Browsing by author "Gravey, Virginie"
Now showing items 1-13 of 13
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Bulk FinFET fabrication with new approaches for oxide topography control using dry removal techniques
Redolfi, Augusto; Sleeckx, Erik; Devriendt, Katia; Shamiryan, Denis; Vandeweyer, Tom; Horiguchi, Naoto; Togo, Mitsuhiro; Wouters, Johan M. D.; Jurczak, Gosia; Hoffmann, Thomas Y.; Cockburn, Andrew; Gravey, Virginie; Diehl, D.L. (2011-03) -
Bulk FinFET fabrication with new approaches for oxide topography control using dry removal techniques
Redolfi, Augusto; Kubicek, Stefan; Rooyackers, Rita; Kim, Min-Soo; Sleeckx, Erik; Devriendt, Katia; Shamiryan, Denis; Vandeweyer, Tom; Delande, Tinne; Horiguchi, Naoto; Togo, Mitsuhiro; Wouters, Johan M. D.; Jurczak, Gosia; Hoffmann, Thomas Y.; Cockburn, Andrew; Gravey, Virginie; Diehl, D.L. (2012) -
Demonstration of scaled 0.099μm² FinFET 6T-SRAM cell using full-field EUV lithography for (Sub-)22nm node single-patterning technology
Veloso, Anabela; Demuynck, Steven; Ercken, Monique; Goethals, Mieke; Locorotondo, Sabrina; Lazzarino, Frederic; Altamirano Sanchez, Efrain; Huffman, Craig; De Keersgieter, An; Brus, Stephan; Demand, Marc; Struyf, Herbert; De Backer, Johan; Hermans, Jan; Delvaux, Christie; Baudemprez, Bart; Vandeweyer, Tom; Van Roey, Frieda; Baerts, Christina; Goossens, Danny; Dekkers, Harold; Ong, Patrick; Heylen, Nancy; Kellens, Kristof; Volders, Henny; Hikavyy, Andriy; Vrancken, Christa; Rakowski, Michal; Verhaegen, Staf; Dusa, Mircea; Romijn, Leon; Pigneret, Charles; van Dijk, Andre; Schreutelkamp, Rob; Cockburn, Andrew; Gravey, Virginie; Meiling, H.; Hultermans, B.; Lok, S.; Shah, K.; Rajagopalan, R.; Gelatos, J.; Richard, Olivier; Bender, Hugo; Vandenberghe, Geert; Beyer, Gerald; Absil, Philippe; Hoffmann, Thomas Y.; Ronse, Kurt; Biesemans, Serge (2009-12) -
Implementation of Ru based barriers in 50 nm half pitch single damascene Cu/SiCOH (k=2.5) structures
Carbonell, Laure; Volders, Henny; Heylen, Nancy; Kellens, Kristof; Tokei, Zsolt; Hendrickx, Dirk; Struyf, Herbert; Claes, Martine; Versluijs, Janko; Van Besien, Els; Caluwaerts, Rudy; Cockburn, Andrew; Gravey, Virginie; Shah, Kavita; Al-Bayati, Amir; Fu, X.; Lubben, D.; Sundarrajan, A.; Beyer, Gerald (2009) -
Implementation of Ru based barriers in 50 nm half pitch single damascene Cu/SiCOH (k=2.5) structures
Carbonell, Laure; Volders, Henny; Heylen, Nancy; Kellens, Kristof; Tokei, Zsolt; Hendrickx, Dirk; Struyf, Herbert; Vandervorst, Alain; Claes, Martine; Lux, Marcel; Versluijs, Janko; Alaerts, Wilfried; Van Besien, Els; Deweerdt, Bruno; Vaes, Jan; Caluwaerts, Rudy; Cockburn, Andrew; Gravey, Virginie; Shah, Kavita; Al-Bayati, A.; Fu, X.; Lubben, D.; Sundarrajan, A.; Beyer, Gerald (2008) -
Integration of 20nm half pitch single damascene copper trenches by spacer-defined double patterning (SDDP) on metal hard mask (MHM)
Siew, Yong Kong; Versluijs, Janko; Kunnen, Eddy; Ciofi, Ivan; Alaerts, Wilfried; Dekkers, Harold; Volders, Henny; Suhard, Samuel; Cockburn, Andrew; Sleeckx, Erik; Van Besien, Els; Struyf, Herbert; Maenhoudt, Mireille; Noori, Atif; Padhi, Deenesh; Shah, Kavita; Gravey, Virginie; Beyer, Gerald (2010) -
Metallization of sub- 30 nm Interconnects: Comparison of different liner/seed combinations
Carbonell, Laure; Volders, Henny; Heylen, Nancy; Kellens, Kristof; Caluwaerts, Rudy; Devriendt, Katia; Altamirano Sanchez, Efrain; Wouters, Johan M. D.; Gravey, Virginie; Shah, Kavita; Luo, Qian; Sundarrajan, Arvind; Lu, Jiang; Aubuchon, Joseph; Ma, Paul; Narasimhan, Murali; Cockburn, Andrew; Tokei, Zsolt; Beyer, Gerald (2009) -
On the thermal stability of physically-vapor-deposited diffusion barriers in 3D through-silicon vias during IC processing
Civale, Yann; Croes, Kristof; Miyamori, Yuichi; Velenis, Dimitrios; Redolfi, Augusto; Thangaraju, Sarasvathi; Van Ammel, Annemie; Cherman, Vladimir; Van der Plas, Geert; Cockburn, Andrew; Gravey, Virginie; Kumar, Nirajan; Cao, Zhitao; Travaly, Youssef; Tokei, Zsolt; Beyne, Eric; Swinnen, Bart (2013) -
Plasma enhanced atomic layer deposition of ruthenium ultra-thin films for advanced metallization
Swerts, Johan; Armini, Silvia; Carbonell, Laure; Delabie, Annelies; Franquet, Alexis; Mertens, Sofie; Schaekers, Marc; Witters, Thomas; Tokei, Zsolt; Beyer, Gerald; Van Elshocht, Sven; Gravey, Virginie; Cockburn, Andrew; Shah, Kavita; Aubuchon, Joseph (2010) -
Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
Swerts, Johan; Armini, Silvia; Carbonell, Laure; Delabie, Annelies; Franquet, Alexis; Mertens, Sofie; Popovici, Mihaela Ioana; Schaekers, Marc; Witters, Thomas; Tokei, Zsolt; Beyer, Gerald; Van Elshocht, Sven; Gravey, Virginie; Cockburn, Andrew; Shah, Kavita; Aubuchon, Joseph (2012) -
Siconi for bulk FinFET (BFFT) recess etch
Cockburn, Andrew; Gravey, Virginie; Xu, T.; Diehl, D.; Redolfi, Augusto (2011) -
Spacer defined double patterning for 20nm half pitch interconnect damascene structures
Siew, Yong Kong; Cockburn, Andrew; Beyer, Gerald; Versluijs, Janko; Kunnen, Eddy; Dekkers, Harold; Volders, Henny; Ciofi, Ivan; Gravey, Virginie; Noori, Atif; Padhi, Deenesh; Shah, Kavita (2010) -
Thermal stability of copper through-silicon via barriers during IC processing
Civale, Yann; Croes, Kristof; Miyamori, Yuichi; Thangaraju, Sarasvathi; Redolfi, Augusto; Van Ammel, Annemie; Velenis, Dimitrios; Cherman, Vladimir; Hendrickx, Paul; Van der Plas, Geert; Cockburn, Andrew; Gravey, Virginie; Kumar, Nirajan; Zhitao, Cao; Sabuncuoglu Tezcan, Deniz; Soussan, Philippe; Travaly, Youssef; Tokei, Zsolt; Beyne, Eric; Swinnen, Bart (2011)