Browsing by author "Vesters, Yannick"
Now showing items 1-20 of 20
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Alternative patterning mechanisms for Extreme Ultraviolet Lithography
Vesters, Yannick; De Simone, Danilo; De Gendt, Stefan (2018) -
Development of main chain scission type photoresists for EUV lithography
Shirotori, Akihide; Vesters, Yannick; Hoshino, Manabu; Rathore, Ashish; De Simone, Danilo; Vandenberghe, Geert; Matsumoto, Hirokazu (2019) -
Dissolution rate monitor tool to measure EUV photoresist dissolution
Vesters, Yannick; De Simone, Danilo; De Gendt, Stefan (2017) -
EUV photoresist patterning characterization for imec N7/N5 technology
De Simone, Danilo; Rutigliani, Vito; Lorusso, Gian; De Bisschop, Peter; Vesters, Yannick; Blanco, Victor; Vandenberghe, Geert (2018) -
Exploring the readiness of EUV photo materials for patterning
De Simone, Danilo; Vesters, Yannick; Shehzad, Atif; Vandenberghe, Geert; Foubert, Philippe; Beral, Christophe; Van Den Heuvel, Dieter; Mao, Ming; Lazzarino, Frederic (2017) -
Inluence of post exposure bake time on EUV photoresist RLS trade-off
Vesters, Yannick; De Simone, Danilo; De Gendt, Stefan (2017) -
Molecular modeling of EUV photoresist revealing the effect of chain conformation on line edge roughness formation
Park, Juhae; Lee, Sung-Gyu; Vesters, Yannick; Severi, Joren; Myungwoong, Kim; De Simone, Danilo; Oh, Hye-Keun; Hur, Su-Mi (2019) -
Multi trigger resist for EUV lithography
Popescu, Carmen; Vesters, Yannick; McClelland, Alexandra; De Simone, Danilo; Dawson, Guy; Roth, John; Theis, Wolfgang; Vandenberghe, Geert; Robinson, Alex (2018) -
Multi-trigger resist patterning with ASML NXE3300 EUV scanner
Vesters, Yannick; McClelland, Alexandra; De Simone, Danilo; Popescu, Carmen; Dawson, Guy; Roth, John; Theis, Wolfgang; Vandenberghe, Geert; Robinson, Alex P. G. (2018) -
Non-linearity of the dissolution behaviour in Extreme UV photoresists
Vesters, Yannick; De Simone, Danilo (2016) -
Non-Linearity of the dissolution in advanced EUV photoresist
Vesters, Yannick; De Simone, Danilo (2016) -
Photoresist absorption measurement at extreme ultraviolet (EUV) wavelength by thin film transmission method
Vesters, Yannick; Shehzad, Atif; De Simone, Danilo; Pollentier, Ivan; Nannarone, Stefano; Vandenberghe, Geert; De Gendt, Stefan (2019) -
Photoresists in extreme ultraviolet lithography
De Simone, Danilo; Vesters, Yannick; Vandenberghe, Geert (2017) -
Role of metal sensitizers for sensitivity improvement in EUV chemically amplified resist
Yamamoto, Hiroki; Vesters, Yannick; Jiang, Jing; De Simone, Danilo; Vandenberghe, Geert; Kozawa, Takahiro (2019-01) -
Sensitizers in EUV chemically amplified resist: mechanism of sensitivity improvement
Vesters, Yannick; Jiang, Jing; Yamamoto, Hiroki; De Simone, Danilo; Kozawa, Takahiro; De Gendt, Stefan; Vandenberghe, Geert (2018) -
Sensitizers in extreme ultraviolet chemically amplified resists: mechanism of sensitivity improvement
Vesters, Yannick; Jiang, Jing; Yamamoto, Hiroki; De Simone, Danilo; Kozawa, Takahiro; De Gendt, Stefan; Vandenberghe, Geert (2019-12) -
State-of-the-art of EUV materials for N5 logic and DRAM applications
De Simone, Danilo; Vesters, Yannick; Vanelderen, Pieter; Xue, Ran; Pollentier, Ivan; Vandenberghe, Geert (2018) -
The path to better understanding stochastics in EUV photoresist
De Simone, Danilo; Vesters, Yannick; Vandenberghe, Geert (2018) -
Unraveling the role of secondary electrons upon their interaction with photoresist during EUV exposure
Pollentier, Ivan; Vesters, Yannick; Jiang, Jing; Vanelderen, Pieter; De Simone, Danilo (2017)