Browsing by author "Bekaert, Joost"
Now showing items 1-20 of 125
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22nm node imaging and beyond: a comparison of EUV and ArFi double patterning
van Setten, Eelco; Mouraille, O.; Wittebrood, F.; Dusa, Mircea; van Ingen-Schenau, Koen; Finders, Jo; Feenstra, Kees; Bekaert, Joost; Laenens, Bart; Philipsen, Vicky; Ercken, Monique; Hendrickx, Eric; Vandenberghe, Geert (2010) -
22nm node imaging and beyond: When will EUV take over?
van Setten, Eelco; Mouraille, Orion; Wittebrood, Friso; Dusa, Mircea; van Ingen-Schenau, Koen; Finders, Jo; Feenstra, Kees; Bekaert, Joost; Laenens, Bart; Philipsen, Vicky; Ercken, Monique; Hendrickx, Eric; Vandenberghe, Geert (2010) -
60nm half pitch contact layer printing: exploring the limits at 1.35NA lithography
Bekaert, Joost; Hendrickx, Eric; Vandenberghe, Geert (2008) -
A compact physical CD-SEM simulator for IC photolithography modeling applications
Fang, Chao; Smith, Mark D; Vaglio Pret, Alessandro; Biafore, John; Robertson, Steward A; Bekaert, Joost (2014) -
Advanced optical lithography: double patterning options for 32 and 22nm node
Vandeweyer, Tom; Maenhoudt, Mireille; Vangoidsenhoven, Diziana; Gronheid, Roel; Versluijs, Janko; Miller, Andy; Bekaert, Joost; Truffert, Vincent; Wiaux, Vincent (2009) -
Application of an inverse Mack model for negative tone development simulation
Gao, Weimin; Klostermann, Ulrich; Mülders, Thomas; Schmoeller, Thomas; Demmerle, Wolfgang; De Bisschop, Peter; Bekaert, Joost (2011) -
Arrays of nano-rings for magnetic storage applications
Metlushko, V.; Welp, U.; Vlasko-Vlasov, V.; Crabtree, G.; Zaluzec, N.; Hiller, J.; Grimsditch, M.; Ilic, B.; Bekaert, Joost; Moshchalkov, V.V.; Bruynseraede, Y.; Das, Johan; De Boeck, Jo; Borghs, Gustaaf; Zhu, X.B.; Grutter, P. (2002) -
Artificial pinning arrays investigated by scanning Hall probe microscopy
Bending, S. J.; Howells, G. D.; Grigorenko, A. N.; Van Bael, Marleen; Bekaert, Joost; Temst, K.; Van Look, L.; Moshchalkov, V. V.; Bruynseraede, Y.; Borghs, Gustaaf; Humphreys, R. G. (2000) -
Calibration and application of a DSA Compact model for grapho-epitaxy hole processes using contour-based metrology
Fenger, Germain; Burbine, Andrew; Torres, J. Andres; Ma, Yuansheng; Granik, Yuri; Krasnova, Polina; Vandenberghe, Geert; Gronheid, Roel; Bekaert, Joost (2014) -
Carbon nanotube pellicles: imaging results of the first full-field extreme ultraviolet exposures
Bekaert, Joost; Gallagher, Emily; Jonckheere, Rik; Van Look, Lieve; Aubert, Remko; Klein, Alexander; Yegen, Gokay; Broman, Par; Nair, Vineet Vijayakrishnan; Timmermans, Marina; Pollentier, Ivan; Hendrickx, Eric (2021-05-27) -
Characterization and control of dynamic lens heating effects under high-volume manufacturing conditions
Bekaert, Joost; Van Look, Lieve; Vandenberghe, Geert; Van Adrichem, Paul; Maslow, Mark J.; Gemmink, Jan-Willem; Cao, Hua; Hunsche, Stefan; Neumann, Jens Timo; Wolf, Alexander (2011) -
CNT pellicles: Imaging results of the first full-field EUV exposures
Bekaert, Joost; Gallagher, Emily; Jonckheere, Rik; Van Look, Lieve; Aubert, Remko; Klein, Alexander; Yegen, Gokay; Broman, Par; Felix, Nelson M.; Lio, Anna; Nair, Vineet Vijayakrishnan; Timmermans, Marina; Pollentier, Ivan; Hendrickx, Eric (2021) -
Co-optimization of lithographic and patterning processes for improved EPE performance
Maslow, Mark; Timoshkov, Vadim; Kiers, Ton; Jee, Tae Kwon; de Loijer, Peter; Morikita, Shinya; Demand, Mark; Metz, Andrew W; Okada, Soichiro; Kumar, Kaushik A.; Biesemans, Serge; Yaegashi, Hidetami; Di Lorenzo, Paolo; Bekaert, Joost; Mao, Ming; Beral, Christophe; Lariviere, Stephane (2017) -
Combined illumination sources for hyper-NA contact hole printing
Bekaert, Joost; Truffert, Vincent; Willems, Patrick; Van Look, Lieve; Op de Beeck, Maaike; Hendrickx, Eric; Vandenberghe, Geert (2007) -
Compact 2D OPC modeling of a metal oxide EUV resist for a 7nm node BEOL layer
De Simone, Danilo; Lyons, Adam; Rio, David; Lee, Sook; Delorme, Maxence; Fumar-Pici, Anita; Kocsis, Michael; De Schepper, Peter; Greer, Michael; Wallow, THomas; Stowers, Jason K; Gillijns, Werner; Bekaert, Joost (2017) -
Comparing positive and negative tone development process for printing the metal and contact layers of the 32- and 22-nm node
Bekaert, Joost; Van Look, Lieve; Truffert, Vincent; Lazzarino, Frederic; Vandenberghe, Geert; Reybrouck, Mario; Tarutani, Shinji (2010-12) -
Compensating mask topography effects in CPL through-pitch solutions toward the 45nm node
Bekaert, Joost; Philipsen, Vicky; Vandenberghe, Geert; van den Broeke, Doug; Degel, Wolfgang; Zibold, Axel (2005) -
Contact hole multiplication using grapho-epitaxy directed self-assembly: process choices, template optimization, and placement accuracy
Bekaert, Joost; Doise, Jan; MKuppuswamy, Vijaya Kumar; Gronheid, Roel; Chan, BT; Vandenberghe, Geert; Cao, Yi; Her, YoungJun (2014) -
Contact hole multiplication using grapho-epitaxy directed self-assembly: process choices, template optimization, and placement accuracy
Bekaert, Joost; Doise, Jan; MKuppuswamy, Vijaya Kumar; Chan, BT; Gronheid, Roel; Vandenberghe, Geert; Cao, Yi; Her, YoungJun (2014) -
Contact hole multiplication using grapho-epitaxy directed self-assembly: process choices, template optimization, and placement accuracy
Bekaert, Joost; Gronheid, Roel; MKuppuswamy, Vijaya Kumar; Doise, Jan; Chan, BT; Vandenberghe, Geert; Sayan, Safak; Cao, Yi; Her, YoungJun (2014)