoyas, Ana; Travaly, Youssef; Schuhmacher, Jorg; Sajavaara, T.; Whelan, Caroline; Eyckens, Brenda; Richard, Olivier; Giangrandi, Simone; Brijs, Bert; Jonas, A.M.; Vantomme, A.; Vandervorst, Wilfried; Celis, Jean-Pierre; Maex, Karen (2005) -
Highly reliable and extremely stable SiGe micro-mirrors
Gromova, Maria; Haspeslagh, Luc; Verbist, Agnes; Du Bois, Bert; Van Hoof, Rita; Eyckens, Brenda; Sijmus, Bram; De Wolf, Ingrid; Simons, Veerle; Muller, Philippe; Lauwagie, Tom; Willegems, Myriam; Locorotondo, Sabrina; Boullart, Werner; Baert, Kris; Witvrouw, Ann (2007-01) -
Impact of LKD5109 low-k to cap/liner interfaces in single damascene process and performance
Iacopi, Francesca; Patz, Michael; Vos, Ingrid; Tokei, Zsolt; Sijmus, Bram; Le, Quoc Toan; Sleeckx, Erik; Eyckens, Brenda; Struyf, Herbert; Das, Arabinda; Maex, Karen (2003) -
Impact of material/process interactions on the properties of a porous CVD-O3 low-k dielectric film
Travaly, Youssef; Eyckens, Brenda; Carbonell, Laure; Rothschild, Aude; Le, Quoc Toan; Brongersma, Sywert; Ciofi, Ivan; Struyf, Herbert; Furukawa, Yukiko; Stucchi, Michele; Schaekers, Marc; Bender, Hugo; Rosseel, Erik; Vanhaelemeersch, Serge; Maex, Karen; Gaillard, F.; Van Autryve, Luc; Rabinzohn, P. (2002) -
Integration of single damascene 85/85nm/L/S copper trenches in black diamond using 193nm optical lithography with dipole illumination
Van Olmen, Jan; Wu, Wen; Van Hove, Marleen; Travaly, Youssef; Brongersma, Sywert; Eyckens, Brenda; Maenhoudt, Mireille; Van Aelst, Joke; Struyf, Herbert; Demuynck, Steven; Tokei, Zsolt; Vervoort, Iwan; Sijmus, Bram; Vos, Ingrid; Ciofi, Ivan; Stucchi, Michele; Maex, Karen; Iacopi, Francesca (2003) -
Performance improvement of tall triple gate devices with strained SiN layers
Collaert, Nadine; De Keersgieter, An; Kottantharayil, Anil; Rooyackers, Rita; Eneman, Geert; Goodwin, Michael; Eyckens, Brenda; Sleeckx, Erik; de Marneffe, Jean-Francois; De Meyer, Kristin; Absil, Philippe; Jurczak, Gosia; Biesemans, Serge (2005-11) -
Potential remedies for the VT/Vfb-shift problem of Hf/polysilicon-based gate stacks: a solution-based survey
Deweerd, Wim; Kaushik, Vidya; Chen, J.; Shimamoto, Y.; Ragnarsson, Lars-Ake; Delabie, Annelies; Pantisano, Luigi; Eyckens, Brenda; Maes, J.W.; De Gendt, Stefan; Heyns, Marc (2004) -
Potential remedies for the VT/Vfb-shift problem of Hf/polysilicon-based gate stacks: a solution-based survey
Deweerd, Wim; Kaushik, Vidya; Chen, J.; Shimamoto, Y.; Schram, Tom; Ragnarsson, Lars-Ake; Delabie, Annelies; Pantisano, Luigi; Eyckens, Brenda; Maes, J.W.; De Gendt, Stefan; Heyns, Marc (2005-01) -
Process optimization of low temperature silicon nitride stressor layers for improvement of device performance for 45nm technology and below
Eyckens, Brenda; Collaert, Nadine; Schaekers, Marc; Sleeckx, Erik; Eneman, Geert; Verheyen, Peter; Rooyackers, Rita (2005)