Browsing by author "Yamaguchi, Shinpei"
Now showing items 1-13 of 13
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1mA/μm-ION strained SiGe45%-IFQW pFETs with raised and embedded S/D
Mitard, Jerome; Witters, Liesbeth; Hellings, Geert; Krom, Raymond; Franco, Jacopo; Eneman, Geert; Hikavyy, Andriy; Vincent, Benjamin; Loo, Roger; Favia, Paola; Dekkers, Harold; Altamirano Sanchez, Efrain; Vanderheyden, Annelies; Vanhaeren, Danielle; Eyben, Pierre; Takeoka, Shinji; Yamaguchi, Shinpei; Van Dal, Mark; Wang, Wei-E; Hong, Sug-Hun; Vandervorst, Wilfried; De Meyer, Kristin; Biesemans, Serge; Absil, Philippe; Horiguchi, Naoto; Hoffmann, Thomas Y. (2011) -
8Å Tinv gate-first dual channel technology achieving low-Vt high performance CMOS
Witters, Liesbeth; Takeoka, Shinji; Yamaguchi, Shinpei; Hikavyy, Andriy; Shamiryan, Denis; Cho, Moon Ju; Chiarella, Thomas; Ragnarsson, Lars-Ake; Loo, Roger; Kerner, Christoph; Crabbe, Yvo; Franco, Jacopo; Tseng, Joshua; Wang, Wei-E; Rohr, Erika; Schram, Tom; Richard, Olivier; Bender, Hugo; Biesemans, Serge; Absil, Philippe; Hoffmann, Thomas Y. (2010) -
Dual-channel technology with Cap-free single metal gate for high performance CMOS in gate-first and gate-last integration
Witters, Liesbeth; Mitard, Jerome; Veloso, Anabela; Hikavyy, Andriy; Franco, Jacopo; Kauerauf, Thomas; Cho, Moon Ju; Schram, Tom; Sebaai, Farid; Yamaguchi, Shinpei; Takeoka, S.; Fukuda, Masahiro; Wang, Wei-E; Duriez, Blandine; Eneman, Geert; Loo, Roger; Kellens, Kristof; Tielens, Hilde; Favia, Paola; Rohr, Erika; Hellings, Geert; Bender, Hugo; Roussel, Philippe; Crabbe, Yvo; Brus, Stephan; Mannaert, Geert; Kubicek, Stefan; Devriendt, Katia; De Meyer, Kristin; Ragnarsson, Lars-Ake; Steegen, An; Horiguchi, Naoto (2011) -
Gate-last vs. gate-first technology for aggressively scaled EOT Logic/RF CMOS
Veloso, Anabela; Ragnarsson, Lars-Ake; Cho, Moon Ju; Devriendt, Katia; Kellens, Kristof; Sebaai, Farid; Suhard, Samuel; Brus, Stephan; Crabbe, Yvo; Schram, Tom; Rohr, Erika; Paraschiv, Vasile; Eneman, Geert; Kauerauf, Thomas; Dehan, Morin; Hong, Sug-Hun; Yamaguchi, Shinpei; Takeoka, Shinji; Higuchi, Yuichi; Tielens, Hilde; Van Ammel, Annemie; Favia, Paola; Bender, Hugo; Franquet, Alexis; Conard, Thierry; Li, X.; Pey, K.-L.; Struyf, Herbert; Mertens, Paul; Absil, Philippe; Horiguchi, Naoto; Hoffmann, Thomas Y. (2011) -
High performance Si.45Ge.55 implant free quantum well FET featuring low temperature process, eSiGe stressor and transversal strain relaxation
Yamaguchi, Shinpei; Witters, Liesbeth; Mitard, Jerome; Eneman, Geert; Hellings, Geert; Fukuda, Masahiro; Hikavyy, Andriy; Loo, Roger; Veloso, Anabela; Crabbe, Yvo; Rohr, Erika; Favia, Paola; Bender, Hugo; Takeoka, S.; Vellianitis, Georgios; Wang, Wei-E; Ragnarsson, Lars-Ake; De Meyer, Kristin; Steegen, An; Horiguchi, Naoto (2011) -
High-mobility 0.85nm-EOT Si0.45Ge0.55 pFETs: delivering high performance at scaled VDD
Mitard, Jerome; Witters, Liesbeth; Garcia Bardon, Marie; Christie, Phillip; Franco, Jacopo; Mercha, Abdelkarim; Magnone, Paolo; Crupi, Felice; Ragnarsson, Lars-Ake; Hikavyy, Andriy; Vincent, Benjamin; Chiarella, Thomas; Loo, Roger; Tseng, Joshua; Yamaguchi, Shinpei; Takeoka, Shinji; Wang, Wei-E; Absil, Philippe; Hoffmann, Thomas Y. (2010) -
High-mobility Si1-xGex-channel PFETs: layout dependence and enhanced scalability, demonstrating 90% performance boost at narrow widths
Eneman, Geert; Yamaguchi, Shinpei; Ortolland, Claude; Takeoka, Shinji; Witters, Liesbeth; Chiarella, Thomas; Favia, Paola; Hikavyy, Andriy; Mitard, Jerome; Kobayashi, M.; Krom, Raymond; Bender, Hugo; Tseng, Joshua; Wang, Wei-E; Vandervorst, Wilfried; Loo, Roger; Absil, Philippe; Biesemans, Serge; Hoffmann, Thomas Y. (2010) -
Layout scaling of Si1-xGex pFETs
Eneman, Geert; Yamaguchi, Shinpei; Ortolland, C.; Takeoka, Shinji; Kobayashi, M.; Witters, Liesbeth; Hikavyy, Andriy; Mitard, Jerome; Loo, Roger; Hoffmann, Thomas Y. (2011) -
Nano-beam diffraction investigation of the strain evolution in SiGe channel pFETs with gate first or gate last process
Favia, Paola; Eneman, Geert; Yamaguchi, Shinpei; Witters, Liesbeth; Bender, Hugo (2012) -
On the origin of mobility reduction in ultrathin EOT HK/MG CMOS devices: Impact from gate-stack and device architecture
Ragnarsson, Lars-Ake; Mitard, Jerome; Hong, Sug-Hun; Takeoka, Shinji; Tseng, Joshua; Wang, Wei-E; Yamaguchi, Shinpei; Trojman, Lionel; Kauerauf, Thomas; De Keersgieter, An; Schram, Tom; Rohr, Erika; Collaert, Nadine; Jurczak, Gosia; Bourdelle, Konstantin; Nguyen, B-Y; Absil, Philippe; Hoffmann, Thomas Y. (2011) -
Si1-xGex-channel PFETs: scalability, layout considerations and compatibility with other stress techniques
Eneman, Geert; Hellings, Geert; Mitard, Jerome; Witters, Liesbeth; Yamaguchi, Shinpei; Garcia Bardon, Marie; Christie, Phillip; Ortolland, Claude; Hikavyy, Andriy; Favia, Paola; Bargallo Gonzalez, Mireia; Simoen, Eddy; Crupi, Felice; Kobayashi, Masaharu; Franco, Jacopo; Takeoka, Shinji; Krom, Raymond; Bender, Hugo; Loo, Roger; Claeys, Cor; De Meyer, Kristin; Hoffmann, Thomas Y. (2011) -
Strain in PFETs analyzed by nano beam diffraction
Favia, Paola; Eneman, Geert; Yamaguchi, Shinpei; Ortolland, Claude; Hoffmann, Thomas Y.; Richard, Olivier; Bender, Hugo (2010) -
Stress techniques in advanced transistor architectures: bulk FinFETs and implant-free quantum well transistors
Eneman, Geert; Witters, Liesbeth; Collaert, Nadine; Mitard, Jerome; Hellings, Geert; Yamaguchi, Shinpei; De Keersgieter, An; Hikavyy, Andriy; Vincent, Benjamin; Favia, Paola; Bender, Hugo; Veloso, Anabela; Chiarella, Thomas; Togo, Mitsuhiro; Loo, Roger; De Meyer, Kristin; Mercha, Abdelkarim; Horiguchi, Naoto; Thean, Aaron (2012)