Browsing by author "Bekaert, Joost"
Now showing items 21-40 of 125
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Contact layer printing at 0.28k1 by means of double line exposure and negative tone development
Bekaert, Joost; Maenhoudt, Mireille; Vandenberghe, Geert; Reybrouck, Mario (2008) -
Controlling placement error and dimensional variability in templated DSA
Boeckx, Carolien; Doise, Jan; Bekaert, Joost; Chan, BT; Gronheid, Roel; De Gendt, Stefan (2016) -
Critical pattern behavior at nanometer scale vicinity of black border
Kovalevich, Tatiana; Bekaert, Joost; Wiaux, Vincent; Liddle, Jack; Davydova, Natalia; Tien, Ming-Chun (2019) -
Cross-sectional imaging of directed self-assembly block copolymers
Okabe, Kye; Yi, He; Tung, Maryann C; Tiberio, Richard; Bekaert, Joost; Gronheid, Roel; Wong, H.S. Philip (2015) -
Design and pitch scaling for affordable node transition and EUV insertion scenario
Kim, Ryan Ryoung han; Ryckaert, Julien; Raghavan, Praveen; Sherazi, Yasser; Debacker, Peter; Trivkovic, Darko; Gillijns, Werner; Tan, Ling Ee; Drissi, Youssef; Blanco, Victor; Bekaert, Joost; Mao, Ming; Lariviere, Stephane; McIntyre, Greg (2017) -
Design method and algorithms for directed self-assembly aware via layout decomposition in sub-7 nm circuits
Karageorgos, Ioannis; Ryckaert, Julien; Gronheid, Roel; Tung, Maryann C.; Wong, H.-S. Philip; Karageorgos, Evangelos; Croes, Kris; Bekaert, Joost; Vandenberghe, Geert; Stucchi, Michele; Dehaene, Wim (2016-11) -
Design method for the integration of DSA via patterning in sub-7 nm circuits
Karageorgos, Ioannis; Ryckaert, Julien; Croes, Kris; Tung, C. Maryann; Wong, H. -S. Philip; Karageorgos, Evangelos; Gronheid, Roel; Bekaert, Joost; Vandenberghe, Geert; Stucchi, Michele; Dehaene, Wim (2016) -
Design strategy for integrating DSA via patterning in sub-7 nm interconnects
Karageorgos, Ioannis; Ryckaert, Julien; Tung, C. Maryann; Wong, H.-S. Philip; Gronheid, Roel; Bekaert, Joost; Croes, Kris; Karageorgos, Evangelos; Vandenberghe, Geert; Stucchi, Michele; Dehaene, Wim (2016) -
Direct imaging of commensurate vortex structures in ordered antidot arrays
Grigorenko, A. N.; Howells, G. D.; Bending, S. J.; Bekaert, Joost; Van Bael, Marleen; Van Look, L.; Moshchalkov, V. V.; Bruynseraede, Y.; Borghs, Gustaaf; Kaya, I. I.; Stradling, R. A. (2001) -
Directed self-assembly (DSA) grapho-epitaxy template generation with immersion lithography
Ma, Yuansheng; Lei, Junjiang; Torres, J. Andres; Hong, Le; Word, James; Fenger, Germain; Tritchkov, Alexander; Lippincott, George; Gupta, Rachit; Lafferty, Neal; He, Yuan; Bekaert, Joost; Vandenberghe, Geert (2015) -
Directed self-assembly graphoepitaxy template generation with immersion lithography
Ma, Yuansheng; Lei, Junjiang; Torres, J. Andres; Hong, Le; Word, James; Fenger, Germain; Tritchkov, Alexander; Lippincott, George; Gupta, Rachit; Lafferty, Neal; He, Yuan; Bekaert, Joost; Vandenberghe, Geert (2015) -
DSA graphoepitaxy calibrations for contact hole multiplication
Graves, Trey; Vaglio Pret, Alessandro; Robertson, Stuart; Smith, Mark; Doise, Jan; Bekaert, Joost; Gronheid, Roel (2015) -
Effect of laser bandwidth tuning on line/space and contact printing at 1.35NA
Van Look, Lieve; Bekaert, Joost; Vandenberghe, Geert; Lalovic, Ivan; Farrar, Nigel (2008) -
Electrical comparison of iN7 EUV hybrid and EUV single patterning BEOL metal layers
Lariviere, Stephane; Wilson, Chris; Kutrzeba Kotowska, Bogumila; Versluijs, Janko; Decoster, Stefan; Mao, Ming; van der Veen, Marleen; Jourdan, Nicolas; El-Mekki, Zaid; Heylen, Nancy; Kesters, Els; Verdonck, Patrick; Beral, Christophe; Van Den Heuvel, Dieter; De Bisschop, Peter; Bekaert, Joost; Blanco, Victor; Ciofi, Ivan; Wan, Danny; Briggs, Basoene; Mallik, Arindam; Hendrickx, Eric; Kim, Ryan Ryoung han; McIntyre, Greg; Ronse, Kurt; Boemmels, Juergen; Tokei, Zsolt; Mocuta, Dan (2018) -
Electrical verification of contact holes obtained with DSA of BCP
Rincon Delgadillo, Paulina; Bekaert, Joost; Vandenbroeck, Nadia; Gronheid, Roel; Chan, BT; van der Veen, Marleen; Vandersmissen, Kevin; Boemmels, Juergen; Luong, Vihn (2015) -
EUV patterned templates with grapho-epitaxy DSA at the N5/N7 logic nodes
Gronheid, Roel; Boeckx, Carolien; Doise, Jan; Bekaert, Joost; Karageorgos, Ioannis; Ryckaert, Julien; Chan, BT; Li, Chenxi; Zou, Yi (2016) -
EUV vote-taking lithography for mitigation of printing mask defects, CDU improvement, and stochastic failure reduction
Bekaert, Joost; De Bisschop, Peter; Beral, Christophe; Hendrickx, Eric; van de Kerkhof, Mark A..; Bouten, Sander; Kupers, Michiel; Schiffelers, Guido; Verduijn, Erik; Brunner, Timothy (2018) -
EUV vote-taking lithography: Crazy.... or not ?
Bekaert, Joost; De Bisschop, Peter; Beral, Christophe; Hendrickx, Eric; van de Kerkhof, Mark A.; Bouten, Sander; Kupers, Michiel; Schiffelers, Guido; Verduijn, Erik; Brunner, Timothy (2018) -
Experimental proximity matching of ArF scanners
Bekaert, Joost; Van Look, Lieve; De Bisschop, Peter; Van de Kerkhove, Jeroen; Vandenberghe, Geert; Schreel, K.; Menger, J.; Schiffelers, G.; Knols, E.; van der Laan, H.; Willekers, R. (2008) -
Experimental study of effect of pellicle on optical proximity fingerprint for 1.35 NA immersion ArF lithography
Van Look, Lieve; Bekaert, Joost; Laenens, Bart; Vandenberghe, Geert; Richter, Jan; Bubke, Karsten; Peters, Jan Hendrik; Schreel, Koen; Dusa, Mircea (2010)