Browsing by author "Xu, Kaidong"
Now showing items 1-20 of 64
-
15nm half-pitch patterning: EUV + SELF-aligned double patterning
Versluijs, Janko; Souriau, Laurent; Hellin, David; Orain, Isabelle; Kimura, Yoshie; Kunnen, Eddy; Dekkers, Harold; Shi, Xiaoping; Albert, Johan; Wiaux, Vincent; Xu, Kaidong (2012) -
15nm HP patterning with EUV and SADP: key contributors for improvement of LWR, LER, and CDU
Xu, Kaidong; Souriau, Laurent; Hellin, David; Versluijs, Janko; Wong, Patrick; Vangoidsenhoven, Diziana; Vandenbroeck, Nadia; Dekkers, Harold; Shi, Xiaoping; Albert, Johan; Tan, Chi Lim; Vertommen, Johan; Coenegrachts, Bart; Orain, I.; Kimura, Y.; Wiaux, Vincent; Boullart, Werner (2013) -
15nm HP patterning with EUV lithography and SADP
Souriau, Laurent; Hellin, David; Kunnen, Eddy; Versluijs, Janko; Dekkers, Harold; Albert, Johan; Orain, Isabelle; Yoshie, Kimura; Xu, Kaidong; Vertommen, Johan; Wiaux, Vincent; Boullart, Werner (2012) -
28nm pitch of line/space pattern transfer into silicon substrates with chemo-epitaxy directed self-assembly (DSA) process flow
Chan, BT; Tahara, Shigeru; Parnell, Doni; Rincon Delgadillo, Paulina; Gronheid, Roel; de Marneffe, Jean-Francois; Xu, Kaidong; Nishimura, Eiichi; Werner, Thilo (2013) -
A force study in brush scrubbing
Xu, Kaidong; Vos, Rita; Vereecke, Guy; Doumen, Geert; Mertens, Paul; Heyns, Marc (2004) -
A force study in brush scrubbing
Xu, Kaidong; Vos, Rita; Vereecke, Guy; Doumen, Geert; Fyen, Wim; Mertens, Paul; Heyns, Marc; Vinckier, Chris; Fransaer, Jan (2005) -
A force study of on-chip magnetic particle transport based on tapered conductors
Wirix-Speetjens, Roel; Fyen, Wim; Xu, Kaidong; De Boeck, Jo; Borghs, Gustaaf (2005) -
A study in interactions of plasmas and wet cleans with ULK materials
Xu, Kaidong; Vereecke, Guy; Kesters, Els; Le, Quoc Toan; Lux, Marcel; Kraus, Harald; Henry, Sally - Ann; Archer, L.; Gaulhofer, E.; Kovacs, F.; Dalmer, M.; Mertens, Paul; Luo, S. J; Han, Q. Y (2007) -
Advanced wafer surface cleaning technology
Mertens, Paul; Vos, Rita; Vereecke, Guy; Arnauts, Sophia; Bearda, Twan; De Waele, Rita; Eitoku, Atsuro; Fyen, Wim; Geckiere, J.; Hellin, David; Holsteyns, Frank; Kesters, Els; Claes, Martine; Kenis, Karine; Kraus, Harald; Malhouitre, Stephane; Lee, Kuntack; Kocsis, Michael; Onsia, Bart; Garaud, Sylvain; Rip, Jens; Snow, Jim; Teerlinck, I.; Van Hoeymissen, Jan; Barbagini, Francesca; Xu, Kaidong; Paraschiv, Vasile; De Gendt, Stefan; Mannaert, Geert; Heyns, Marc (2004) -
Advances and challenges in ultra low-k patterning
Xu, Kaidong; Souriau, Laurent; Lazzarino, Frederic; de Marneffe, Jean-Francois; Baklanov, Mikhaïl; Boullart, Werner (2012) -
Aging phenomena in the removal of nano-particles from Si wafers
Vereecke, Guy; Veltens, J.; Xu, Kaidong; Eitoku, A.; Sano, Ken-Ichi; Arnauts, Sophia; Kenis, Karine; Snow, J.; Vinckier, Chris; Mertens, Paul (2008) -
Challenges with respect to high-k/metal gate stack etching and cleaning
Vos, Rita; Arnauts, Sophia; Bovie, Inge; Onsia, Bart; Garaud, Sylvain; Xu, Kaidong; Yu, HongYu; Kubicek, Stefan; Rohr, Erika; Schram, Tom; Veloso, Anabela; Conard, Thierry; Leunissen, Peter; Mertens, Paul (2007) -
Cleaning of nanoparticles in semiconductor manufacturing
Vereecke, Guy; Arnauts, Sophia; Doumen, Geert; Eitoku, Atsuro; Fransaer, J.; Fyen, Wim; Holsteyns, Frank; Kenis, Karine; Lee, Kuntack; Lux, Marcel; Snow, Jim; Vinckier, Chris; Vos, Rita; Xu, Kaidong; Mertens, Paul (2004) -
Clustered single wafer wet cleaning
Mertens, Paul; Holsteyns, Frank; Vos, Rita; Vereecke, Guy; Fyen, Wim; Lauerhaas, Jeff; Xu, Kaidong; Bearda, Twan; Teerlinck, Ivo; Arnauts, Sophia; Kenis, Karine; Schmidt, Michael; Heyns, Marc (2002) -
Correlation between haze of the wafer and particle-count on wafers: a new approach to monitor nano-sized particles
Xu, Kaidong; Vos, Rita; Vereecke, Guy; Lux, Marcel; Fyen, Wim; Holsteyns, Frank; Kenis, Karine; Mertens, Paul; Heyns, Marc; Vinckier, Chris (2002) -
Damage-free removal of nano-sized particles, heading towards a red brick wall
Mertens, Paul; Fyen, Wim; Vereecke, Guy; Xu, Kaidong; Lauerhaas, J.; Holsteyns, Frank; Van Doorne, Patrick; Kesters, Els; Vos, Rita (2003) -
Development of 2-step plasma texturing process for crystalline silicon solar cells with Linear Microwave Plasma Sources (LPS)
Chan, BT; Kunnen, Eddy; Shamiryan, Denis; Xu, Kaidong; Boullart, Werner (2011) -
Effect of plasma treatments on the compatibility of ULK to wet cleaning
Xu, Kaidong; Kesters, Els; Vereecke, Guy; Lux, Marcel; Kraus, H; Henry, S.A.; Archer, L; Gaulhofer, E.; Kovacs, F.; Dalmer, M; Schmidt, T; Leunissen, Peter; Mertens, Paul; Luo, S.J.; Han, Q. Y. (2007) -
Effect of precoat on the sidewall profile of through silicon via's
Babaei Gavan, Khashayar; Lazzarino, Frederic; Brouri, Mohand; Tutunjyan, Nina; de Marneffe, Jean-Francois; Kunnen, Eddy; Xu, Kaidong (2013) -
Effect of transient pH on particle deposition during immersion rinsing
Fyen, Wim; Xu, Kaidong; Vos, Rita; Vereecke, Guy; Mertens, Paul; Heyns, Marc (2003)