Browsing by author "Kubicek, Stefan"
Now showing items 81-100 of 181
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Investigation of poly-Si/HfO2 gate stacks in a self-aligned 65 nm NMOS process flow
Kubicek, Stefan; Carter, Richard; Cartier, Eduard; Lujan, Guilherme; Kerber, Andreas; Kaushik, Vidya; Chen, P.J.; De Gendt, Stefan; Heyns, Marc (2002) -
Investigation of poly-Si/HfO2 gate stacks in a self-aligned 70nm MOS process flow
Kubicek, Stefan; Chen, Jerry; Ragnarsson, Lars-Ake; Carter, Richard; Kaushik, Vidya; Lujan, Guilherme; Cartier, Eduard; Henson, Kirklen; Pantisano, Luigi; Beckx, Stephan; Jaenen, Patrick; Boullart, Werner; Caymax, Matty; De Gendt, Stefan; Heyns, Marc; De Meyer, Kristin (2003) -
Investigation of the effect of the extension implant energy on deep submicron CMOS device perfomance
Kubicek, Stefan; Biesemans, Serge; De Meyer, Kristin (1997) -
Investigation of the threshold voltage difference between partially-depleted SOI and bulk CMOS transistors
van Meer, Hans; Lyu, Jeong-ho; Kubicek, Stefan; De Meyer, Kristin (1999) -
Issues, achievements and challenges towards integration of high-k dielectrics
Caymax, Matty; De Gendt, Stefan; Vandervorst, Wilfried; Heyns, Marc; Bender, Hugo; Carter, Richard; Conard, Thierry; Degraeve, Robin; Groeseneken, Guido; Kubicek, Stefan; Lujan, Guilherme; Pantisano, Luigi; Petry, Jasmine; Röhr, Erika; Van Elshocht, Sven; Zhao, Chao; Cartier, Eduard; Chen, Jerry; Cosnier, Vincent; Jang, Se Aug; Kaushik, Vidya; Kerber, Andreas; Kluth, Jon; Lin, S.; Tsai, Wilman; Young, Edward; Manabe, Y. (2002) -
Issues, achievements and challenges towards intergration of high-k dielectrics
Heyns, Marc; Bender, Hugo; Caymax, Matty; Carter, R; Claes, Martine; Conard, Thierry; Boullart, Werner; De Gendt, Stefan; Degraeve, Robin; Deweerd, Wim; Groeseneken, Guido; Houssa, Michel; Kubicek, Stefan; Lujan, Guilherme; Nohira, H.; Pantisano, Luigi; Petry, Jasmine; Röhr, Erika; Vandervorst, Wilfried; Van Elshocht, Sven; Xu, Zhen; Zhao, Chao; Cartier, E.; Chen, J.; Cosnier, V.; Green, M.; Jang, S.E.; Kaushik, Vidya; Kerber, A.; Kluth, J.; Lin, S.; Tsai, Wilman; Young, Edward; Manabe, Y. (2002) -
Junction anneal sequence optimization for advanced high-k / metal gate CMOS technology
Ortolland, Claude; Ragnarsson, Lars-Ake; Kerner, Christoph; Chiarella, Thomas; Rosseel, Erik; Okuno, Yasutoshi; Favia, Paola; Richard, Olivier; Everaert, Jean-Luc; Schram, Tom; Kubicek, Stefan; Absil, Philippe; Biesemans, Serge; Schreutelkamp, Robert; Hoffmann, Thomas Y. (2009) -
Large-Scale 2D Spin-Based Quantum Processor with a Bi-Linear Architecture
Mohiyaddin, Fahd Ayyalil; Li, Roy; Brebels, Steven; Simion, George; Dumoulin Stuyck, Nard; Godfrin, Clement; Shehata, Mohamed; Elsayed, Asser; Gys, Benjamin; Kubicek, Stefan; Jussot, Julien; Canvel, Yann; Massar, Shana; Weckx, Pieter; Matagne, Philippe; Mongillo, Massimo; Govoreanu, Bogdan; Radu, Iuliana (2021) -
Laser-annealed junctions with advanced CMOS gate stacks for 32nm node: perspectives on device performance and manufacturability
Ortolland, Claude; Noda, Taiji; Chiarella, Thomas; Kubicek, Stefan; Kerner, Christoph; Vandervorst, Wilfried; Opdebeeck, Ann; Vrancken, Christa; Horiguchi, Naoto; de Potter de ten Broeck, Muriel; Aoulaiche, Marc; Rosseel, Erik; Felch, S.B.; Absil, Philippe; Schreutelkamp, Rob; Biesemans, Serge; Hoffmann, Thomas Y. (2008) -
Limitations of shift-and-ratio based Leff extraction techniques for MOS transistors with halo or pocket implants
van Meer, Hans; Henson, Kirklen; Lyu, Jeong-ho; Rosmeulen, Maarten; Kubicek, Stefan; Collaert, Nadine; De Meyer, Kristin (2000) -
Linking Room- and Low-Temperature Electrical Performance of MOS Gate Stacks for Cryogenic Applications
Kao, K-H; Godfrin, Clement; Elsayed, Asser; Li, Roy; Simoen, Eddy; Grill, Alexander; Kubicek, Stefan; Radu, Iuliana; Govoreanu, Bogdan (2022) -
Low VT CMOS using doped Hf-based oxides, TaC-based metals and laser-only anneal
Kubicek, Stefan; Schram, Tom; Paraschiv, Vasile; Vos, Rita; Demand, Marc; Adelmann, Christoph; Witters, Thomas; Nyns, Laura; Ragnarsson, Lars-Ake; Yu, HongYu; Veloso, Anabela; Singanamalla, Raghunath; Kauerauf, Thomas; Rohr, Erika; Brus, Stephan; Vrancken, Christa; Chang, Vincent; Mitsuhashi, Riichirou; Akheyar, Amal; Cho, Hag-Ju; Hooker, Jacob; O'Sullivan, Barry; Chiarella, Thomas; Kerner, Christoph; Delabie, Annelies; Van Elshocht, Sven; De Meyer, Kristin; De Gendt, Stefan; Absil, Philippe; Hoffmann, Thomas Y.; Biesemans, Serge (2007) -
Low VT metal-gate/high-k nMOSFETs - PBTI dependence and VT tune-ability on La/Dy-capping layer locations and laser annealing conditions
Chang, Shou-Zen; Hoffmann, Thomas Y.; Yu, HongYu; Aoulaiche, Marc; Rohr, Erika; Adelmann, Christoph; Kaczer, Ben; Delabie, Annelies; Favia, Paola; Van Elshocht, Sven; Kubicek, Stefan; Schram, Tom; Witters, Thomas; Ragnarsson, Lars-Ake; Wang, Xin Peng; Cho, Hag-Ju; Mueller, Markus; Chiarella, Thomas; Absil, Philippe; Biesemans, Serge (2008) -
Low Vt Ni-FUSI CMOS technology using a DyO cap layer with either single or dual Ni-phases
Yu, HongYu; Chang, Shou-Zen; Veloso, Anabela; Lauwers, Anne; Adelmann, Christoph; Onsia, Bart; Van Elshocht, Sven; Singanamalla, Raghunath; Demand, Marc; Vos, Rita; Kauerauf, Thomas; Brus, Stephan; Shi, Xiaoping; Kubicek, Stefan; Vrancken, Christa; Mitsuhashi, Riichirou; Lehnen, Peer; Kittl, Jorge; Niwa, M.; Yin, K.M.; Hoffmann, Thomas; De Gendt, Stefan; Jurczak, Gosia; Absil, Philippe; Biesemans, Serge (2007) -
Low-frequency noise behavior of nMOSFETs with different Al2O3 capping layer thickness and TiN gate
Wang, Danghui; Simoen, Eddy; Govoreanu, Bogdan; Kubicek, Stefan; Jussot, Julien; Chan, BT; Dumoulin Stuyck, Nard; Radu, Iuliana; Mocuta, Dan; Claeys, Cor (2019) -
Materials issues of Ni fully silicided (FUSI) gates for CMOS applications
Kittl, Jorge; Lauwers, Anne; Kmieciak, Malgorzata; Demeurisse, Caroline; Kottantharayil, Anil; Veloso, Anabela; Van Dal, Mark; Schram, Tom; Brijs, Bert; Kaiser, M.; Kubicek, Stefan; Cunniffe, John; Verbeeck, Rita; Vrancken, Christa; Biesemans, Serge; Maex, Karen (2005-05) -
Metal inserted poly-Si (MIPS) and FUSI dual metal (TaN and NiSi) CMOS integration
Singanamalla, Raghunath; Van Dal, Mark; Demand, Marc; Shamiryan, Denis; Beckx, Stephan; Jaenen, Patrick; Locorotondo, Sabrina; Yu, HongYu; Hooker, Jacob; Kubicek, Stefan; De Meyer, Kristin; Biesemans, Serge; Juffermans, Casper; Lander, Rob (2007-04) -
Migrating from planar to FinFET for further CMOS scaling: SOI or bulk?
Chiarella, Thomas; Witters, Liesbeth; Mercha, Abdelkarim; Kerner, Christoph; Dittrich, Rok; Rakowski, Michal; Ortolland, Claude; Ragnarsson, Lars-Ake; Parvais, Bertrand; De Keersgieter, An; Kubicek, Stefan; Redolfi, Augusto; Rooyackers, Rita; Vrancken, Christa; Brus, Stephan; Lauwers, Anne; Absil, Philippe; Biesemans, Serge; Hoffmann, Thomas Y. (2009) -
Migrating from planar to FinFET for further CMOS scaling: SOI or bulk?
Mitard, Jerome; Witters, Liesbeth; Mercha, Abdelkarim; Kerner, Christoph; Dittrich, Rok; Rakowski, Michal; Ortolland, Claude; Ragnarsson, Lars-Ake; Parvais, Bertrand; De Keersgieter, An; Kubicek, Stefan; Redolfi, Augusto; Rooyackers, Rita; Vrancken, Christa; Brus, Stephan; Lauwers, Anne; Absil, Philippe; Biesemans, Serge; Hoffmann, Thomas Y. (2009) -
Mobility degradation in high-k transistors: the role of the charge scattering
Lujan, Guilherme; Kubicek, Stefan; De Gendt, Stefan; Heyns, Marc; Magnus, Wim; De Meyer, Kristin (2003)