Browsing by author "Kerner, Christoph"
Now showing items 1-20 of 47
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8Å Tinv gate-first dual channel technology achieving low-Vt high performance CMOS
Witters, Liesbeth; Takeoka, Shinji; Yamaguchi, Shinpei; Hikavyy, Andriy; Shamiryan, Denis; Cho, Moon Ju; Chiarella, Thomas; Ragnarsson, Lars-Ake; Loo, Roger; Kerner, Christoph; Crabbe, Yvo; Franco, Jacopo; Tseng, Joshua; Wang, Wei-E; Rohr, Erika; Schram, Tom; Richard, Olivier; Bender, Hugo; Biesemans, Serge; Absil, Philippe; Hoffmann, Thomas Y. (2010) -
Achieving 9ps unloaded ring oscillator delay in FuSI/HfSiON with 0.8 nm EOT
Rothschild, Aude; Shi, Xiaoping; Everaert, Jean-Luc; Kerner, Christoph; Chiarella, Thomas; Hoffmann, Thomas; Vrancken, Christa; Shickova, Adelina; Yoshinao, H.; Mitsuhashi, Riichirou; Niwa, Masaaki; Lauwers, Anne; Veloso, Anabela; Kittl, Jorge; Absil, Philippe; Biesemans, Serge (2007) -
Addressing key concerns for implementation of Ni FUSI into manufacturing for 45/32 nm CMOS
Shickova, Adelina; Kauerauf, Thomas; Rothschild, Aude; Aoulaiche, Marc; Sahhaf, Sahar; Kaczer, Ben; Veloso, Anabela; Torregiani, Cristina; Pantisano, Luigi; Lauwers, Anne; Zahid, Mohammed; Rost, Tim; Tigelaar, H.; Pas, M.; Fretwell, J.; McCormack, J.; Hoffmann, Thomas; Kerner, Christoph; Chiarella, Thomas; Brus, Stephan; Harada, Yoshinao; Niwa, Masaaki; Kaushik, Vidya; Maes, Herman; Absil, Philippe; Groeseneken, Guido; Biesemans, Serge; Kittl, Jorge (2007) -
Benchmarking SOI and bulk FinFET alternatives for PLANAR CMOS scaling succession
Chiarella, Thomas; Witters, Liesbeth; Mercha, Abdelkarim; Kerner, Christoph; Rakowski, Michal; Ortolland, Claude; Ragnarsson, Lars-Ake; Parvais, Bertrand; De Keersgieter, An; Kubicek, Stefan; Redolfi, Augusto; Vrancken, Christa; Brus, Stephan; Lauwers, Anne; Absil, Philippe; Biesemans, Serge; Hoffmann, Thomas Y. (2010) -
Carbon-based thermal stabilization techniques for junction and silicide engineering for high performance CMOS periphery in memory applications
Ortolland, Claude; Mathew, Suraj; Duffy, Ray; Saino, Kanta; Kim, Chul Sung; Mertens, Sofie; Horiguchi, Naoto; Vrancken, Christa; Chiarella, Thomas; Kerner, Christoph; Absil, Philippe; Lauwers, Anne; Biesemans, Serge; Hoffmann, Thomas Y. (2009) -
Control and readout of current-induced magnetic flux quantization in a superconducting transformer
Kerner, Christoph; Hackens, Benoit; Golubovic, Dusan; Poli, Stefano; Faniel, Sebastien; Magnus, Wim; Schoenmaker, Wim; Bayot, Vincent; Maes, Herman (2009) -
Cost effective low Vt Ni-FUSI CMOS on SiON by means of Al implant (pMOS) and Yb+P implant (nMOS)
Lauwers, Anne; Veloso, Anabela; Chang, Shou-Zen; Yu, HongYu; Hoffmann, Thomas Y.; Kerner, Christoph; Demand, Marc; Rothschild, Aude; Niwa, Masaaki; Satoru, Ito; Mitshashi, Riichirou; Ameen, Mike; Whittemore, Graham; Pawlak, Malgorzata; Vrancken, Christa; Demeurisse, Caroline; Mertens, Sofie; Vandervorst, Wilfried; Absil, Philippe; Biesemans, Serge; Kittl, Jorge (2008) -
Demonstration of phase-controlled Ni-FUSI CMOSFETs employing SiON dielectrics capped with sub-monolayer ALD HfSiON for low power applications
Yu, HongYu; Chang, Shou-Zen; Veloso, Anabela; Lauwers, Anne; Delabie, Annelies; Everaert, Jean-Luc; Singanamalla, Raghunath; Kerner, Christoph; Vrancken, Christa; Brus, Stephan; Absil, Philippe; Hoffmann, Thomas; Biesemans, Serge (2007-09) -
Effective metal gate work function modification by ion implantation with W-based gate stack
Li, Zilan; Schram, Tom; Kerner, Christoph; Witters, Thomas; Singanamalla, Raghunath; Pourtois, Geoffrey; Paraschiv, Vasile; Hoffmann, Thomas Y.; Rohr, Erika; Absil, Philippe; De Gendt, Stefan; De Meyer, Kristin (2008) -
Electrical demonstration of thermally stable Ni silicides on Si1-xCx epitaxial layers
Machkaoutsan, Vladimir; Verheyen, Peter; Bauer, M.; Zhang, Y.; Koelling, Sebastian; Franquet, Alexis; Vanormelingen, Koen; Loo, Roger; Kim, C.S.; Lauwers, Anne; Horiguchi, Naoto; Kerner, Christoph; Hoffmann, Thomas; Granneman, E.; Vandervorst, Wilfried; Absil, Philippe; Thomas, S.G. (2010) -
Electrical properties of low-VT metal-gated n-MOSFETs using La2O3/SiOx as interfacial layer between HfLaO high-k dielectrics and Si channel
Chang, Shou-Zen; Yu, Hong-Yu; Adelmann, Christoph; Delabie, Annelies; Wang, Xin Peng; Van Elshocht, Sven; Akheyar, Amal; Nyns, Laura; Swerts, Johan; Aoulaiche, Marc; Kerner, Christoph; Absil, Philippe; Hoffmann, Thomas Y.; Biesemans, Serge (2008-05) -
FUSI specific yield monitoring enabling improved circuit performance and fast feedback to production
Chiarella, Thomas; Rosmeulen, Maarten; Tigelaar, Howard; Kerner, Christoph; Nackaerts, Axel; Ramos, Javier; Lauwers, Anne; Veloso, Anabela; Jurczak, Gosia; Rothschild, Aude; Witters, Liesbeth; Yu, HongYu; Kittl, Jorge; Verbeeck, Rita; de Potter de ten Broeck, Muriel; Debusschere, Ingrid; Absil, Philippe; Biesemans, Serge; Hoffmann, Thomas Y. (2007-03) -
Implant-free SiGe qqantum well pFET: A novel, highly scalable and low thermal budget device, featuring raised source/drain and high-mobility channel.
Hellings, Geert; Witters, Liesbeth; Krom, Raymond; Mitard, Jerome; Hikavyy, Andriy; Loo, Roger; Schulze, Andreas; Eneman, Geert; Kerner, Christoph; Franco, Jacopo; Chiarella, Thomas; Takeoka, Shinji; Tseng, Joshua; Wang, Wei-E; Vandervorst, Wilfried; Absil, Philippe; Biesemans, Serge; Heyns, Marc; De Meyer, Kristin; Meuris, Marc; Hoffmann, Thomas Y. (2010) -
Integration of ultra shallow junctions in PVD TaN nMOS transistors with flash lamp annealing
Severi, Simone; De Meyer, Kristin; Pawlak, Bartek; Duffy, Ray; Kerner, Christoph; McCoy, S.; Gelpey, J.; Selinger, T.; Ragnarsson, Lars-Ake; Absil, Philippe; Biesemans, Serge (2005-10) -
Junction anneal sequence optimization for advanced high-k / metal gate CMOS technology
Ortolland, Claude; Ragnarsson, Lars-Ake; Kerner, Christoph; Chiarella, Thomas; Rosseel, Erik; Okuno, Yasutoshi; Favia, Paola; Richard, Olivier; Everaert, Jean-Luc; Schram, Tom; Kubicek, Stefan; Absil, Philippe; Biesemans, Serge; Schreutelkamp, Robert; Hoffmann, Thomas Y. (2009) -
Laser-annealed junctions with advanced CMOS gate stacks for 32nm node: perspectives on device performance and manufacturability
Ortolland, Claude; Noda, Taiji; Chiarella, Thomas; Kubicek, Stefan; Kerner, Christoph; Vandervorst, Wilfried; Opdebeeck, Ann; Vrancken, Christa; Horiguchi, Naoto; de Potter de ten Broeck, Muriel; Aoulaiche, Marc; Rosseel, Erik; Felch, S.B.; Absil, Philippe; Schreutelkamp, Rob; Biesemans, Serge; Hoffmann, Thomas Y. (2008) -
Line width dependent mobility in high-k – a comparative performance study between FUSI and TiN
Pantisano, Luigi; Trojman, Lionel; Severi, Simone; San Andres Serrano, Enrique; Kerner, Christoph; Veloso, Anabela; Ferain, Isabelle; Hoffmann, Thomas Y.; Groeseneken, Guido; De Gendt, Stefan (2007) -
Low VT CMOS using doped Hf-based oxides, TaC-based metals and laser-only anneal
Kubicek, Stefan; Schram, Tom; Paraschiv, Vasile; Vos, Rita; Demand, Marc; Adelmann, Christoph; Witters, Thomas; Nyns, Laura; Ragnarsson, Lars-Ake; Yu, HongYu; Veloso, Anabela; Singanamalla, Raghunath; Kauerauf, Thomas; Rohr, Erika; Brus, Stephan; Vrancken, Christa; Chang, Vincent; Mitsuhashi, Riichirou; Akheyar, Amal; Cho, Hag-Ju; Hooker, Jacob; O'Sullivan, Barry; Chiarella, Thomas; Kerner, Christoph; Delabie, Annelies; Van Elshocht, Sven; De Meyer, Kristin; De Gendt, Stefan; Absil, Philippe; Hoffmann, Thomas Y.; Biesemans, Serge (2007) -
Metal rings as quantum bits
Kerner, Christoph; Magnus, Wim; Schoenmaker, Wim (2002) -
Methodology for extracting the characteristic capacitances of a power MOSFET transistor, using conventional on-wafer testing techniques
Kerner, Christoph; Ciofi, Ivan; Chiarella, Thomas; Van Huylenbroeck, Stefaan (2012)