Browsing by author "Van Adrichem, Paul"

Characterization and control of dynamic lens heating effects under high-volume manufacturing conditions

Bekaert, Joost; Van Look, Lieve; Vandenberghe, Geert; Van Adrichem, Paul; Maslow, Mark J.; Gemmink, Jan-Willem; Cao, Hua; Hunsche, Stefan; Neumann, Jens Timo; Wolf, Alexander (2011)

Complementary phase-shift mask towards 70-nm technology node

Driessen, Frank; Vandenberghe, Geert; Ercken, Monique; Montgomery, Patrick; Ronse, Kurt; Van Adrichem, Paul; Li, J.; Liu, H.Y.; Karklin, L. (2002)

Evaluation of local CD and placement distribution on EUV mask and its impact on wafer

Vaenkatesan, Vidya; Van Adrichem, Paul; Kooiman, Marleen; Kubis, Michael; Van Look, Lieve; Frommhold, Andreas; Gallagher, Emily; Nam, DS; Mulkens, Jan; Finders, Jo; Rispens, Gijsbert (2019)

Experimental verification of source-mask optimization and freeform illumination for 22 nm node SRAM cells

Bekaert, Joost; Laenens, Bart; Verhaegen, Staf; Van Look, Lieve; Trivkovic, Darko; Lazzarino, Frederic; Vandenberghe, Geert; Van Adrichem, Paul; Socha, Robert; Hsu, Stephen; Liu, Hua Yu; Mouraille, Orion; Schreel, Koen; Dusa, Mircea; Zimmermann, Joerg; Gräupner, Paul; Neumann, Jens Timo (2011-03)

Extending ArF to the 65-nm node with full-phase lithography

Driessen, Frank; Pierrat, C.; Vandenberghe, Geert; Ronse, Kurt; Van Adrichem, Paul; Liu, H.Y. (2003)

Feasibility study of the approach to Flare, shadowing, optical and process corrections for EUVL OPC

Nikolsky, Peter; Davydova, Natalia; van Ingen Schenau, Koen; Van Adrichem, Paul; Hendrickx, Eric; Lorusso, Gian; Jiang, Jiong; Liu, Wei; Liu, Huayu (2009-09)

Freeform illumination sources: an experimental study of source-mask optimization for 22nm SRAM cells

Bekaert, Joost; Laenens, Bart; Verhaegen, Staf; Van Look, Lieve; Trivkovic, Darko; Lazzarino, Frederic; Vandenberghe, Geert; Van Adrichem, Paul; Socha, Robert; Baron, S.; Tsai, M.-C.; Ning, K.; Hsu, S.; Liu, H.Y.; Mulder, M.; Bouma, A.; van der Heijden, E.; Mouraille, O.; Schreel, K.; Finders, Jo; Dusa, Mircea; Zimmerman, J.; Graeupner, Paul; Neumann, J.T.; Hennerkes, C. (2010)

Freeform illumination sources: Source mask optimization for 22 nm node SRAM

Bekaert, Joost; Laenens, Bart; Verhaegen, Staf; Van Look, Lieve; Trivkovic, Darko; Lazzarino, Frederic; Vandenberghe, Geert; Van Adrichem, Paul; Socha, Robert; Mulder, M.; Baron, Stanislas; Tsai, Min-Chun; Ning, Kai; Hsu, Stephen; Bouma, A.; van der Heijden, E.; Schreel, Koen; Carpaij, R.; Dusa, Mircea; Zimmerman, Joerg; Graeupner, Paul; Hennerkes, Christoph (2009)

Hybrid single mode nanophotonic-plasmonic waveguides for on-chip surface enhanced raman spectroscopy

Peyskens, Frederick; Dhakal, Ashim; Van Adrichem, Paul; Le Thomas, Nicolas; Baets, Roel (2016)

Improving exposure latitude and aligning best focus through pitch by curing M3D effects with controlled aberrations

Franke, Joern-Holger; Bekaert, Joost; Blanco, Victor; Van Look, Lieve; Wahlisch, Felix; Lyakhova, Kateryna; Van Adrichem, Paul; Maslow, Mark John; Schiffelers, Guido; Hendrickx, Eric (2019)

Mask 3D effect mitigation by source optimization and assist feature placement

Van Look, Lieve; Mochi, Iacopo; Philipsen, Vicky; Gallagher, Emily; Hendrickx, Eric; McIntyre, Greg; Wittebrood, Friso; Lyakhova, Kateryna; de Winter, Laurens; Last, Thorsten; Fliervoet, Timon; Schiffelers, Guido; Finders, Jo; Van Adrichem, Paul; Lyons, Adam; Laenens, Bart; Liddle, Jack; Neumann, Jens Timo (2016)

Wafer based aberration metrology for lithographic systems using overlay measurements on targets imaged from phase-shift gratings

van Haver, Sven; Coene, Wim M.J.; D'have, Koen; Geypen, Niels; Van Adrichem, Paul; de Winter, Laurens; Janssen, Augustus J.E.M.; Cheng, Shaunee (2014)