Browsing by author "Lucas, Kevin"
Now showing items 1-20 of 28
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100-nm generation contact patterning by low temperature 193-nm resist reflow process
Van Driessche, Veerle; Lucas, Kevin; Van Roey, Frieda; Grozev, Grozdan; Tzviatkov, Plamen (2002) -
193-nm contact photoresist reflow feasibility study
Lucas, Kevin; Slezak, Mark; Ercken, Monique; Van Roey, Frieda (2001) -
A fast triple patterning solution with fix guidance
Fang, Weiping; Arikati, Srini; Celingir, Erdem; Hug, Marco A.; De Bisschop, Peter; Mailfert, Julien; Lucas, Kevin; Gao, Weimin (2014) -
Accurate models for EUV simulation and their use for design correction
Lorusso, Gian; Hermans, Jan; Baudemprez, Bart; Hendrickx, Eric; Klostermann, Ulrich K.; Jang, Stephen; Zavyalova, Lena; Sorensen, Jacob; Gao, Weimin; Lucas, Kevin (2009) -
ArF lithography options for 100-nm technologies
Vandenberghe, Geert; Kim, Young-Chang; Delvaux, Christie; Lucas, Kevin; Choi, Sang-Jun; Ercken, Monique; Ronse, Kurt; Vleeming, Bert (2001) -
ArF lithography options for 100nm technologies
Vandenberghe, Geert; Kim, Young-Chang; Delvaux, Christie; Lucas, Kevin; Choi, Sang-Jun; Ercken, Monique; Ronse, Kurt; Vleeming, Bert (2001) -
Binary modeling method to check the sub-resolution assist features (SRAFs) printability
Li, Jianliang; Gao, Weimin; Fan, Yongfa; Xue, Jing; Yan, Qiliang; Lucas, Kevin; De Bisschop, Peter; Melvin III, Lawrence S. (2012) -
Checking design conformance and optimizing manufacturability using automated double-patterning decomposition
Cork, Christopher M.; Ward, Brian; Barnes, Levi D.; Painter, Ben; Lucas, Kevin; Luk-Pat, Gerry; Wiaux, Vincent; Verhaegen, Staf; Maenhoudt, Mireille (2008) -
Comparisons of 9% versus 6% transmission attenuated phase shift mask for the 65nm device node
Montgomery, Patrick K.; Litt, Lloyd; Conley, Will; Lucas, Kevin; van Wingerden, Johannes; Vandenberghe, Geert; Wiaux, Vincent (2004) -
Design compliance for Spacer Is Dielectric (SID) patterning
Luk-Pat, Gerard; Miloslavsky, Alex; Painter, Ben; Lin, Li; De Bisschop, Peter; Lucas, Kevin (2012) -
Double patterning at NA 0.33 versus high-NA single exposure in EUV lithography: an imaging comparison
Gao, Weimin; Wiaux, Vincent; Hoppe, Wolfgang; Philipsen, Vicky; Melvin, Lawrence; Hendrickx, Eric; Lucas, Kevin; Kim, Ryan Ryoung han (2018) -
Double patterning OPC and design for 22nm to 16nm device nodes
Lucas, Kevin; Cork, Chris; Miloslavsky, Alex; Luk-Pat, Gerry; Li, Xiaohai; Barnes, Levi; Gao, Weimin; Wiaux, Vincent (2009) -
Double-patterning interactions with wafer processing, optical proximity correction, and physical design flows
Lucas, Kevin; Cork, Christopher M.; Miloslavsky, Alexander; Luk-Pat, Gerard; Barnes, Levi D.; Hapli, John; Lewellen, John; Rollins, Gregoy; Wiaux, Vincent; Verhaegen, Staf (2009) -
EDA perspective on manufacturable DPT solutions
Wiaux, Vincent; Gao, Weimin; Lucas, Kevin; Cork, Chris; Luk-Pat, Gerry; Miloslavsky, Alex; Barnes, L.; Painter, B.; Li, X. (2010) -
EUV modeling accruracy and integration requirements for the 16nm node
Zavyalova, Lena; Su, Irene; Jang, Stephen; Cobb, Jonathan; Ward, Brian; Sorensen, Jacob; Song, Hua; Gao, Weimin; Lucas, Kevin; Lorusso, Gian; Hendrickx, Eric (2010) -
Experimental validation of rigorous, 3D profile models for negative-tone develop resists
Gao, Weimin; Klostermann, Ulrich; Kamohara, Itaru; Schmoeller, Thomas; Lucas, Kevin; Demmerle, Wolfgang; De Bisschop, Peter; Mailfert, Julien (2014) -
Experimental validation of stochastic modeling for negative-tone develop EUV resist
Kamohara, Itaru; Gao, Weimin; Klostermann, Ulrich; Schmöller, Thomas; Demmerle, Wolfgang; Lucas, Kevin; De Simone, Danilo; Hendrickx, Eric; Vandenberghe, Geert (2015) -
High-NA ArF lithography for 70-nm technologies
Montgomery, Patrick; Vandenberghe, Geert; Lucas, Kevin (2002) -
Interactions of double patterning technology with wafer processing, OPC and design flows
Lucas, Kevin; Cork, Chris; Miloslavsky, Alex; Luk-Pat, Gerry; Barnes, Levi; Hapli, John; Lewellen, John; Rollins, Greg; Wiaux, Vincent; Verhaegen, Staf (2008) -
Low-temperature 193nm resist reflow process for 100 nm generation contact patterning
Van Driessche, Veerle; Lucas, Kevin; Van Roey, Frieda; Grozev, Grozdan; Tzviatkov, Plamen (2001)