Browsing by author "Lauerhaas, Jeff"
Now showing items 1-13 of 13
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A high-performance drying method enabling clustered single wafer wet cleaning
Mertens, Paul; Doumen, Geert; Lauerhaas, Jeff; Kenis, Karine; Fyen, Wim; Meuris, Marc; Arnauts, Sophia; Devriendt, Katia; Vos, Rita; Heyns, Marc (2000) -
A theoretical and experimental study of damage-free BEOL cleaning with megasonic agitation
Lauerhaas, Jeff; Wu, Y.; Bran, M.; Fraser, B.; Brause, E.; Nicolosi, T. (2003) -
Clustered single wafer wet cleaning
Mertens, Paul; Holsteyns, Frank; Vos, Rita; Vereecke, Guy; Fyen, Wim; Lauerhaas, Jeff; Xu, Kaidong; Bearda, Twan; Teerlinck, Ivo; Arnauts, Sophia; Kenis, Karine; Schmidt, Michael; Heyns, Marc (2002) -
Critical issues in post Cu CMP cleaning
Fyen, Wim; Vos, Rita; Teerlinck, Ivo; Lagrange, Sébastien; Lauerhaas, Jeff; Meuris, Marc; Mertens, Paul; Heyns, Marc (2000) -
Estimation of evaporating water film thickness during different drying processes
Fyen, Wim; Holsteyns, Frank; Mertens, Paul; Lauerhaas, Jeff; Heyns, Marc (2001) -
Megasonic, non-contact cleaning followed by "Rotagoni" drying of CMP wafers
Lauerhaas, Jeff; Mertens, Paul; Nicolosi, T.; Kenis, Karine; Fyen, Wim; Heyns, Marc (2001) -
Non-contact post Cu CMP cleaning using megasonic energy
Fyen, Wim; Lauerhaas, Jeff; Vos, Rita; Meuris, Marc; Mertens, Paul; Heyns, Marc (2001) -
Recent advances in wafer cleaning
Mertens, Paul; Vos, Rita; Bearda, Twan; Maes, Marjan; Lauerhaas, Jeff; Loewenstein, Lee; Fyen, Wim; Holsteyns, Frank; Kenis, Karine; Xu, Kaidong; Teerlinck, Ivo; Arnauts, Sophia; Schmidt, Michael; Heyns, Marc (2001) -
Reduction of surface metallic contamination through optimized rinsing and single-wafer drying
Fyen, Wim; Holsteyns, Frank; Lauerhaas, Jeff; Bearda, Twan; Mertens, Paul; Heyns, Marc (2002) -
Single wafer cleaning and drying: particle removal via a non-contact, non-damaging megasonic clean followed by a high performance "Rotagoni" dry
Lauerhaas, Jeff; Mertens, Paul; Fyen, Wim; Kenis, Karine; Meuris, Marc; Nicolosi, T.; Bran, M.; Fraser, B.; Franklin, C.; Wu, Y.; Heyns, Marc (2000) -
Single wafer drying
Holsteyns, Frank; Fyen, Wim; Lauerhaas, Jeff; Arnauts, Sophia; Mertens, Paul; Heyns, Marc (2001) -
Sub 100nm particle removal with deionized water and a megasonic frequency of 835kHz
Lauerhaas, Jeff; Wu, Y.; Xu, Kaidong; Vereecke, Guy; Vos, Rita; Kenis, Karine; Mertens, Paul; Nicolosi, T.; Heyns, Marc (2002) -
Sub 100nm particle removal with deionized water and a megasonic frequency of ~835kHz
Lauerhaas, Jeff; Xu, Kaidong; Vereecke, Guy; Vos, Rita; Kenis, Karine; Mertens, Paul; Wu, Y.; Nicolosi, T.; Heyns, Marc (2001)