Browsing by author "Baudemprez, Bart"
Now showing items 1-20 of 35
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A metal hardmask approach for the contact patterning of a 0.186 μm² SRAM cell exposed with EUV lithography
de Marneffe, Jean-Francois; Goossens, Danny; Vandervorst, Alain; Demuynck, Steven; Goethals, Mieke; Hermans, Jan; Van Roey, Frieda; Baudemprez, Bart; Brus, Stephan; Vrancken, Christa (2008) -
A year of new mask defectivity insights in imec's EUVL program
Jonckheere, Rik; Van Den Heuvel, Dieter; Baudemprez, Bart; Jehoul, Christiane; Pacco, Antoine (2013) -
Accurate models for EUV simulation and their use for design correction
Lorusso, Gian; Hermans, Jan; Baudemprez, Bart; Hendrickx, Eric; Klostermann, Ulrich K.; Jang, Stephen; Zavyalova, Lena; Sorensen, Jacob; Gao, Weimin; Lucas, Kevin (2009) -
Demonstration of scaled 0.099μm² FinFET 6T-SRAM cell using full-field EUV lithography for (Sub-)22nm node single-patterning technology
Veloso, Anabela; Demuynck, Steven; Ercken, Monique; Goethals, Mieke; Locorotondo, Sabrina; Lazzarino, Frederic; Altamirano Sanchez, Efrain; Huffman, Craig; De Keersgieter, An; Brus, Stephan; Demand, Marc; Struyf, Herbert; De Backer, Johan; Hermans, Jan; Delvaux, Christie; Baudemprez, Bart; Vandeweyer, Tom; Van Roey, Frieda; Baerts, Christina; Goossens, Danny; Dekkers, Harold; Ong, Patrick; Heylen, Nancy; Kellens, Kristof; Volders, Henny; Hikavyy, Andriy; Vrancken, Christa; Rakowski, Michal; Verhaegen, Staf; Dusa, Mircea; Romijn, Leon; Pigneret, Charles; van Dijk, Andre; Schreutelkamp, Rob; Cockburn, Andrew; Gravey, Virginie; Meiling, H.; Hultermans, B.; Lok, S.; Shah, K.; Rajagopalan, R.; Gelatos, J.; Richard, Olivier; Bender, Hugo; Vandenberghe, Geert; Beyer, Gerald; Absil, Philippe; Hoffmann, Thomas Y.; Ronse, Kurt; Biesemans, Serge (2009-12) -
Dependence of EUV mask printing performance on blank architecture
Jonckheere, Rik; Hyun, Yoonsuk; Iwamoto, Fumio; Baudemprez, Bart; Hermans, Jan; Lorusso, Gian; Pollentier, Ivan; Goethals, Mieke; Ronse, Kurt (2008-03) -
Detection of bonding voids for 3D integration
Chen, Cong; Van den Heuvel, Dieter; Beggiato, Matteo; Tunca Altintas, Bensu; Moussa, Alain; Vandooren, Anne; Baudemprez, Bart; Schobitz, Michael; Khaldi, Wassim; Bogdanowicz, Janusz; Beral, Christophe; Charley, Anne-Laure (2023) -
Effective EUVL mask cleaning technology solutions for mask manufacturing and in-fab mask maintenance
Dietze, Uwe; Dress, Peter; Waehler, Tobias; Singh, Sherjang; Jonckheere, Rik; Baudemprez, Bart (2011) -
Effective solutions for in-fab EUVL mask cleaning
Wähler, Tobias; Singh, Sherjang; Dietze, Uwe; Jonckheere, Rik; Baudemprez, Bart (2010) -
EUV lithography implementation on contact and metal interconnect level of a 22nm node 0.099um2 6T-SRAM cell
Goethals, Mieke; Demuynck, Steven; Van Roey, Frieda; Baudemprez, Bart; Hermans, Jan; Huffman, Craig; Lazzarino, Frederic; Pollentier, Ivan; Hendrickx, Eric; Jonckheere, Rik; Verhaegen, Staf; Veloso, Anabela; Vandenberghe, Geert; Ronse, Kurt (2009) -
EUV lithography program at IMEC
Goethals, Mieke; Jonckheere, Rik; Lorusso, Gian; Hermans, Jan; Van Roey, Frieda; Myers, Alan; Chandhok, Manish; Kim, In Sung; Niroomand, Ardavan; Iwamoto, Fumio; Stepanenko, Nickolay; Gronheid, Roel; Baudemprez, Bart; Ronse, Kurt (2007) -
EUV mask defectivity: status and mitigation towards HVM
Jonckheere, Rik; Van Den Heuvel, Dieter; Lamantia, Matthew; Baudemprez, Bart; Hendrickx, Eric; Ronse, Kurt (2010) -
Experimental validation of full-field extreme ultraviolet lithography flare and shadowing corrections
Myers, Alan; Lorusso, Gian; Kim, In Sung; Goethals, Mieke; Jonckheere, Rik; Hermans, Jan; Baudemprez, Bart; Ronse, Kurt (2008) -
Full field EUV lithography turning into reality at IMEC
Jonckheere, Rik; Lorusso, Gian; Goethals, Mieke; Hermans, Jan; Baudemprez, Bart; Myers, Alan; Kim, In Sung; Niroomand, Ardavan; Iwamoto, Fumio; Stepanenko, Nickolay; Ronse, Kurt (2007) -
Full field EUV lithography: lessons learnt on EUV ADT imaging, EUV resist, and EUV reticles
Hendrickx, Eric; Goethals, Mieke; Niroomand, Ardavan; Jonckheere, Rik; Van Roey, Frieda; Lorusso, Gian; Hermans, Jan; Baudemprez, Bart; Ronse, Kurt (2008) -
Full-field EUV and immersion lithography integration in 0.186μm² FinFET 6T-SRAM cell
Veloso, Anabela; Demuynck, Steven; Ercken, Monique; Goethals, Mieke; Demand, Marc; de Marneffe, Jean-Francois; Altamirano Sanchez, Efrain; De Keersgieter, An; Delvaux, Christie; De Backer, Johan; Brus, Stephan; Hermans, Jan; Baudemprez, Bart; Van Roey, Frieda; Lorusso, Gian; Baerts, Christina; Goossens, Danny; Vrancken, Christa; Mertens, Sofie; Versluijs, Janko; Truffert, Vincent; Huffman, Craig; Laidler, David; Heylen, Nancy; Ong, Patrick; Parvais, Bertrand; Rakowski, Michal; Verhaegen, Staf; Hikavyy, Andriy; Meiling, H.; Hultermans, B.; Romijn, L.; Pigneret, C.; Lok, S.; Van Dijk, A.; Shah, K.; Noori, A.; Gelatos, J.; Arghavani, R.; Schreutelkamp, Rob; Boelen, Pieter; Richard, Olivier; Bender, Hugo; Witters, Liesbeth; Collaert, Nadine; Rooyackers, Rita; Absil, Philippe; Lauwers, Anne; Jurczak, Gosia; Hoffmann, Thomas Y.; Vanhaelemeersch, Serge; Cartuyvels, Rudi; Ronse, Kurt; Biesemans, Serge (2008) -
Further investigation of EUV process sensitivities for wafer track processing
Bradon, Neil; Nafus, Kathleen; Shite, Hideo; Kitano, J.; Kosugi, H.; Goethals, Mieke; Cheng, Shaunee; Hermans, Jan; Hendrickx, Eric; Baudemprez, Bart; Van Den Heuvel, Dieter (2010) -
Hybrid overlay metrology for high order correction by using CDSEM
Leray, Philippe; Halder, Sandip; Lorusso, Gian; Baudemprez, Bart; Inoue, Osamu; Okagawa, Yutaka (2016) -
Imaging performance of the EUV alpha demo tool at IMEC
Lorusso, Gian; Hermans, Jan; Goethals, Mieke; Baudemprez, Bart; Van Roey, Frieda; Myers, Alan; Kim, In Sung; Kim, Byeong Soo; Jonckheere, Rik; Niroomand, Ardavan; Lok, E.; Van Dijk, A.; de Marneffe, Jean-Francois; Demuynck, Steven; Goossens, Danny; Ronse, Kurt (2008) -
Implementing full field EUV lithography using the ADT
Goethals, Mieke; Hendrickx, Eric; Jonckheere, Rik; Lorusso, Gian; Baudemprez, Bart; Hermans, Jan; Laidler, David; Niroomand, Ardavan; Van Roey, Frieda; van Dijk, Andre; Romijn, Leon; Stepanenko, Nickolay; Timoshkov, Vadim; Iwamoto, Fumio; Myers, Alan; Hyun, Yoonsuk; Lim, Changmoon; Pollentier, Ivan; Leeson, Michael; de Marneffe, Jean-Francois; Demuynck, Steven; Ronse, Kurt (2008) -
In-line litho cluster monitoring and control using integrated scatterometry
Pollentier, Ivan; Cheng, Shaunee; Baudemprez, Bart; Laidler, David; van Dommelen, Y.; Carpaij, R.; Yu, J.; Uchida, J.; Viswanathan, A.; Chin, D.T.; Barry, K.; Jakatdar, N. (2004-02)